Abstract: A material includes a glass sheet coated on at least part of one of its faces with a stack of thin layers, the stack being coated on at least part of its surface with an enamel layer including zinc and less than 5% by weight of bismuth oxide, the stack further including, in contact with the enamel layer, a layer, called contact layer, which is based on an oxide, the physical thickness of the contact layer being at least 5 nm.

Abstract: A process for obtaining a material including a substrate coated on one of its sides with a coating including a functional layer, includes depositing the functional layer on the substrate, then depositing an absorbent layer on top of the functional layer, then performing a heat treatment by radiation, the radiation having at least one treatment wavelength between 200 and 2500 nm, the absorbent layer being in contact with air during the heat treatment, wherein the ab sorb ent layer ab sorbs at least 80% of the radiation used during the heat treatment and transmits less than 10% thereof.

Abstract: A heating device equipped with a chamber defining a cavity, includes a door or wall incorporating a triple glazing including three transparent substrates defining, from the interior to the exterior of the cavity, faces numbered 1 to 6 respectively, at least the faces 1 and 2 of the first substrate and 3 and/or 4 of the second substrate being covered with heat-reflecting coatings, wherein the mean spacing e1 between the first substrate and the second substrate and the mean spacing e2 between the second substrate and the third substrate is different, the ratio between the largest spacing and the smallest spacing being greater than 1.1, and e1 and e2 being between 2 and 20 mm.

Abstract: A material includes a glass sheet coated on at least part of one of its faces with a stack of thin layers, the stack being coated on at least part of its surface with an enamel layer including zinc and less than 5% by weight of bismuth oxide, the stack further including, in contact with the enamel layer, a layer, called contact layer, which is based on an oxide, the physical thickness of the contact layer being at least 5 nm.

Abstract: A heating device equipped with a chamber defining a cavity, includes a door or wall incorporating a triple glazing including three transparent substrates defining, from the interior to the exterior of the cavity, faces numbered 1 to 6 respectively, at least the faces 1 and 2 of the first substrate and 3 and/or 4 of the second substrate being covered with heat-reflecting coatings, wherein the mean spacing e1 between the first substrate and the second substrate and the mean spacing e2 between the second substrate and the third substrate is different, the ratio between the largest spacing and the smallest spacing being greater than 1.1, and e1 and e2 being between 2 and 20 mm.

Abstract: A heating device equipped with a chamber defining a cavity, includes a door or wall incorporating a multiple glazing, the glazing including at least one transparent substrate coated on each face with a stack of thin layers, namely: on a first face, turned toward the cavity, a first stack that reflects heat essentially by virtue of one or more functional layers based on indium tin oxide; and on the other face, turned toward the exterior of the device, a second stack that reflects heat essentially by virtue of one or more functional layers based on a metal chosen from gold or silver.

Abstract: The invention relates to a process for obtaining a material comprising a substrate coated on at least one part of at least one of its faces with at least one functional layer, said process comprising: a step of depositing the or each functional layer, then a step of depositing a sacrificial layer on said at least one functional layer, then a step of heat treatment by means of radiation chosen from laser radiation or radiation from at least one flash lamp, said radiation having at least one treatment wavelength between 200 and 2500 nm, said sacrificial layer being in contact with the air during this heat treatment step, then a step of removing the sacrificial layer using a solvent, said sacrificial layer being a monolayer and being such that, before heat treatment, it absorbs at least one part of said radiation at said at least one treatment wavelength and that, after heat treatment, it is capable of being removed by dissolution and/or dispersion in said solvent.

Abstract: A heating device equipped with a chamber defining a cavity, includes a door or wall incorporating a multiple glazing, the glazing including at least one transparent substrate coated on each face with a stack of thin layers, namely: on a first face, turned toward the cavity, a first stack that reflects heat essentially by virtue of one or more functional layers based on indium tin oxide; and on the other face, turned toward the exterior of the device, a second stack that reflects heat essentially by virtue of one or more functional layers based on a metal chosen from gold or silver.

Abstract: The invention relates to a process for obtaining a material comprising a substrate coated on at least one part of at least one of its faces with at least one functional layer, said process comprising: a step of depositing the or each functional layer, then a step of depositing a sacrificial layer on said at least one functional layer, then a step of heat treatment by means of radiation chosen from laser radiation or radiation from at least one flash lamp, said radiation having at least one treatment wavelength between 200 and 2500 nm, said sacrificial layer being in contact with the air during this heat treatment step, then a step of removing the sacrificial layer using a solvent, said sacrificial layer being a monolayer and being such that, before heat treatment, it absorbs at least one part of said radiation at said at least one treatment wavelength and that, after heat treatment, it is capable of being removed by dissolution and/or dispersion in said solvent.

Abstract: A process for manufacturing a hydrophobic glazing by: (i) forming a carbon-rich SiOxCy layer at a surface of a mineral glass substrate via CVD by contacting the surface with a stream containing C2H4, SiH4, and CO2 with an C2H4/SiH4 ratio of less than or equal to 3.3 by volume, at a temperature of between 600° C. and 680° C.; (ii) forming a SiO2 layer or a carbon-poor silicon oxycarbide layer with a mean C/Si ratio of less than 0.2 on the carbon-rich SiOxCy layer, thereby obtaining a layered substrate; (iii) annealing and/or shaping the layered substrate at a temperature of between 580° C. and 700° C.; (iv) activating the SiO2 layer or the carbon-poor silicon oxycarbide layer by plasma treatment or acidic or basic chemical treatment; and (v) grafting, by covalent bonding, a fluorinated hydrophobic agent to the surface of the SiO2 layer or the carbon-poor silicon oxycarbide layer.

Abstract: The invention relates to a glazing comprising a transparent glass substrate containing ions of at least one alkali metal and a transparent layer made of silicon oxycarbide (SiOxCy) having a total thickness E with (a) a carbon-rich deep zone, extending from a depth P3 to a depth P4, where the C/Si atomic ratio is greater than or equal to 0.5, and (b) a carbon-poor surface zone, extending from a depth P1 to a depth P2, where the C/Si atomic ratio is less than or equal to 0.4, with P1<P2<P3<P4 and (P2?P1)+(P4?P3)<E the distance between P1 and P2 representing from 10% to 70% of the total thickness E of the silicon oxycarbide layer and the distance between P3 and P4 representing from 10% to 70% of the total thickness E of the silicon oxycarbide layer.

Abstract: The invention relates to a glazing comprising a transparent glass substrate containing ions of at least one alkali metal and a transparent layer mad of silicon oxycarbide (SiOxCy) having a total thickness E with (a) a carbon-rich deep zone, extending from a depth P3 to a depth P4, where the C/Si atomic ratio is greater than or equal to 0.5, and (b) a carbon-poor surface zone, extending from a depth P1 to a depth P2, where the C/Si atomic ratio is less than or equal to 0.4, with P1<P2<P3<P4 and (P2-P1)+(P4-P3)<E the distance between P1 and P2 representing from 10% to 70% of the total thickness E of the silicon oxycarbide layer and the distance between P3 and P4 representing from 10% to 70% of the total thickness E of the silicon oxycarbide layer.

Abstract: The invention relates to a process for the manufacture of a hydrophobic glazing comprising the following successive stages: (a) formation of a carbon-rich silicon oxycarbide (SiOxCy) layer at the surface of a substrate made of mineral glass by chemical vapor deposition (CVD) over at least a portion of the surface of said substrate by bringing said surface into contact with a stream of reactive gases comprising ethylene (C2H4), silane (SiH4) and carbon dioxide (CO2) at a temperature of between 600° C. and 680° C., the ethylene/silane (C2H4/SiH4) ratio by volume during stage (a) being less than or equal to 3.3, (b) formation of an SiO2 layer on the silicon oxycarbide layer deposited in stage (a) or (b?) formation of a carbon-poor silicon oxycarbide layer exhibiting a mean C/Si ratio of less than 0.2, (c) annealing and/or shaping the substrate obtained on conclusion of stage (b) or (b?) at a temperature of between 580° C. and 700° C.

Abstract: Hydrophobic treatment composition comprising one or more compounds, as a mixture, corresponding to the formula in which at least one R is a CaF2a+1 group, a being an integer, it being possible for another R to be an SiX3-bRC1b group, b being 0, 1 or 2 X being a hydrolysable group, such as alkoxy, hydroxyl or halo R1 being a hydrocarbon group, such as lower alkyl S is a hydrogen atom, an OH group, an alkyl group, in particular a lower alkyl group, such as CH3, or an OSiR2R3R4 group, R2, R3 and R4 being identical or different and consisting in particular of one of the abovementioned groups carried by an Si atom, such as (CH2)2—R, a hydrogen atom, an alkyl group or OSIR2R3R4, n is an integer?1, the total number of Si atoms not exceeding 20. Process for treatment by this composition. Hydrophobic glass substrate thus obtained and its application, in particular as glazing.

Abstract: A crystalline phosphor of formula: Lnx.(1?t1?t2?t3?t4)Ybx.t1Erx.t2Tmx.t3Hox.14BayZnzO1.5x+y+z in which: Ln is Y, Gd or La; t1+t2+t3+t4 varies from 0.001 to 0.3; and such that, when x=2, y=1 and z=1: t1+t3+t4 is nonzero; if Ln is La or Gd and if t3+t4 is zero, then t1 varies from 0.05 to 0.1 and t2 varies from 0.02 to 0.07; and if Ln is Gd, then t2+t4 is nonzero.

Abstract: The invention provides a process for obtaining a hydrophobic/oleophobic coating on a substrate of a glass, ceramic or vitroceramic material by applying a priming layer obtained from a priming agent of formula: (X1)3-q(R1)qSi—R3-Si(X2)3-q,(R2)q, the variables of which are defined in the specification and then depositing a hydrophobic coating containing a fluorinated alkylsilane.

Abstract: A glass substrate includes a first side and a second opposite side, and provided, on its second side, with an electrode which is formed by at least one electrically conductive film, the substrate having, over all of its second side, and through a thickness e extending toward the interior of the substrate in the direction of the first side, a refractive index variation, of the glass, obtained by an ion-exchange treatment, the refractive index at the surface being greater than that of the glass located beyond the thickness e.

Abstract: This flat mineral glass comprises a first free surface and a second free surface, and comprises groups of zones having a high refractive index (n2) and zones having a low refractive index (n1) which are formed in the thickness of the flat glass between the first and second free surfaces, over a depth of between 1 and 1000 ?m starting from the first free surface. These high-index zones and low-index zones alternate along a direction transverse to the thickness direction of the glass between the first and second free surfaces, the high-index zones flaring out from the first free surface toward the second free surface, and the envelope surfaces of the high-index zones making an angle (?) of at least 65° with respect to the first free surface.

Abstract: The process according to the invention is based on the simultaneous ion exchange of two ions having an almost identical mobility with the ions of a glass substrate, at least one of the aforementioned two ions being used in the form of an enamel.

Abstract: The subject of the invention is a compound chosen from compounds of formula Y2BaZnO5:Er3+, La2BaZnO5:Er3+, Gd2BaZnO5:Er3+, Gd2BaZnO5:Yb3+/Er3+, Gd2BaZnO5:Yb3+/Tm3+. These compounds are capable of converting radiation into radiation with a higher energy level than that of the incident radiation.