Abstract: The invention relates to a method for producing, applying and fixing a multilayer surface coating (2a, 3a) on at least one surface (1a) to be coated of a host substrate (1) in order to produce a host substrate assembly. Starting with a fixative product (2) and a functional product (3) based on single-walled or multi-walled graphene, the method consists in successively applying: a layer (2a) of fixative product to the or to each surface (1a) to be coated of the host substrate (1); and a layer of the functional product to said fixative layer (2a). The assembly can be finished with a protective layer deposited directly onto the layer (3a) that contains the functional product. The invention also relates to a host substrate assembly which can be obtained by said method, a heating element, an anti-corrosion and/or anti-fouling/dirt-repelling element and a hydrophobic element each comprising such an assembly.

Abstract: The present invention relates to a method of manufacturing a direct and selective surface deposition by a pulsed radiation treatment. Said method allows the production of a selective pattern on any receiving material without any pre-treatment and/or post-treatment of said receiving material. The invention provides a selective deposition of a monolayer donor material onto a receiving material by means of a pulsed radiation treatment without any contact between said donor and receiving materials. It further provides a method of direct surface metallization of various types of receiving materials using a pulsed radiation treatment. The present invention provides a method of manufacturing a direct and selective surface deposition by a pulsed radiation treatment of a monolayer donor material onto a receiving material. The present invention relates more particularly to a method of manufacturing free form patterned deposition on surfaces of various receiving materials.