Patents by Inventor Artur Boesser

Artur Boesser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for enhancing the measuring accuracy when determining the coordinates of structures on a substrate
    Patent number: 7528960
    Abstract: A method for the high-precision measurement of coordinates of at least one structure on a substrate. A stage traversable in X/Y coordinate directions is provided, which is placed in an interferometric-optical measuring system. The structure on the substrate is imaged on at least one detector (34) via a measuring objective (21) having its optical axis (20) aligned in the Z coordinate direction. The structure is imaged with the so-called Dual Scan. Systematic errors can thereby be eliminated.
    Type: Grant
    Filed: May 15, 2007
    Date of Patent: May 5, 2009
    Assignee: Vistec Semiconductor Systems GmbH
    Inventors: Artur Boesser, Andreas Schaaf
  • Method for enhancing the measuring accuracy when determining the coordinates of structures on a substrate
    Publication number: 20070268496
    Abstract: A method for the high-precision measurement of coordinates of at least one structure on a substrate. A stage traversable in X/Y coordinate directions is provided, which is placed in an interferometric-optical measuring system. The structure on the substrate is imaged on at least one detector (34) via a measuring objective (21) having its optical axis (20) aligned in the Z coordinate direction. The structure is imaged with the so-called Dual Scan. Systematic errors can thereby be eliminated.
    Type: Application
    Filed: May 15, 2007
    Publication date: November 22, 2007
    Applicant: Vistec Semiconductor Systems GmbH
    Inventors: Artur Boesser, Andreas Schaaf