Patents by Inventor Arnd Kaelberer
Arnd Kaelberer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150008542Abstract: A micromechanical component includes a substrate having a cavern structured into the same, an at least partially conductive diaphragm, which at least partially spans the cavern, and a counter electrode, which is situated on an outer side of the diaphragm oriented away from the substrate so that a clearance is present between the counter electrode and the at least partially conductive diaphragm, the at least partially conductive diaphragm being spanned onto or over at least one electrically insulating material which at least partially covers the functional top side of the substrate, and at least one pressure access being formed on the cavern so that the at least partially conductive diaphragm is bendable into the clearance when a gaseous medium flows from an outer surroundings of the micromechanical component into the cavern. Also described is a manufacturing method for a micromechanical component.Type: ApplicationFiled: July 2, 2014Publication date: January 8, 2015Applicant: Robert Bosch GmbHInventors: Arnd KAELBERER, Jochen Reinmuth, Johannes Classen
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Patent number: 8573059Abstract: A capacitive micromechanical acceleration sensor has a substrate and a micromechanical functional layer situated above the substrate. A seismic mass, a suspension and fixed electrodes are situated in the micromechanical functional layer. The fixed electrodes are electrically connected to one another on a first and second side, respectively, of the suspension using buried conductor tracks. The fixed electrodes are connected to one another between the first and second side of the suspension using first and second conductors in the micromechanical functional layer.Type: GrantFiled: August 4, 2009Date of Patent: November 5, 2013Assignee: Robert Bosch GmbHInventors: Arnd Kaelberer, Lars Tebje, Christian Bierhoff
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Patent number: 8461833Abstract: A method for determining the sensitivity of a sensor provides the following steps: a) first and second deflection voltages are applied to first and second electrode systems of the sensor, respectively, and first and second electrostatic forces are exerted on an elastically suspended seismic mass of the sensor by the first and second electrode systems, respectively, and a restoring force is exerted on the mass as a result of the elasticity of the mass, and a force equilibrium is established among the first and second electrostatic forces and the restoring force, and the mass assumes a deflection position characteristic of the force equilibrium, and an output signal characteristic of the force equilibrium and of the deflection position is measured; and b) the sensitivity of the sensor is computed on the basis of the first and second deflection voltages.Type: GrantFiled: November 9, 2010Date of Patent: June 11, 2013Assignee: Robert Bosch GmbHInventors: Johannes Classen, Arnd Kaelberer, Hans-Joerg Faisst, Axel Franke, Mirko Hattass, Holger Rank, Robert Sattler, Alexander Buhmann, Ramona Maas, Marian Keck
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Patent number: 8336382Abstract: An acceleration sensor is described that has a base substrate, a first electrode structure situated in stationary fashion relative to the base substrate, a sensor element having a first electrode area, and a spring device having at least one spring element. Via the spring element, the sensor element is coupled to the base substrate so that the sensor element is deflected relative to the base substrate as the result of an acceleration acting on the sensor element, thus changing the distance between the first electrode structure and the first electrode area. The sensor element and the first electrode structure are situated at least partially one over the other and are formed from a common functional layer.Type: GrantFiled: November 2, 2009Date of Patent: December 25, 2012Assignee: Robert Bosch GmbHInventors: Johannes Classen, Arnd Kaelberer, Patrick Wellner, Dietrich Schubert, Lars Tebje
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Patent number: 8298962Abstract: A device made of single-crystal silicon having a first side, a second side which is situated opposite to the first side, and a third side which extends from the first side to the second side, the first side and the second side each extending in a 100 plane of the single-crystal silicon, the third side extending in a first area in a 111 plane of the single-crystal silicon. The third side extends in a second area in a 110 plane of the single-crystal silicon. Furthermore, a production method for producing a device made of single-crystal silicon is described.Type: GrantFiled: September 28, 2010Date of Patent: October 30, 2012Assignee: Robert Bosch GmbHInventors: Arnd Kaelberer, Helmut Baumann, Roland Scheuerer, Heribert Weber
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Patent number: 8272268Abstract: An acceleration sensor includes a substrate, a rocker mass, a z spring connected to the rocker mass, which allows the rocker mass to rotate about an axis, and at least one additional spring system connected to the substrate and the rocker mass. The additional spring system allows the rocker mass to deflect in an x or y direction oriented parallel or perpendicular to the axis. The z spring or the additional spring system allows the rocker mass to deflect in a y or x direction oriented parallel or perpendicular to the axis.Type: GrantFiled: August 19, 2009Date of Patent: September 25, 2012Assignee: Robert Bosch GmbHInventors: Johannes Classen, Arnd Kaelberer, Lars Tebje
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Publication number: 20110197678Abstract: A capacitive micromechanical acceleration sensor has a substrate and a micromechanical functional layer situated above the substrate. A seismic mass, a suspension and fixed electrodes are situated in the micromechanical functional layer. The fixed electrodes are electrically connected to one another on a first and second side, respectively, of the suspension using buried conductor tracks. The fixed electrodes are connected to one another between the first and second side of the suspension using first and second conductors in the micromechanical functional layer.Type: ApplicationFiled: August 4, 2009Publication date: August 18, 2011Inventors: Arnd Kaelberer, Lars Tebje, Christian Bierhoff
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Publication number: 20110140692Abstract: A method for determining the sensitivity of a sensor provides the following steps: a) first and second deflection voltages are applied to first and second electrode systems of the sensor, respectively, and first and second electrostatic forces are exerted on an elastically suspended seismic mass of the sensor by the first and second electrode systems, respectively, and a restoring force is exerted on the mass as a result of the elasticity of the mass, and a force equilibrium is established among the first and second electrostatic forces and the restoring force, and the mass assumes a deflection position characteristic of the force equilibrium, and an output signal characteristic of the force equilibrium and of the deflection position is measured; and b) the sensitivity of the sensor is computed on the basis of the first and second deflection voltages.Type: ApplicationFiled: November 9, 2010Publication date: June 16, 2011Inventors: Johannes Classen, Arnd Kaelberer, Hans-Joerg Faisst, Axel Franke, Mirko Hattass, Holger Rank, Robert Sattler, Alexander Buhmann, Ramona Maas, Marian Keck
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Patent number: 7919346Abstract: A micromechanical component has a substrate, a first intermediate layer which is situated thereupon, and a first layer which is situated thereupon and is structured down to the first intermediate layer. A second intermediate layer is situated above the first layer. A second layer is situated on the former, at least one movable micromechanical structure being structured into the second layer. The second intermediate layer is removed in a sacrificial zone beneath the movable micromechanical structure and the first intermediate layer is partially removed in zones beneath the first layer. The movable micromechanical structure is provided with at least one stop surface on a bottom face, this stop surface being contactable with a zone of the first layer which is supported by the first intermediate layer by deflection of the movable micromechanical structure. A method for producing such a micromechanical component is also described.Type: GrantFiled: November 29, 2006Date of Patent: April 5, 2011Assignee: Robert Bosch GmbHInventors: Arnd Kaelberer, Jens Frey
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Patent number: 7878061Abstract: A micromechanical system includes a substrate, a first planar electrode, a second planar electrode, and a third planar electrode. The second planar electrode is movably positioned at a distance above the first planar electrode and the third planar electrode is positioned at a distance above the second electrode.Type: GrantFiled: November 26, 2008Date of Patent: February 1, 2011Assignee: Robert Bosch GmbHInventors: Johannes Classen, Arnd Kaelberer, Patrick Wellner, Dietrich Schubert, Lars Tebje
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Publication number: 20110014794Abstract: A device made of single-crystal silicon having a first side, a second side which is situated opposite to the first side, and a third side which extends from the first side to the second side, the first side and the second side each extending in a 100 plane of the single-crystal silicon, the third side extending in a first area in a 111 plane of the single-crystal silicon. The third side extends in a second area in a 110 plane of the single-crystal silicon. Furthermore, a production method for producing a device made of single-crystal silicon is described.Type: ApplicationFiled: September 28, 2010Publication date: January 20, 2011Inventors: Arnd KAELBERER, Helmut Baumann, Roland Scheuerer, Heribert Weber
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Patent number: 7834452Abstract: A device made of single-crystal silicon having a first side, a second side which is situated opposite to the first side, and a third side which extends from the first side to the second side, the first side and the second side each extending in a 100 plane of the single-crystal silicon, the third side extending in a first area in a 111 plane of the single-crystal silicon. The third side extends in a second area in a 110 plane of the single-crystal silicon. Furthermore, a production method for producing a device made of single-crystal silicon is described.Type: GrantFiled: June 27, 2008Date of Patent: November 16, 2010Assignee: Robert Bosch GmbHInventors: Arnd Kaelberer, Helmut Baumann, Roland Scheuerer, Heribert Weber
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Publication number: 20100107762Abstract: An acceleration sensor is described that has a base substrate, a first electrode structure situated in stationary fashion relative to the base substrate, a sensor element having a first electrode area, and a spring device having at least one spring element. Via the spring element, the sensor element is coupled to the base substrate so that the sensor element is deflected relative to the base substrate as the result of an acceleration acting on the sensor element, thus changing the distance between the first electrode structure and the first electrode area. The sensor element and the first electrode structure are situated at least partially one over the other and are formed from a common functional layer.Type: ApplicationFiled: November 2, 2009Publication date: May 6, 2010Inventors: Johannes CLASSEN, Arnd Kaelberer, Patrick Wellner, Dietrich Schubert, Lars Tebje
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Publication number: 20100043549Abstract: An acceleration sensor includes a substrate, a rocker mass, a z spring connected to the rocker mass, which allows the rocker mass to rotate about an axis, and at least one additional spring system connected to the substrate and the rocker mass. The additional spring system allows the rocker mass to deflect in an x or y direction oriented parallel or perpendicular to the axis. The z spring or the additional spring system allows the rocker mass to deflect in a y or x direction oriented parallel or perpendicular to the axis.Type: ApplicationFiled: August 19, 2009Publication date: February 25, 2010Inventors: Johannes Classen, Arnd Kaelberer, Lars Tebje
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Publication number: 20090152654Abstract: A micromechanical system includes a substrate, a first planar electrode, a second planar electrode, and a third planar electrode. The second planar electrode is movably positioned at a distance above the first planar electrode and the third planar electrode is positioned at a distance above the second electrode.Type: ApplicationFiled: November 26, 2008Publication date: June 18, 2009Inventors: Johannes Classen, Arnd Kaelberer, Patrick Wellner, Dietrich Schubert, Lars Tebje
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Patent number: 7495328Abstract: A micromechanical component has a structure such that a material flow is guided from at least one preferred direction for the purpose of uniformly enveloping the micromechanical component.Type: GrantFiled: July 24, 2006Date of Patent: February 24, 2009Assignee: Robert Bosch GmbHInventors: Frank Reichenbach, Freider Haag, Arnd Kaelberer
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Publication number: 20090008749Abstract: A device made of single-crystal silicon having a first side, a second side which is situated opposite to the first side, and a third side which extends from the first side to the second side, the first side and the second side each extending in a 100 plane of the single-crystal silicon, the third side extending in a first area in a 111 plane of the single-crystal silicon. The third side extends in a second area in a 110 plane of the single-crystal silicon. Furthermore, a production method for producing a device made of single-crystal silicon is described.Type: ApplicationFiled: June 27, 2008Publication date: January 8, 2009Inventors: Arnd Kaelberer, Helmut Baumann, Roland Scheuerer, Heribert Weber
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Publication number: 20080315332Abstract: A micromechanical component has a substrate, a first intermediate layer which is situated thereupon, and a first layer which is situated thereupon and is structured down to the first intermediate layer. A second intermediate layer is situated above the first layer. A second layer is situated on the former, at least one movable micromechanical structure being structured into the second layer. The second intermediate layer is removed in a sacrificial zone beneath the movable micromechanical structure and the first intermediate layer is partially removed in zones beneath the first layer. The movable micromechanical structure is provided with at least one stop surface on a bottom face, this stop surface being contactable with a zone of the first layer which is supported by the first intermediate layer by deflection of the movable micromechanical structure. A method for producing such a micromechanical component is also described.Type: ApplicationFiled: November 29, 2006Publication date: December 25, 2008Inventors: Arnd Kaelberer, Jens Frey
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Publication number: 20070040230Abstract: A micromechanical component has a structure such that a material flow is guided from at least one preferred direction for the purpose of uniformly enveloping the micromechanical component.Type: ApplicationFiled: July 24, 2006Publication date: February 22, 2007Inventors: Frank Reichenbach, Frieder Haag, Arnd Kaelberer
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Patent number: 7081592Abstract: A micromechanical switch having a mass, a first spring element, and a contact element is provided. The mass contacts the contact element if a specified degree of displacement of the first spring element is exceeded.Type: GrantFiled: February 25, 2003Date of Patent: July 25, 2006Assignee: Robert Bosch GmbHInventor: Arnd Kaelberer