Patents by Inventor Arne Seyfarth

Arne Seyfarth has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for emulation of a photolithographic process and mask inspection microscope for performing the method
    Patent number: 8913120
    Abstract: In mask inspection, the defects that are of interest are primarily those that will also show up on wafer exposure. The aerial images generated in the resist and by emulation should be as identical as possible. This also applies to methods in which an overall structure that is divided into at least two substructures on at least two masks. A system and a method are provided for emulating a photolithographic process for generating on a wafer an overall structure that is divided into at least two substructures on at least two masks. The method includes generating aerial images of the at least two substructures, at least one of the aerial images being captured with a mask inspection microscope; correcting, by using a processing unit, errors in the at least one aerial image captured with a mask inspection microscope; and overlaying the aerial images of the at least two substructures to form an overall aerial image with the overall structure.
    Type: Grant
    Filed: August 24, 2010
    Date of Patent: December 16, 2014
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Eric Poortinga, Thomas Scherübl, Rigo Richter, Arne Seyfarth
  • METHOD FOR EMULATION OF A PHOTOLITHOGRAPHIC PROCESS AND MASK INSPECTION MICROSCOPE FOR PERFORMING THE METHOD
    Publication number: 20110090329
    Abstract: In mask inspection, the defects that are of interest are primarily those that will also show up on wafer exposure. The aerial images generated in the resist and by emulation should be as identical as possible. This also applies to methods in which an overall structure that is divided into at least two substructures on at least two masks. A system and a method are provided for emulating a photolithographic process for generating on a wafer an overall structure that is divided into at least two substructures on at least two masks. The method includes generating aerial images of the at least two substructures, at least one of the aerial images being captured with a mask inspection microscope; correcting, by using a processing unit, errors in the at least one aerial image captured with a mask inspection microscope; and overlaying the aerial images of the at least two substructures to form an overall aerial image with the overall structure.
    Type: Application
    Filed: August 24, 2010
    Publication date: April 21, 2011
    Inventors: Eric Poortinga, Thomas Scherübl, Rigo Richter, Arne Seyfarth