Patents by Inventor Arthur Buechel

Arthur Buechel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240102581
    Abstract: A vacuum valve or door having a closure plate for closing an opening in a wall. The opening has opposing first and second longitudinal edges and shorter opposing first and second transverse edges. A sealing unit seals the closure plate against the wall in the closed position. The sealing unit includes a supporting frame having opposing first and second longitudinal legs and shorter opposing first and second transverse legs, on which supporting frame there is mounted on one side a circumferential closure plate seal and on the other side a circumferential wall seal. The supporting frame is secured to fastening points on the wall, with central portions of the first and second longitudinal legs being free with respect to the wall, or the supporting frame is secured to fastening points on the closure plate, with the central being free with respect to the closure plate.
    Type: Application
    Filed: December 3, 2020
    Publication date: March 28, 2024
    Applicant: VAT Holding AG
    Inventors: Marc HÜBENER, Arthur BÜCHEL, Markus POPPELLER
  • Publication number: 20220375732
    Abstract: The invention relates to a high-frequency grounding device (40) for use with a vacuum valve for closing and opening a valve opening of a vacuum chamber system, having a grounding band (42) made of a conductive material for discharging electrical charges occurring on the vacuum valve, wherein the grounding band has a first end (41) and a second end (43) and, for grounding the vacuum valve, is designed to be connected at the first end to a valve closure of the vacuum valve, and to be connected at the second end to a component of the vacuum chamber system, wherein the high-frequency grounding device has a correction impedance, wherein the grounding band is coupled to the correction impedance so that a resonant circuit results, which comprises the grounding band and the correction impedance, and the correction impedance has a first element for shifting a resonant frequency of the resonant circuit and/or a second element for reducing a quality of the resonant circuit.
    Type: Application
    Filed: May 16, 2022
    Publication date: November 24, 2022
    Inventors: Arthur Büchel, Adrian Weitnauer
  • Patent number: 11451190
    Abstract: The invention relates to a solar power installation which is characterized in that the supports of the solar modules are stacked one above the other when in the “off” state and are extended by means of a transfer and lifting mechanism when in operating mode. The installation is also equipped with a controller which allows the installation to put the system into the safe off state in adverse conditions. The system is also advantageously suitable for stored energy sources and fueling electric vehicles.
    Type: Grant
    Filed: January 28, 2019
    Date of Patent: September 20, 2022
    Inventor: Arthur Büchel
  • Publication number: 20210050813
    Abstract: The invention relates to a solar power installation which is characterized in that the supports of the solar modules are stacked one above the other when in the “off” state and are extended by means of a transfer and lifting mechanism when in operating mode. The installation is also equipped with a controller which allows the installation to put the system into the safe off state in adverse conditions. The system is also advantageously suitable for stored energy sources and fueling electric vehicles.
    Type: Application
    Filed: January 28, 2019
    Publication date: February 18, 2021
    Inventor: Arthur Büchel
  • Patent number: 9224581
    Abstract: A capacitive-coupled parallel plate plasma enhanced chemical vapor deposition reactor includes a gas distribution unit that is integrated in an RF electrode and is formed with a gas outlet. The parallel plate reactor is configured so that layers with high thickness homogeneity and quality can be produced. The capacitively coupled parallel plate plasma enhanced vapor deposition reactor has gas distribution unit with a multiple-stage showerhead constructed in such a way that it provides an independent adjustment of gas distribution and gas emission profile of the gas distribution unit.
    Type: Grant
    Filed: July 9, 2010
    Date of Patent: December 29, 2015
    Assignee: Roth & Rau AG
    Inventors: Joachim Mai, Benjamin Strahm, Guillaume Wahli, Arthur Buechel, Thomas Schulze
  • Patent number: 8785812
    Abstract: The present invention relates to a device for the treatment of a workpiece, in particular of a substantially flat substrate, comprising a table (2) for supporting the workpiece (5), a flow generation apparatus (6, 11) producing a gas flow (22) on a top face (17.1, 17.2) of the table (2) in a region between the workpiece (5) and the top face (17.1, 17.2) of the table (2), on which gas flow the workpiece (5) is supported during the treatment.
    Type: Grant
    Filed: May 27, 2005
    Date of Patent: July 22, 2014
    Assignee: Tel Solar AG
    Inventors: Richard Grundmüller, Johannes Meier, Arthur Büchel
  • Publication number: 20120304933
    Abstract: A capacitive-coupled parallel plate plasma enhanced chemical vapor deposition reactor includes a gas distribution unit that is integrated in an RF electrode and is formed with a gas outlet. The parallel plate reactor is configured so that layers with high thickness homogeneity and quality can be produced. The capacitively coupled parallel plate plasma enhanced vapor deposition reactor has gas distribution unit with a multiple-stage showerhead constructed in such a way that it provides an independent adjustment of gas distribution and gas emission profile of the gas distribution unit.
    Type: Application
    Filed: July 9, 2010
    Publication date: December 6, 2012
    Applicant: ROTH & RAU AG
    Inventors: Joachim Mai, Benjamin Strahm, Guillaume Wahli, Arthur Buechel, Thomas Schulze
  • Patent number: 8205572
    Abstract: A vacuum treatment installation has a vacuum receptacle with a first planar metallic electrode face, a second dielectric electrode face facing the first planar metallic electrode face which forms a surface of a dielectric areal configuration, a metallic coupling face facing a backside of the areal configuration, electric connections on the coupling and on the first electrode face, a gas line system through the coupling face and an areal distributed pattern of apertures through the areal configuration and wherein the areal dielectric configuration is formed by several ceramic tiles.
    Type: Grant
    Filed: September 23, 2008
    Date of Patent: June 26, 2012
    Assignee: Oerlikon Solar AG, Truebbach
    Inventors: Arthur Buechel, Werner Wieland, Christoph Ellert
  • Publication number: 20110155218
    Abstract: The invention relates to a solar installation (11) comprising a plurality of solar panels (19) that are suspended in a row between two supporting cables (15, 16). Anchor points (13, 14), at which both of the supporting cables (15, 16) are directly or indirectly anchored, is provided at least in front of and after the row of solar panels. A spacer (17) is provided at least between each row of solar panels (19) and the anchor points (13, 14), said spacers (17) maintaining the supporting cables (15, 16) at a pre-determined distance in relation to each other in the region of the rows of solar panels (19). At least one of the spacers (17) is mounted on a support (25) so as to be pivotable about a swivel axis (23), and a pivoting device (27) is provided to secure the spacer (17) and the support (25) at a specific pivoting angle in relation to each other. At least one intermediate fastening device is provided.
    Type: Application
    Filed: July 14, 2009
    Publication date: June 30, 2011
    Inventors: Arthur Büchel, Franz Baumgartner, Roland Bartholet
  • Patent number: 7868246
    Abstract: A composite solar collection module includes a thin film solar collection cell that is encapsulated between a transparent substrate, such as glass, on one side, and an electrically insulating film on the other. A metallic layer is disposed over the electrically insulating film to provide protection against diffusion of atmospheric species that may harm the thin film solar collection cell. The insulating and metallic layers are dimensioned so that a larger collection cell can be used to collect solar energy over a larger proportion of the available substrate surface area, without causing arcing between the cell edge and the metallic layer edge.
    Type: Grant
    Filed: April 10, 2006
    Date of Patent: January 11, 2011
    Assignee: Oerlikon Solar AG
    Inventor: Arthur Buechel
  • Publication number: 20090025632
    Abstract: A vacuum treatment installation has a vacuum receptacle with a first planar metallic electrode face, a second dielectric electrode face facing the first planar metallic electrode face which forms a surface of a dielectric areal configuration, a metallic coupling face facing a backside of the areal configuration, electric connections on the coupling and on the first electrode face, a gas line system through the coupling face and an areal distributed pattern of apertures through the areal configuration and wherein the areal dielectric configuration is formed by several ceramic tiles.
    Type: Application
    Filed: September 23, 2008
    Publication date: January 29, 2009
    Inventors: ARTHUR BUECHEL, Werner Wieland, Christoph Ellert
  • Patent number: 7449220
    Abstract: A method for producing a disk shaped workpiece with a dielectric substrate includes treatment in a plasma process volume between two electrode faces bounding a high-frequency plasma discharge. One electrode face is of dielectric material and is at a high-frequency potential with a varying distribution along the face. The other electrode face is metallic. Reactive gas is introduced into the process volume through an aperture pattern. The dielectric substrate, before treatment, is at least regionally coated with a layer material to whose specific resistance applies: 10?5 ?cm??10?1 ?cm, and to the resulting surface resistance RS of the layer applies: 0<RS?104 ?. Subsequently, the coated substrate is positioned on the metallic electrode face and is etched or coated reactively under plasma enhancement in the plasma process volume.
    Type: Grant
    Filed: April 30, 2004
    Date of Patent: November 11, 2008
    Assignee: OC Oerlikon Blazers Ag
    Inventors: Arthur Buechel, Werner Wieland, Christoph Ellert, Laurent Sansonnens
  • Publication number: 20080038095
    Abstract: A vacuum transport chamber has a transport robot arrangement. A processing arrangement has at least one processing station communicating by at least one workpiece pass-through opening with the vacuum transport chamber. A loadlock arrangement communicates by at least one workpiece pass-through opening with an atmosphere outside the vacuum transport chamber and the processing arrangement. One single loadlock and processing tower is formed by the processing arrangement and the loadlock arrangement being arranged vertically on upon the other.
    Type: Application
    Filed: May 30, 2007
    Publication date: February 14, 2008
    Applicant: OC OERLIKON BALZERS AG
    Inventors: Rainer Ostermann, Arthur Buechel, Mustapha Elyaakoubi
  • Patent number: 7244086
    Abstract: A vacuum transport chamber has a transport robot arrangement. A processing arrangement has at least one processing station communicating by at least one workpiece pass-through opening with the vacuum transport chamber. A loadlock arrangement communicates by at least one workpiece pass-through opening with an atmosphere outside the vacuum transport chamber and the processing arrangement. One single loadlock and processing tower is formed by the processing arrangement and the loadlock arrangement being arranged vertically on upon the other.
    Type: Grant
    Filed: November 14, 2003
    Date of Patent: July 17, 2007
    Assignee: OC Oerlikon Balzers AG
    Inventors: Rainer Ostermann, Arthur Buechel, Mustapha Elyaakoubi
  • Publication number: 20060225777
    Abstract: A composite solar collection module includes a thin film solar collection cell that is encapsulated between a transparent substrate, such as glass, on one side, and an electrically insulating film on the other. A metallic layer is disposed over the electrically insulating film to provide protection against diffusion of atmospheric species that may harm the thin film solar collection cell. The insulating and metallic layers are dimensioned so that a larger collection cell can be used to collect solar energy over a larger proportion of the available substrate surface area, without causing arcing between the cell edge and the metallic layer edge.
    Type: Application
    Filed: April 10, 2006
    Publication date: October 12, 2006
    Applicant: Unaxis Balzers Ltd.
    Inventor: Arthur Buechel
  • Publication number: 20050241583
    Abstract: A method for producing a disk shaped workpiece with a dielectric substrate includes treatment in a plasma process volume between two electrode faces bounding a high-frequency plasma discharge. One electrode face is of dielectric material and is at a high-frequency potential with a varying distribution along the face. The other electrode face is metallic. Reactive gas is introduced into the process volume through an aperture pattern. The dielectric substrate, before treatment, is at least regionally coated with a layer material to whose specific resistance applies: 10?5 ?cm??10?1 ?cm, and to the resulting surface resistance Rs of the layer applies: 0<Rs?104 ?. Subsequently, the coated substrate is positioned on the metallic electrode face and is etched or coated reactively under plasma enhancement in the plasma process volume.
    Type: Application
    Filed: April 30, 2004
    Publication date: November 3, 2005
    Inventors: Arthur Buechel, Werner Wieland, Christoph Ellert
  • Publication number: 20040115032
    Abstract: A vacuum transport chamber has a transport robot arrangement. A processing arrangement has at least one processing station communicating by at least one workpiece pass-through opening with the vacuum transport chamber. A loadlock arrangement communicates by at least one workpiece pass-through opening with an atmosphere outside the vacuum transport chamber and the processing arrangement. One single loadlock and processing tower is formed by the processing arrangement and the loadlock arrangement being arranged vertically on upon the other.
    Type: Application
    Filed: November 14, 2003
    Publication date: June 17, 2004
    Inventors: Rainer Ostermann, Arthur Buechel, Mustapha Elyaakoubi