Abstract: The disclosure relates to a composition of nanoparticles as carrier for HPV-derived immunogenic fragments and the use of the composition for medical purposes, in particular for immunoprophylaxis or immunotherapy. The invention also relates to a vaccine containing the composition and/or nanoparticles.

Abstract: The disclosure relates to a composition of nanoparticles as carrier for pharmaceutically acceptable compounds, a method for the preparation of the composition and the use of the composition for medical purposes, in particular for immunoprophylaxis or immunotherapy. The invention also relates to a vaccine containing the composition.

Abstract: The invention relates to novel etching media in the form of etching pastes for etching selected areas or the entire area of silicon surfaces and layers, in addition to the use of said media.

Abstract: The present invention relates firstly to HF/fluoride-free etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. The present invention secondly also relates to a process in which these media are employed.

Abstract: The invention concerns etching and doping substances free of hydrochloric/fluoride acid used for etching inorganic layers as well as for doping subjacent layers. The invention also concerns a method wherein said substances are used.

Abstract: The present invention relates firstly to HF/fluoride-free etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. The present invention secondly also relates to a process in which these media are employed.

Abstract: The present invention relates to novel etching media in the form of printable and dispensable etching pastes for the etching of titanium oxide surfaces of the general composition TixOy, and to the use of these etching pastes in a process for the etching of titanium oxide surfaces

Abstract: The invention relates to novel etching media in the form of etching pastes for etching selected areas or the entire area of silicon surfaces and layers, in addition to the use of said media.

Abstract: The invention concerns etching and doping substances free of hydrochloric/fluoride acid used for etching inorganic layers as well as for doping subjacent layers. The invention also concerns a method wherein said substances are used.

Abstract: The invention relates to novel boron, phosphorus or boron-aluminium dopant pastes for the production of p, p+ and n, n+ regions in monocrystalline and polycrystalline Si wafers, and of corresponding pastes for use as masking pastes in semiconductor fabrication, power electronics or in photovoltaic applications.

Abstract: A device for coating a plate has an open channel being open in an upward direction and a device for supplying a liquid to the open channel. The liquid in the open channel forms an convexly curved portion projecting upwardly from the open channel. A device for transporting a plate at a close distance past the open channel is provided, with which a surface to be coated of the plate facing the convexly curved portion of the liquid is guided such that a thin film of the liquid is deposited on the surface to be coated by adhesion effects. Another device for lacquering or coating plates or disks has a capillary slot that is filled with a liquid coating medium. The plate to be coated is advanced across the capillary slot with the surface to be coated facing downwardly so that due to the capillary effect a thin layer is deposited on the surface of the plate.