Patents by Inventor Arnout Johannes Meester

Arnout Johannes Meester has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 10429741
    Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
    Type: Grant
    Filed: November 19, 2018
    Date of Patent: October 1, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20190086814
    Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
    Type: Application
    Filed: November 19, 2018
    Publication date: March 21, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentinus Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 10151984
    Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
    Type: Grant
    Filed: October 30, 2015
    Date of Patent: December 11, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 10146139
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: December 4, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Ivo Adam Johannes Thomas, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20170285487
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
    Type: Application
    Filed: June 14, 2017
    Publication date: October 5, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ivo Adam Johannes THOMAS, Siebe LANDHEER, Arnout Johannes MEESTER, Marcio Alexandre Cano MIRANDA, Gheorghe TANASA
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 9709901
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
    Type: Grant
    Filed: December 30, 2014
    Date of Patent: July 18, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Ivo Adam Johannes Thomas, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20160124319
    Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
    Type: Application
    Filed: October 30, 2015
    Publication date: May 5, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
  • Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure
    Patent number: 9176371
    Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
    Type: Grant
    Filed: September 15, 2009
    Date of Patent: November 3, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20150109592
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
    Type: Application
    Filed: December 30, 2014
    Publication date: April 23, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ivo Adam Johannes THOMAS, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • Lithographic apparatus and method of operating the apparatus
    Patent number: 8928857
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
    Type: Grant
    Filed: April 29, 2010
    Date of Patent: January 6, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Ivo Adam Johannes Thomas, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • Lithographic apparatus and method of operating the apparatus with a humid gas space between a projection system and a liquid confinement structure
    Patent number: 8730447
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.
    Type: Grant
    Filed: September 15, 2009
    Date of Patent: May 20, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING THE APPARATUS
    Publication number: 20100296067
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
    Type: Application
    Filed: April 29, 2010
    Publication date: November 25, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Ivo Adam Johannes THOMAS, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20100066987
    Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
    Type: Application
    Filed: September 15, 2009
    Publication date: March 18, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Peter Johannes BRUIJSTENS, Richard Joseph BRULS, Hans JANSEN, Siebe LANDHEER, Laurentius Catrinus JORRITSMA, Arnout Johannes MEESTER, Bauke JANSEN, Ivo Adam Johannes Thomas, Marcio Alexandre Cano MIRANDA, Maurice Martinus Johannes VAN DER LEE, Gheorghe TANASA, Lambertus Dominicus NOORDAM
  • LITHOGRAPHIC APPARATUS AND METHOD OF GENERATING THE APPARATUS
    Publication number: 20100066988
    Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.
    Type: Application
    Filed: September 15, 2009
    Publication date: March 18, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
  • Lithographic apparatus and method
    Patent number: 7675606
    Abstract: According to one of the aspects of the present invention there is provided a substrate carrier arranged to hold a substrate in position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate.
    Type: Grant
    Filed: May 5, 2006
    Date of Patent: March 9, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Enno Van Den Brink, Henricus Wilhelmus Maria Van Buel, Joseph Consolini, Gerardus Johannes Joseph Keijsers, Klaus Simon, Johannes Theodoor De Smit, Richard Joseph Travers, Maurice Anton Jaques Teuwen, Arnout Johannes Meester, Frederick William Hafner, Vinyu Greenlee, Hubertus Antonius Marinus Baijens
  • Device, lithographic apparatus and device manufacturing method
    Publication number: 20070238261
    Abstract: A device for locally treating a substrate is disclosed. The device includes an enclosure for forming an enclosed environment at a location on the substrate, a seal for sealing the enclosed environment between the enclosure and the substrate, a supply channel for supplying a chemical reactant to the location, and a removal channel for removing a chemical from the enclosed environment.
    Type: Application
    Filed: April 5, 2006
    Publication date: October 11, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Wilhelmus Maria Krikhaar, Rudy Jan Maria Pellens, Arnout Johannes Meester, Hendrikus Wilhelmus Van Zeijl