Patents by Inventor Art Tevs

Art Tevs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12770295
    Abstract: In various examples, epipolar constraint-based cross-camera calibration validation is disclosed. For a pair of cameras that have partially overlapping fields of view, a shared region of their overlapping fields of view may be extracted and used as the basis to perform an epipolar constraint-guided feature descriptor matching process. A camera calibration metric may be computed based on the degree to which a feature descriptor appearing at a pixel of the first image aligns as expected in the second image with an epipolar line associated with the pixel of the first image, where the epipolar line is computed using extrinsic camera calibration parameters associated with the pair of cameras. Epipolar matching may be performed for a plurality of feature points and an aggregate validation score computed based on measuring the computed deviations for each feature. A sensitivity analysis may be applied to better assess the usefulness of the validation score.
    Type: Grant
    Filed: March 19, 2024
    Date of Patent: October 20, 2026
    Assignee: NVIDIA Corporation
    Inventors: Hsin Miao, Sergei Lupashin, Ayon Sen, Yue Wu, Gang Pan, Art Tevs, Minwoo Park
  • Publication number: 20250299365
    Abstract: In various examples, epipolar constraint-based cross-camera calibration validation is disclosed. For a pair of cameras that have partially overlapping fields of view, a shared region of their overlapping fields of view may be extracted and used as the basis to perform an epipolar constraint-guided feature descriptor matching process. A camera calibration metric may be computed based on the degree to which a feature descriptor appearing at a pixel of the first image aligns as expected in the second image with an epipolar line associated with the pixel of the first image, where the epipolar line is computed using extrinsic camera calibration parameters associated with the pair of cameras. Epipolar matching may be performed for a plurality of feature points and an aggregate validation score computed based on measuring the computed deviations for each feature. A sensitivity analysis may be applied to better assess the usefulness of the validation score.
    Type: Application
    Filed: March 19, 2024
    Publication date: September 25, 2025
    Inventors: Hsin MIAO, Sergei Lipashin, Ayon Sen, Yue WU, Gang Pan, Art Tevs, Minwoo Park