Patents by Inventor Armin Bich

Armin Bich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE BASED ON COMPUTATIONALLY COMBINED SURFACE REGION MEASUREMENTS AND INTERFEROMETRIC MEASURING DEVICE
    Publication number: 20140078513
    Abstract: Measuring a shape of an optical surface (14) of a test object (12) includes: providing an interferometric measuring device (16) generating a measurement wave (18); arranging the measuring device (16) and the test object (12) consecutively at different measurement positions relative to each other, such that different regions (20) of the optical surface (14) are illuminated by the measurement wave (18); measuring positional coordinates of the measuring device (16) at the different measurement positions in relation to the test object (12); obtaining surface region measurements by interferometrically measuring the wavefront of the measurement wave (18) after interaction with the respective region (20) of the optical surface (14) using the measuring device (16) in each of the measurement positions; and determining the actual shape of the optical surface (14) by computationally combining the sub-surface measurements based on the measured positional coordinates of the measuring device (16) at each of the measurement
    Type: Application
    Filed: November 22, 2013
    Publication date: March 20, 2014
    Applicant: CARL ZEISS SMT GmbH
    Inventors: Rolf FREIMANN, Bernd DOERBAND, Stefan SCHULTE, Albrecht HOF, Frank RIEPENHAUSEN, Matthias MANGER, Dietmar NEUGEBAUER, Helmut ISSLER, Armin BICH
  • Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
    Patent number: 8593642
    Abstract: Measuring a shape of an optical surface (14) of a test object (12) includes: providing an interferometric measuring device (16) generating a measurement wave (18); arranging the measuring device (16) and the test object (12) consecutively at different measurement positions relative to each other, such that different regions (20) of the optical surface (14) are illuminated by the measurement wave (18); measuring positional coordinates of the measuring device (16) at the different measurement positions in relation to the test object (12); obtaining surface region measurements by interferometrically measuring the wavefront of the measurement wave (18) after interaction with the respective region (20) of the optical surface (14) using the measuring device (16) in each of the measurement positions; and determining the actual shape of the optical surface (14) by computationally combining the surface region measurements based on the measured positional coordinates of the measuring device (16) at each of the measurem
    Type: Grant
    Filed: March 12, 2012
    Date of Patent: November 26, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Rolf Freimann, Bernd Doerband, Stefan Schulte, Albrecht Hof, Frank Riepenhausen, Matthias Manger, Dietmar Neugebauer, Helmut Issler, Armin Bich
  • METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE AND INTERFEROMETRIC MEASURING DEVICE
    Publication number: 20120229814
    Abstract: Measuring a shape of an optical surface (14) of a test object (12) includes: providing an interferometric measuring device (16) generating a measurement wave (18); arranging the measuring device (16) and the test object (12) consecutively at different measurement positions relative to each other, such that different regions (20) of the optical surface (14) are illuminated by the measurement wave (18); measuring positional coordinates of the measuring device (16) at the different measurement positions in relation to the test object (12); obtaining surface region measurements by interferometrically measuring the wavefront of the measurement wave (18) after interaction with the respective region (20) of the optical surface (14) using the measuring device (16) in each of the measurement positions; and determining the actual shape of the optical surface (14) by computationally combining the sub-surface measurements based on the measured positional coordinates of the measuring device (16) at each of the measurement
    Type: Application
    Filed: March 12, 2012
    Publication date: September 13, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Rolf FREIMANN, Bernd BOERBAND, Stefan SCHULTE, Albrecht HOF, Frank RIEPENHAUSEN, Matthias MANGER, Dietmar NEUGEBAUER, Helmut ISSLER, Armin BICH
  • Device and method for measuring lithography masks
    Patent number: 8253947
    Abstract: A device for measuring lithography masks is provided, comprising a reticle carrier for the lithography mask to be measured, a measurement objective for reproducing on a detector a section of said lithography mask held by said reticle carrier, a measurement module for measuring the position of said reticle carrier relative to said measurement objective, and a correction module by means of which said reticle carrier can be moved in order to bring it into a predetermined position relative to said measurement objective, wherein said measurement objective and said measurement module are fastened directly to an instrument carrier in a locally fixed manner.
    Type: Grant
    Filed: November 6, 2007
    Date of Patent: August 28, 2012
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Albrecht Hof, Günter Maul, Dietmar Neugebauer, Armin Bich, Monika Frey, Wolfgang Scherm, Stefan Otto, Rainer Maul, Helmut Krause
  • DEVICE AND METHOD FOR MEASURING LITHOGRAPHY MASKS
    Publication number: 20110205549
    Abstract: A device for measuring lithography masks is provided, comprising a reticle carrier for the lithography mask to be measured, a measurement objective for reproducing on a detector a section of said lithography mask held by said reticle carrier, a measurement module for measuring the position of said reticle carrier relative to said measurement objective, and a correction module by means of which said reticle carrier can be moved in order to bring it into a predetermined position relative to said measurement objective, wherein said measurement objective and said measurement module are fastened directly to an instrument carrier in a locally fixed manner.
    Type: Application
    Filed: November 6, 2007
    Publication date: August 25, 2011
    Inventors: Albrecht Hof, Günter Maul, Dietmar Neugebauer, Armin Bich, Monika Frey, Wolfgang Scherm, Stefan Otto, Rainer Maul, Helmut Krause
  • Flatbed knitting machine
    Patent number: 6155082
    Abstract: In a flatbed knitting machine comprising at least two needle beds, at least one knitting system, at least one fabric take-off device and a take-off comb, the comb hooks (2) are covered by a take-off comb covering device (6) during at least one part of the rising motion of the take-off comb (1) so as to prevent previously knitted items from becoming caught up in the take-off comb.
    Type: Grant
    Filed: October 29, 1999
    Date of Patent: December 5, 2000
    Assignee: Shima Seiki Manufacturing Limited
    Inventors: Reinhold Schimko, Armin Bich