Patents by Inventor Armin de Meijere

Armin de Meijere has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6043393
    Abstract: The present invention relates to a process for preparing cyclopropylamines of the formula ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, and R.sup.5 have specified meanings, by reacting(1) a carboxamide of the formula ##STR2## wherein R.sup.1, R.sup.2, and R.sup.3 have specified meanings, with(2) an olefin of the formula ##STR3## wherein R.sup.4, R.sup.5, and R.sup.6 have specified meanings, (3) alkylmagnesium halides or zinc alkyl compounds of the formulaR.sup.8 --X (VIII),wherein R.sup.8 has a specified meaning and X represents MgCl, MgBr, Mgl, ZnCl, ZnBr, Znl, or ZnR.sup.8, and(4) orthometallates of the formula (IX) ##STR4## wherein R.sup.9 has a specified meaning, Y represents Ti, Zr, or V.dbd.O, and Z represents chlorine, bromine, or C.sub.1 -C.sub.4 -alkyl,with the provisos that when is Y os Ti or Zr, then is 3 or 4 and r are zero or 1 and the sum q+r=4, and that when Y is V.dbd.O, then q represents 3 and r represents zero.
    Type: Grant
    Filed: May 6, 1999
    Date of Patent: March 28, 2000
    Assignee: Bayer Aktiengesellschaft
    Inventors: Armin de Meijere, Vladimir Chaplinski, Alexandre Kourdioukov
  • Patent number: 5407599
    Abstract: Disclosed and claimed are liquid-crystalline cyclopropylalkyl or -alkenyl or heterocyclic compounds, process for their preparation, and their use in liquid-crystalline mixtures. The novel cyclopropylalkyl or -alkenyl or heterocyclic compounds are of the general formula ##STR1## In this formula A.sup.1, A.sup.2 and A.sup.3 are unsubstituted or substituted, aromatic or heteroaromatic molecular components such as 1,4-phenylene or pyrimidine-2,5-diyl which are linked via a single bond (in the case where k and m=0) or via functional groups M.sup.1 and M.sup.2, such as CO--O or CH.sub.2 --O; j, k, l, m and n are zero, 1 or 2. The radicals R.sup.2, R.sup.3 and R.sup.4 are H or alkyl/alkenyl, R.sup.1 is alkyl/alkenyl or one of the substitutents known from LC chemistry such as an .alpha.-haloalkanoic acid radical. At least one of the components A.sup.1, A.sup.2 and A.sup.3 can be heteroaromatic, and G is alkylene or alkenylene.
    Type: Grant
    Filed: October 4, 1993
    Date of Patent: April 18, 1995
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Armin de Meijere, Hans-Rolf Dubal, Claus Escher, Wolfgang Hemmerling, Ingrid Muller, Dieter Ohlendorf, Rainer Wingen, Takamasa Harada, Gerhard Illian, Mikio Murakami