Patents by Inventor Arthur J. Whitman

Arthur J. Whitman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Capping layer for recrystallization process
    Patent number: 4915772
    Abstract: An improved method for crystallizing amorphous or polycrystalline material is disclosed, which method employs a novel intermediate product. A film of material to be crystallized is formed on a substrate. A porous silica cap is formed over the film. The resultant intermediate product is heated to melt the film which crystallizes upon cooling. Gases generated during melting of the film escape through the porous cap which also functions to prevent deleterious agglomeration of the material while it is in a molten state.
    Type: Grant
    Filed: October 1, 1986
    Date of Patent: April 10, 1990
    Assignee: Corning Incorporated
    Inventors: Francis P. Fehlner, Roger A. Miller, Arthur J. Whitman
  • Lenses and lens arrays
    Patent number: 4776868
    Abstract: This invention relates to a method for preparing a lens or a lens array and apparatus for carrying out the method. The method comprises directing, in line of sight in a vacuum, the vapor of a substance, which is solid and transparent at ambient temperature, from a source of that vapor through a hole in a mask to form a deposit on a substrate. The mask is so positioned between the vapor source and the substrate that obscuration by the solid portions of the mask around the hole causes the deposit to assume a curved surface and function as a lens.
    Type: Grant
    Filed: December 17, 1986
    Date of Patent: October 11, 1988
    Assignee: Corning Glass Works
    Inventors: Donald M. Trotter, Jr., Arthur J. Whitman
  • Archival optical recording medium
    Patent number: 4341863
    Abstract: An optical information storage medium comprising a thin, optically darkenable film containing silver, lead, chlorine and oxygen, produced by vapor-depositing AgCl and PbO in specified proportions on a substrate for the film, is described.
    Type: Grant
    Filed: September 25, 1980
    Date of Patent: July 27, 1982
    Assignee: Corning Glass Works
    Inventors: Nicholas F. Borrelli, Arthur J. Whitman, Peter L. Young
  • Method of forming a thin film capacitor
    Patent number: 4002545
    Abstract: A method of forming a thin film capacitor having a tantalum oxide dielectric is described. A dielectric substrate having formed thereon a duplex electrically conductive film comprising a non-tantalum electrically conductive film electrode covered by a thin tantalum film is disposed within an oxygen-inert gas containing vacuum environment, said non-tantalum film being disposed intermediate said substrate and said tantalum film. A film of tantalum oxide is applied over the conductive film by r-f sputtering of a tantalum oxide target within the oxygen-inert gas containing vacuum environment while the dielectric substrate and conductive film are being cooled. The composite may then be removed from said oxygen-inert gas containing environment and a second electrically conductive film electrode applied over the so-formed tantalum oxide film.
    Type: Grant
    Filed: February 9, 1976
    Date of Patent: January 11, 1977
    Assignee: Corning Glass Works
    Inventors: Francis P. Fehiner, Arthur J. Whitman, Peter L. Young