Patents by Inventor Arnold Jan Van Putten

Arnold Jan Van Putten has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus
    Patent number: 9513566
    Abstract: A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: December 6, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Kursat Bal, Bernardus Antonius Johannes Luttikhuis, David Christopher Ockwell, Arnold Jan Van Putten, Han-Kwang Nienhuys, Maikel Bernardus Theodorus Leenders
  • Lithographic Apparatus
    Publication number: 20150049323
    Abstract: A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.
    Type: Application
    Filed: February 28, 2013
    Publication date: February 19, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Kursat Bal, Bernardus Antonius Johannes Luttikhuis, David Christopher Ockwell, Arnold Jan Van Putten, Han-Kwang Nienhuys, Maikel Bernardus Theodorus Leenders
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8421993
    Abstract: A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.
    Type: Grant
    Filed: May 7, 2009
    Date of Patent: April 16, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens, Koen Steffens, Arnold Jan Van Putten
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8351018
    Abstract: A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.
    Type: Grant
    Filed: May 6, 2009
    Date of Patent: January 8, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Clemens Johannes Gerardus Van Den Dungen, Koen Steffens, Arnold Jan Van Putten
  • Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method
    Patent number: 8345218
    Abstract: An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.
    Type: Grant
    Filed: May 7, 2009
    Date of Patent: January 1, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Michel Riepen, Nicolaas Rudolf Kemper, Johannes Petrus Martinus Bernardus Vermeulen, Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Arnold Jan Van Putten
  • IMMERSION LITHOGRAPHIC APPARATUS, DRYING DEVICE, IMMERSION METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090279063
    Abstract: An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.
    Type: Application
    Filed: May 7, 2009
    Publication date: November 12, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michel Riepen, Nicolaas Rudolf Kemper, Johannes Petrus Martinus Bernardus Vermeulen, Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Arnold Jan Van Putten
  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090279062
    Abstract: A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.
    Type: Application
    Filed: May 7, 2009
    Publication date: November 12, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria DIRECKS, Danny Maria Hubertus PHILIPS, Clemens Johannes Gerardus VAN DEN DUNGEN, Maikel Adrianus Cornelis SCHEPERS, Paul Petrus Joannes BERKVENS, Koen STEFFENS, Arnold Jan VAN PUTTEN
  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090279060
    Abstract: A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.
    Type: Application
    Filed: May 6, 2009
    Publication date: November 12, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria DIRECKS, Danny Maria Hubertus PHILIPS, Clemens Johannes Gerardus VAN DEN DUNGEN, Koen STEFFENS, Arnold Jan VAN PUTTEN