Patents by Inventor Armand Rosa Jozef Dassen

Armand Rosa Jozef Dassen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20230280663
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Application
    Filed: May 12, 2023
    Publication date: September 7, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
  • Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
    Patent number: 11650511
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Grant
    Filed: August 14, 2020
    Date of Patent: May 16, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
  • SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20200371447
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Application
    Filed: August 14, 2020
    Publication date: November 26, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Hendrikus Johannes Marinus VAN ABEELEN, Armand Rosa Jozef DASSEN, Sander Catharina Reinier DERKS
  • Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
    Patent number: 10747126
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Grant
    Filed: June 11, 2019
    Date of Patent: August 18, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
  • SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20190294056
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Application
    Filed: June 11, 2019
    Publication date: September 26, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Hendrikus Johannes Marinus VAN ABEELEN, Armand Rosa Jozef DASSEN, Sander Catharina Reinier DERKS
  • Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
    Patent number: 10324382
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Grant
    Filed: April 20, 2018
    Date of Patent: June 18, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
  • SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20180239265
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Application
    Filed: April 20, 2018
    Publication date: August 23, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Hendrikus Johannes Marinus VAN ABEELEN, Armand Rosa Jozef DASSEN, Sander Catharina Reinier DERKS
  • Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
    Patent number: 9971252
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Grant
    Filed: August 21, 2017
    Date of Patent: May 15, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
  • SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170351187
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Application
    Filed: August 21, 2017
    Publication date: December 7, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus VAN ABEELEN, Armand Rosa Jozef DASSEN, Sander Catharina Reinier DERKS
  • Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
    Patent number: 9740110
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: August 22, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
  • SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170176872
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Application
    Filed: February 16, 2017
    Publication date: June 22, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Hendrikus Johannes Marinus VAN ABEELEN, Armand Rosa Jozef DASSEN, Sander Catharina Reinier DERKS
  • Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
    Patent number: 9575419
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Grant
    Filed: February 27, 2015
    Date of Patent: February 21, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
  • SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150277243
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Application
    Filed: February 27, 2015
    Publication date: October 1, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Hendrikus Johannes Marinus VAN ABEELEN, Armand Rosa Jozef DASSEN, Sander Catharina Reinier DERKS
  • Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
    Patent number: 8970822
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Grant
    Filed: August 15, 2012
    Date of Patent: March 3, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
  • SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20130094005
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Application
    Filed: August 15, 2012
    Publication date: April 18, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks