Abstract: An integral machine for polishing, cleaning, rinsing and drying workpieces such as semiconductor wafers. A load/unload station has a plurality of platforms for receiving cassettes of wafers to be processed. A dry end-effector of a robot retrieves wafers from the cassettes and transfers them to an index table. A transfer apparatus having wafer carrier elements picks up wafers from the index table, moves the wafers to a polishing table for polishing, and returns the wafers to the index table for further processing. A flipper moves the polished wafers to a cleaning station. The cleaning station includes scrub stations, a rinsing station and a spin dryer station, and a connective system of water tracks. A wet end-effector of the robot transfers rinsed wafers to the spin dryer station. The dry end-effector of the robot moves dried wafers from the spin dryer station back to the cassette of origination.

Abstract: An integral machine for polishing, cleaning, rinsing and drying workpieces such as semiconductor wafers. A load/unload station has a plurality of platforms for receiving cassettes of wafers to be processed. A dry end-effector of a robot retrieves wafers from the cassettes and transfers them to an index table. A transfer apparatus having wafer carrier elements picks up wafers from the index table, moves the wafers to a polishing table for polishing, and returns the wafers to the index table for further processing. A flipper moves the polished wafers to a cleaning station. The cleaning station includes scrub stations, a rinsing station and a spin dryer station, and a connective system of water tracks. A wet end-effector of the robot transfers rinsed wafers to the spin dryer station. The dry end-effector of the robot moves dried wafers from the spin dryer station back to the cassette of origination.

Abstract: An integral machine for polishing, cleaning, rinsing and drying workpieces such as semiconductor wafers. A load/unload station has a plurality of platforms for receiving cassettes of wafers to be processed. A dry end-effector of a robot retrieves wafers from the cassettes and transfers them to an index table. A transfer apparatus having wafer carrier elements picks up wafers from the index table, moves the wafers to a polishing table for polishing, and returns the wafers to the index table for further processing. A flipper moves the polished wafers to a cleaning station. The cleaning station includes scrub stations, a rinsing station and a spin dryer station, and a connective system of water tracks. A wet end-effector of the robot transfers rinsed wafers to the spin dryer station. The dry end-effector of the robot moves dried wafers from the spin dryer station back to the cassette of origination.

Abstract: A spin dryer assembly for drying workpieces such as semiconductor wafers includes a workpiece platform for receiving a workpiece to be dried. A motor is coupled to and spins the platform to effect removal of water and particulates from the workpiece. Gripping fingers are pivotally mounted around the platform and securely grip the workpiece during drying. Spring loaded plungers maintain the gripping fingers in a secured position during drying. A cam ring is vertically movable into and out of contact with the gripping fingers to bias the gripping portions of the fingers outwardly to a release position after drying.

Abstract: A spin dryer assembly for drying workpieces such as semiconductor wafers includes a workpiece platform for receiving a workpiece to be dried. A motor is coupled to and spins the platform to effect removal of water and particulates from the workpiece. Gripping fingers are pivotally mounted around the platform and securely grip the workpiece during drying. Spring loaded plungers maintain the gripping fingers in a secured position during drying. A cam ring is vertically movable into and out of contact with the gripping fingers to bias the gripping portions of the fingers outwardly to a release position after drying.

Abstract: An electrical drive circuit arrangement to control the energization of a reactive load with a high voltage including a control stage, an electrically isolating control signal transformer and an output stage including power control semiconductor devices and having an energization input for a high voltage electrical supply and an output for the connection of a reactive load, the high voltage being prevented from reaching the control stage via the input of the output stage by the isolating transformer, the control stage including a noise-resistant guard responsive to circuit condition signals to permit or prevent generation of the control signal, the transformer restricting the signal to the output stage to a permitted control signal and the output stage generating a protection signal on a current surge in a connected reactive load, the protection signal being a potential low enough for direct application to the control stage without the need for isolating transfer to protect against the high voltage reaching th

Abstract: A control arrangement for vibratory conveyors, including bowl and linear types, in which the vibration frequency is set by the behavior of the conveyor and not by an applied frequency. A sensor, SC, senses the behavior of the conveyor and a frequency, of controlled amplitude and phase, is derived from the sensor output to energize conveyor drive means, AV and AH1 to AH3. User controls (HA, VA, PA) for amplitude and phase can be mark/space adjusters (HMS, VMS, DMS) effective on the base circuits of transistors connected to electromagnetic actuators. Low voltage operation (less than 50v) is provided without proportionally increased current, partly by energy recovery from the inductors in the actuators. Two levels of protection against supply ripple are included (RT, RLA) and the actuator drive can be stabilized against supply variation (MSC). The low-voltage operation provided is both safer and more efficient than mains voltage operation.

Abstract: A control arrangement for vibratory conveyors, including bowl and linear types, in which the vibration frequency is set by the behavior of the conveyor and not by an applied frequency. A sensor, SC, senses the behavior of the conveyor and a frequency, of controlled amplitude and phase, is derived from the sensor output to energize conveyor drive means, AV and AH1 to AH3. User controls (HA, VA, PA) for amplitude and phase can be mark/space adjusters (HMS, VMS, DMS) effective on the base circuits of transistors connected to electromagnetic actuators. Low voltage operation (less than 50v) is provided without proportionally increased current, partly by energy recovery from the inductors in the actuators. Two levels of protection against supply ripple are included (RT, RLA) and the actuator drive can be stabilized against supply variation (MSC). The low-voltage operation provided is both safer and more efficient than mains voltage operation.