Abstract: The present invention relates to compositions comprising(a) a titanocene photoinitiator of the formula I ##STR1## (b) a 3-ketocoumarin of the formula II ##STR2## in which both R.sup.1, R.sup.2 and R.sup.3 are as defined in claim 1, R.sup.4 is a radical of the formula V ##STR3## R.sup.5 is C.sub.1 -C.sub.20 alkyl, cycloalkyl having 5-7 ring carbon atoms, phenyl or naphthyl which are unsubstituted or substituted by one to three C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms or by one diphenylamino or C.sub.1 -C.sub.6 dialkylamino group, or is C.sub.7 -C.sub.9 aralkyl, a radical --(CH.dbd.CH).sub.a --C.sub.6 H.sub.5 or a radical of the formula V, a is 1 or 2, preferably 1, and R.sup.10, R.sup.11, R.sup.12, R.sup.13 and R.sup.14 independently of one another are hydrogen, C.sub.1 -C.sub.6 alkyl, C.sub.1 -C.sub.6 alkoxy, phenyl, tolyl, xylyl or benzyl, and R.sup.11 can additionally also be a group --NR.sup.15 R.sup.16 or --OR.sup.15, wherein R.sup.15 and R.sup.

Abstract: Coated material containing in successive order(a) a substrate,(b) a photostructurable negative-working thermostable adhesive and(c) a self-supporting photocrosslinkable polyimide film.This arrangement can be used for producing relief images by means of photolithhographic processes.

Abstract: Coated material containing in successive order(a) a substrate,(b) a photostructurable negative-working thermostable adhesive and(c) a self-supporting photocrosslinkable polyimide film. This arrangement can be used for producing relief images by means of photolithographic processes.

Abstract: Prepolymers of alkali metal silicates and/or alkaline earth metal silicates and metal oxides, which can be used as molding compositions, preferably compression molding compositions, for the production of compression-molding laminates or of insulating sheets, are obtained by a method wherein a mixture of solid alkali metal silicates and/or alkaline earth metal silicates, and/or aqueous solutions of such silicates, with or without addition of water, and of divalent to tetravalent metal oxides, the ratio of metal oxide to silicate in the mixture being from 1:1 to 1:9, expressed in parts by weight of solids, and the homogenized mixture having a water content of from 10 to 50% by weight, based on the total amount of mixture, is allowed to pre-react in the temperature range of 10.degree. to 50.degree. C. until the water content of the mixture has decreased by from 0.