Abstract: A method and system are provided of using a patterning device. An exemplary method includes defining a first region on a surface, the first region being associated with a first element of the patterning device, defining a second region on the surface, the second region being associated with a second element of the patterning device, activating the first element to expose the overlapping region, and deactivating the second element when the first element is active. The first region and the second region overlap in an overlapping region.

Abstract: A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.

Abstract: A method and system are provided of using a patterning device. An exemplary method includes performing a first exposure of a surface corresponding to image data, determining an image deficiency within a region of the first image, adjusting the image data to compensate for the image deficiency, and performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface. The first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface.

Abstract: A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.

Abstract: A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.

Abstract: A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.

Abstract: A method and system are provided of using a patterning device. An exemplary method includes performing a first exposure of a surface corresponding to image data, determining an image deficiency within a region of the first image, adjusting the image data to compensate for the image deficiency, and performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface. The first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface.

Abstract: A method and system are provided of using a patterning device. An exemplary method includes defining a first region on a surface, the first region being associated with a first element of the patterning device, defining a second region on the surface, the second region being associated with a second element of the patterning device, activating the first element to expose the overlapping region, and deactivating the second element when the first element is active. The first region and the second region overlap in an overlapping region.

Abstract: A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the image of the pattern layout such that the first area of the pattern layout is illuminated with the first illumination profile and the second area is illuminated with the second illumination profile; and projecting an image of the illuminated first and second areas onto the surface of the substrate.

Abstract: The invention relates to a method and device of inspecting contamination particles on an object comprising a patterned structure. The device includes a radiation system for directing a radiation beam to the object. The object is configured to scatter the beam. The device also includes an optical system arranged to receive scattered radiation from the object, and a filter provided in the optical system. The filter is associated with the patterned structure so as to filter out radiation from the scattered radiation. The device also includes a detector arranged to detect a fraction of radiation that is transmitted by the filter. Accordingly, contamination particles may be detected quickly and accurately.

Abstract: Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.

Abstract: A tilting mirror design for maskless lithography is proposed. In this mirror, the tilting portion occupies about 60% of the entire element area. The surrounding space is made 100% reflective and out-of-phase with respect to the tilting portion. The ratio between the tilting portion of the mirror and the out-of-phase portion is optimized in order to result in equal positive and negative maximum amplitudes over a complete range of tilt angles.

Abstract: Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.

Abstract: An array of individually controllable elements is comprised of elements, each formed of a stack of layers of dielectric material. At least one layer is an electro-optical material. The at least one layer's refractive index for radiation that is plane polarized in a given direction can be changed by application of a voltage in order to change the reflection/transmission characteristic of the boundary between this layer and the adjacent layer.

Abstract: A lithographic apparatus and method in which a relatively high resolution exposure, for example of a repeating pattern, is trimmed using a relatively low resolution exposure. According, a compromise between provision of a high resolution pattern and flexibility in the pattern to be formed is provided.

Abstract: To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.

Abstract: A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.

Abstract: A lithographic system combining an interference exposure unit and a lithography unit. The lithography unit can comprise an array of individually controllable elements. The lithography system can be arranged such that a pitch of the lines exposed by the interference exposure unit is an integer multiple of a size of an exposure area of the lithography unit corresponding to a single individually controllable element.

Abstract: Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing an optical structure configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.

Abstract: A spatial light modulator used to pattern a radiation beam comprises an array of pixels disposed on a support. Each pixel has a light modulating element for modulating the radiation beam and a control circuit that positions the light modulating elements according to a desired pattern. The control circuit is disposed on the opposite side of the support than the light modulating elements. The control circuit comprises at least one of a digital to analog converter, an analog to digital converter, an optical fiber input, and a processor.