Abstract: A method of forming an opaque quartz glass component is provided. The method includes (a) providing a starting preform made of quartz glass; (b) heating at least a portion of the starting preform to a predetermined temperature at which the quartz glass of the starting preform has a viscosity in a range of 10E2 to 10E12 poise; and (c) deforming at least a portion of the heated preform at the predetermined temperature to change a shape and/or dimension(s) of the heated perform in order to form the opaque quartz glass component. The starting preform and the heated preform have respective densities of at least 2.15 g/cm3 and at least 2.10 g/cm3. The starting perform and the opaque quartz glass component have respective direct spectral transmissions of approximately 0.1-1% and 0.2-3% in the wavelength range of ?=190 nm to ?=4990 nm at a wall thickness of 3 mm and a diffuse reflectance of at least 60% in a wavelength range of ?=190 nm to ?=2500 nm.

Abstract: A method of forming an opaque quartz glass component is provided. The method includes (a) providing a starting preform made of quartz glass; (b) heating at least a portion of the starting preform to a predetermined temperature at which the quartz glass of the starting preform has a viscosity in a range of 10E2 to 10E12 poise; and (c) deforming at least a portion of the heated preform at the predetermined temperature to change a shape and/or dimension(s) of the heated perform in order to form the opaque quartz glass component. The starting preform and the heated preform have respective densities of at least 2.15 g/cm3 and at least 2.10 g/cm3. The starting perform and the opaque quartz glass component have respective direct spectral transmissions of approximately 0.1-1% and 0.2-3% in the wavelength range of ?=190 nm to ?=4990 nm at a wall thickness of 3 mm and a diffuse reflectance of at least 60% in a wavelength range of ?=190 nm to ?=2500 nm.