Patents by Inventor Arpan P. Mahorowila

Arpan P. Mahorowila has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7276327
    Abstract: Antireflective compositions characterized by the presence of an Si-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.
    Type: Grant
    Filed: October 31, 2005
    Date of Patent: October 2, 2007
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Wu-Song Huang, Arpan P. Mahorowila, Wayne Moreau, Dirk Pfeiffer, Ratnam Sooriyekumaren
  • Patent number: 7270931
    Abstract: Antireflective compositions characterized by the presence of an Si-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.
    Type: Grant
    Filed: October 6, 2003
    Date of Patent: September 18, 2007
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Wu-Song Huang, Arpan P. Mahorowila, Wayne Moreau, Dirk Pfeiffer, Ratnam Sooriyakumaran