Patents by Inventor Aron Hardy

Aron Hardy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12000403
    Abstract: A limit ring for use in a pump arrangement includes a cylindrical body positioned about a central longitudinal axis, a first end and an opposite second end. A central passage is defined through the cylindrical body and is centered about, and extends, along the longitudinal axis between the first end and the second end. The central passage has a circular cross section when viewed along the longitudinal axis. The limit ring further includes a number of channels defined in the cylindrical body radially outward from the central passage, each channel extending between the first end and the second end of the cylindrical body.
    Type: Grant
    Filed: May 6, 2022
    Date of Patent: June 4, 2024
    Assignee: HAYWARD TYLER, INC.
    Inventors: Benjamin Gardiner Hardy, Patrick Aron DiRico, Drew James Van Norman
  • Publication number: 20210214856
    Abstract: The disclosure relates to large area single crystal diamond (SCD) surfaces and substrates, and their methods of formation. Typical large area substrates can be at least about 25 mm, 50 mm, or 100 mm in diameter or square edge length, and suitable thicknesses can be about 100 ?m to 1000 ?m. The large area substrates have a high degree of crystallographic alignment. The large area substrates can be used in a variety of electronics and/or optics applications. Methods of forming the large area substrates generally include lateral and vertical growth of SCD on spaced apart and crystallographically aligned SCD seed substrates, with the individual SCD growth layers eventually merging to form a composite SCD layer of high quality and high crystallographic alignment. A diamond substrate holder can be used to crystallographically align the SCD seed substrates and reduce the effect of thermal stress on the formed SCD layers.
    Type: Application
    Filed: May 16, 2019
    Publication date: July 15, 2021
    Inventors: Timothy A. Grotjohn, Ramon Diaz, Aron Hardy