Patents by Inventor Arthur B. Israel

Arthur B. Israel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reactive ion etch chemistry for providing deep vertical trenches in semiconductor substrates
    Patent number: 4717448
    Abstract: A process for forming deep (>6.mu.m) trenches in a silicon substrate. The substrate is etched through a silicon oxide mask in a plasma having 75%-86% HCl, 9%-16% O.sub.2, and 1%-8% BCl.sub.3. The resulting trenches have substantially vertical sidewalls and rounded bottom surfaces. The plasma etch is performed at high power and low pressure, so that it achieves a high aspect ratio at a minimum etch bias.
    Type: Grant
    Filed: October 9, 1986
    Date of Patent: January 5, 1988
    Assignee: International Business Machines Corporation
    Inventors: Randy D. Cox, Arthur B. Israel, Edward H. Payne