Patents by Inventor Armen Kroyan
Armen Kroyan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7232630Abstract: When substantially all features in a layout for a layer of material in an integrated circuit (IC) are defined using a phase shifting mask, the related complementary mask that is normally used to define the remaining features and edges can be improved if intensities in an aerial image from openings on the complementary mask that are below threshold are increased to ensure that each opening meets or exceeds threshold. Such increase of intensities improves effectiveness of critical openings that are otherwise too small to print. Absent intensity increase, such openings could limit the application of optical lithography using phase shifting masks to ever shrinking technologies. The intensities are increased in some embodiments by enlarging some openings in the complementary mask in directions not constrained by features to be formed in an integrated circuit (by use of the phase shifting mask).Type: GrantFiled: December 11, 2003Date of Patent: June 19, 2007Assignee: Synopsys, IncInventor: Armen Kroyan
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Patent number: 7139301Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: GrantFiled: November 3, 2003Date of Patent: November 21, 2006Assignee: CYMER, Inc.Inventors: Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, Palash P. Das, Richard L. Sandstrom, John M. Algots, Khurshid Ahmed
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Patent number: 7111276Abstract: Using phase shifting on a mask can advantageously improve printed feature resolution on a wafer, thereby allowing greater feature density on an integrated circuit. Phase shifting can create an intensity imbalance between 0 degree and 180 degree phase shifters on the mask. An improved method of designing an alternating PSM to minimize this intensity imbalance is provided. Sub-resolution features, called “blockers”, can be incorporated in the alternating PSM design. Specifically, blockers can be formed in the 0 degree phase shifters. In this configuration, the intensity associated with the 0 degree phase shifters approximates the intensity associated with the corresponding 180 degree phase shifters. Intensity balancing using blockers retains image contrast, thereby ensuring printed feature quality.Type: GrantFiled: February 5, 2004Date of Patent: September 19, 2006Assignee: Synopsys, Inc.Inventors: Vishnu G. Kamat, Armen Kroyan
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Patent number: 7079556Abstract: A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in nominal wavelength values to produce a desired effective bandwidth of series of laser pulses.Type: GrantFiled: September 24, 2003Date of Patent: July 18, 2006Assignee: Cymer, Inc.Inventors: Igor V. Fomenkov, Armen Kroyan, Jesse D. Buck, Palash P. Das, Richard L. Sandstrom, Frederick G. Erie, John Martin Algots, Gamaralalage G. Padmabandu
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Publication number: 20050188338Abstract: A system and method for integrated circuit design are disclosed to enhance manufacturability of circuit layouts through generation of hierarchical design rules which capture localized layout requirements. In contrast to conventional techniques which apply global design rules, the disclosed IC design system and method partition the original design layout into a desired level of granularity based on specified layout and integrated circuit properties. At that localized level, the design rules are adjusted appropriately to capture the critical aspects from a manufacturability standpoint. These adjusted design rules are then used to perform localized layout manipulation and mask data conversion.Type: ApplicationFiled: February 18, 2005Publication date: August 25, 2005Inventors: Armen Kroyan, Youping Zhang, Etsuya Morita, Adrianus Ligtenberg
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Publication number: 20050177809Abstract: Using phase shifting on a mask can advantageously improve printed feature resolution on a wafer, thereby allowing greater feature density on an integrated circuit. Phase shifting can create an intensity imbalance between 0 degree and 180 degree phase shifters on the mask. An improved method of designing an alternating PSM to minimize this intensity imbalance is provided. Sub-resolution features, called “blockers”, can be incorporated in the alternating PSM design. Specifically, blockers can be formed in the 0 degree phase shifters. In this configuration, the intensity associated with the 0 degree phase shifters approximates the intensity associated with the corresponding 180 degree phase shifters. Intensity balancing using blockers retains image contrast, thereby ensuring printed feature quality.Type: ApplicationFiled: February 5, 2004Publication date: August 11, 2005Inventors: Vishnu Kamat, Armen Kroyan
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Publication number: 20050130047Abstract: When substantially all features in a layout for a layer of material in an integrated circuit (IC) are defined using a phase shifting mask, the related complementary mask that is normally used to define the remaining features and edges can be improved if intensities in an aerial image from openings on the complementary mask that are below threshold are increased to ensure that each opening meets or exceeds threshold. Such increase of intensities improves effectiveness of critical openings that are otherwise too small to print. Absent intensity increase, such openings could limit the application of optical lithography using phase shifting masks to ever shrinking technologies. The intensities are increased in some embodiments by enlarging some openings in the complementary mask in directions not constrained by features to be formed in an integrated circuit (by use of the phase shifting mask).Type: ApplicationFiled: December 11, 2003Publication date: June 16, 2005Applicant: Numerical Technologies, Inc. a wholly owned subsidiary of Synopsys, Inc.Inventor: Armen Kroyan
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Publication number: 20050068997Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: ApplicationFiled: August 9, 2004Publication date: March 31, 2005Inventors: Ronald Spangler, Jacob Lipcon, John Rule, Robert Jacques, Armen Kroyan, Ivan Lalovic, Igor Fomenkov, John Algots
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Publication number: 20050041701Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: ApplicationFiled: August 5, 2004Publication date: February 24, 2005Inventors: Ronald Spangler, Jacob Lipcon, John Rule, Robert Jacques, Armen Kroyan, Ivan Lalovic, Igor Fomenkov, John Algots
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Patent number: 6853653Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: GrantFiled: December 21, 2001Date of Patent: February 8, 2005Assignee: Cymer, Inc.Inventors: Ronald L. Spangler, Jacob P. Lipcon, John A. Rule, Robert N. Jacques, Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, John M. Algots
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Patent number: 6794096Abstract: Image intensity imbalance created by a phase shifting mask (PSM) layout can be corrected using a near-field image. Because an aerial image is not used, various parameters associated with the exposure conditions and stepper need not be considered, thereby significantly simplifying the computations to determine the appropriate correction. Of importance, using the near-field image can provide substantially the same correction generated using the aerial image. Thus, using the near-field image can provide an accurate and quick correction for image intensity imbalance between shifters of different phases. After correcting for the image intensity imbalance, additional proximity correction techniques can be applied to the layout to correct for other effects.Type: GrantFiled: October 9, 2002Date of Patent: September 21, 2004Assignee: Numerical Technologies, Inc.Inventor: Armen Kroyan
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Publication number: 20040146082Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: ApplicationFiled: November 3, 2003Publication date: July 29, 2004Inventors: Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, Palash P. Das, Richard L. Sandstrom, John M. Algots, Khurshid Ahmed
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Publication number: 20040073884Abstract: Image intensity imbalance created by a phase shifting mask (PSM) layout can be corrected using a near-field image. Because an aerial image is not used, various parameters associated with the exposure conditions and stepper need not be considered, thereby significantly simplifying the computations to determine the appropriate correction. Of importance, using the near-field image can provide substantially the same correction generated using the aerial image. Thus, using the near-field image can provide an accurate and quick correction for image intensity imbalance between shifters of different phases. After correcting for the image intensity imbalance, additional proximity correction techniques can be applied to the layout to correct-for other effects.Type: ApplicationFiled: October 9, 2002Publication date: April 15, 2004Applicant: Numerical Technologies, Inc.Inventor: Armen Kroyan
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Patent number: 6721340Abstract: A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in nominal wavelength values to produce a desired effective bandwidth of series of laser pulses.Type: GrantFiled: June 30, 2000Date of Patent: April 13, 2004Assignee: Cymer, Inc.Inventors: Igor V. Fomenkov, Armen Kroyan, Jesse D. Buck, Palash P. Das, Richard L. Sandstrom, Frederick G. Erie, John M. Algots, Gamaralalage G. Padmabandu
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Publication number: 20040057474Abstract: A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in nominal wavelength values to produce a desired effective bandwidth of series of laser pulses.Type: ApplicationFiled: September 24, 2003Publication date: March 25, 2004Applicant: Cymer, Inc.Inventors: Igor V. Fomenkov, Armen Kroyan, Jesse D. Buck, Palash P. Das, Richard L. Sandstrom, Frederick G. Erie, John Martin Algots, Gamaralalage G. Padmabandu
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Patent number: 6671294Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: GrantFiled: July 27, 2001Date of Patent: December 30, 2003Assignee: Cymer, Inc.Inventors: Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, Palash P. Das, Richard L. Sandstrom, John M. Algots, Khurshid Ahmed
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Publication number: 20020167975Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: ApplicationFiled: December 21, 2001Publication date: November 14, 2002Inventors: Ronald L. Spangler, Jacob P. Lipcon, John A. Rule, Robert N. Jacques, Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, John M. Algots
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Publication number: 20020048288Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.Type: ApplicationFiled: July 27, 2001Publication date: April 25, 2002Inventors: Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, Palash P. Das, Richard L. Sandstrom, John M. Algots, Khurshid Ahmed