Abstract: New polymers comprising repeat units represented by the formula ##STR1## where R is a hydrogen or a halogen atom, a cyanide group or an alkyl group,R1, R2 and R3 are identical or different, and each denotes a hydrogen or a halogen atom, an alkyl group, an alkoxy group or an alkoxycarbonyl group,R4 is a hydrogen atom or a divalent radical,A denotes the atoms required for completing a mononuclear or dinuclear aromatic ring system andm is 2 or 3,are used as binders in positive-working, radiation-sensitive recording materials.

Abstract: Copolymers comprising perfluoroalkyl groups, reproduction layers containing these copolymers and use thereof for waterless offset printing. The novel perfluoroalkyl group-containing copolymers are prepared from at least two different monomers, monomer (a) comprising acryloyl or methacryloyl groups and phenolic OH groups and monomer (b) comprising acryloyloxy, methacryloyloxy or vinyl groups and a perfluoroalkyl group. Monomer component (a) can, for example, be prepared from a hydroxybenzoic acid by esterification with a hydroxyalkyl-acrylate. The novel copolymers are, in particular, used as binders in radiation-sensitive reproduction layers which additionally contain at least one radiation-sensitive compound. Reproduction layers of this kind are used as radiation-sensitive coatings of support materials for printing plates used in waterless offset printing.

Abstract: A radiation-sensitive mixture which contains(A) a polymer comprised of repeat units represented by the formula ##STR1## where R is a hydrogen or a halogen atom, a cyanide group or an alkyl group of 1-4 carbon atoms,R.sup.1, R.sup.2 are identical or different, and eachand R.sup.3 denotes a hydrogen or a halogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an acyl group, an aryloxy group, an aroyl group or aralkyl group,R.sup.4 is a hydrogen atom or a divalent organic group which is linked to another unit represented by formula (I),X denotes an oxygen atom or one of the groups NR.sup.8, OCH.sub.2 CHOHCH.sub.2 OCO, OCH.sub.2 CH.sub.2 O and OCH.sub.2 CH.sub.2 OCO, where R.sup.

Abstract: A process for separating higher molecular weight constituents from phenol polymers, wherein the phenol polymer is dissolved in an organic solvent medium, the solution obtained is mixed at room temperature with ammonia or an amine such that there is a stoichiometric deficiency of ammonia or amine, the precipitate is separate, dried, if appropriate, and treated with aqueous acid, and the resulting sediment is filtered off, washed and dried as described. The starting phenol polymer preferably is a condensation product of optionally substituted phenol and formaldehyde. The process yields fractions possessing an increased osmometric molecular weight, a narrower molecular weight distribution range and an increased glass transition temperature.

Abstract: Compounds of the general formula I ##STR1## in which R is a hydrogen or halogen atom, a cyanide or an alkyl group having 1-4 carbon atoms andR.sub.1 is a hydrogen or halogen atom, nitro, alkyl, alkoxy, aryl, aryloxy, acyl or alkoxycarbonyl group,are prepared by esterifying two adjacent OH groups to give the cyclic carbonate, esterifying the free OH group with (meth)acrylic acid and selectively hydrolyzing the carbonate. The compounds are free of polyunsaturated impurities and can be used for preparing purely linear polymers.

Abstract: Copolymers comprising perfluoroalkyl groups, reproduction layers containing these copolymers and use thereof for waterless offset printing. The novel perfluoroalkyl group-containing copolymers are prepared from at least two different monomers, monomer (a) comprising acryloyl or methacryloyl groups and phenolic OH groups and monomer (b) comprising acryloyloxy, methacryloyloxy or vinyl groups and a perfluoroalkyl group. Monomer component (a) can, for example, be prepared from a hydroxybenzoic acid by esterification with a hydroxyalkyl-acrylate. The novel copolymers are, in particular, used as binders in radiation-sensitive reproduction layers which additionally contain at least one radiation-sensitive compound. Reproduction layers of this kind are used as radiation-sensitive coatings of support materials for printing plates used in waterless offset printing.

Abstract: Disclosed is a radiation-sensitive composition, a recording material prepared therewith, and process therefor. The invention is suitable for the production of printing plates and photoresists. The composition contains a 1,2-quinonediazide or a combination of (1) a compound which, under the action of actinic radiation, forms a strong acid, and (2) a compound which possesses at least one acid-cleavable C--O--C bond, the solubility of which in a liquid developer is increased by the action of acid and, as the binder, a polymer having lateral crosslinking groups of the formula --CH.sub.2 OR, in which R is a hydrogen atom, a lower alkyl group, acyl group or hydroxyalkyl group. After being exposed and developed, the composition can be thermally cured and results in an image stencil exhibiting a clean background.

Abstract: A radiation-sensitive composition is disclosed which comprises: (a) a polymeric binder comprised of an alkenyl phenol monomer; (b) a compound which forms a strong acid under the action of actinic radiation; and (c) a compound which contains at least one acid-cleavable C-O-C bond and has a solubility in a liquid developer which is increased by the action of acid. The composition yields positive-working recording layers which are more flexible than layers comprising known novolak binders.