Patents by Inventor Armando Martos

Armando Martos has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Laser-produced plasma EUV light source with pre-pulse enhancement
    Patent number: 6973164
    Abstract: An EUV radiation source that employs a low energy laser pre-pulse and a high energy laser main pulse. The pre-pulse generates a weak plasma in the target area that improves laser absorption of the main laser pulse to improve EUV radiation emissions. High energy ion flux is reduced by collisions in the localized target vapor cloud generated by the pre-pulse. Also, the low energy pre-pulse arrives at the target area 20–200 ns before the main pulse for maximum output intensity. The timing between the pre-pulse and the main pulse can be reduced below 160 ns to provide a lower intensity of the EUV radiation. In one embodiment, the pre-pulse is split from the main pulse by a suitable beam splitter having the proper beam intensity ratio, and the main pulse is delayed to arrive at the target area after the pre-pulse.
    Type: Grant
    Filed: June 26, 2003
    Date of Patent: December 6, 2005
    Assignee: University of Central Florida Research Foundation, Inc.
    Inventors: Jeffrey S. Hartlove, Mark E. Michaelian, Henry Shields, Samuel Talmadge, Steven W. Fornaca, Armando Martos
  • Laser-produced plasma EUV light source with pre-pulse enhancement
    Publication number: 20040264512
    Abstract: An EUV radiation source that employs a low energy laser pre-pulse and a high energy laser main pulse. The pre-pulse generates a weak plasma in the target area that improves laser absorption of the main laser pulse to improve EUV radiation emissions. High energy ion flux is reduced by collisions in the localized target vapor cloud generated by the pre-pulse. Also, the low energy pre-pulse arrives at the target area 20-200 ns before the main pulse for maximum output intensity. The timing between the pre-pulse and the main pulse can be reduced below 160 ns to provide a lower intensity of the EUV radiation. In one embodiment, the pre-pulse is split from the main pulse by a suitable beam splitter having the proper beam intensity ratio, and the main pulse is delayed to arrive at the target area after the pre-pulse.
    Type: Application
    Filed: June 26, 2003
    Publication date: December 30, 2004
    Applicant: Northrop Grumman Corporation
    Inventors: Jeffrey R. Hartlove, Mark E. Michaelian, Henry Shields, Samuel Talmadge, Steven W. Fornaca, Armando Martos