Abstract: Disclosed herein are system, method, and computer program product embodiments for cleaning one or more sensors of a self-driving system (SDS). For example, the SDS is provided with a sensor with a lens that is formed with a convex outer surface. A nozzle is formed with an opening to provide a liquid in a stream at a fan angle relative to a spray axis. The nozzle is spaced apart from the sensor at a distance based on a radius of the lens and the fan angle and configured to spray the liquid with laminar flow onto a proximal end of the lens such that the liquid flows across the lens from the proximal end to a distal end of the lens to remove debris.

Abstract: A cleaning device for a vehicle sensor includes: a housing having an open first end, an open second end, and a passageway extending between the open first end and the open second end; and at least one nozzle at least partially positioned within the passageway of the housing. The at least one nozzle includes an outlet that provides at least one liquid stream through the open first end of the housing towards a lens or cover of the vehicle sensor. The housing is positioned such that air streams passing through the passageway pass through the open first end of the housing towards the lens or cover of the vehicle sensor with the at least one liquid stream. A sensor assembly and sensor system including the cleaning device are also disclosed herein.

Abstract: Described herein are personal care compositions that include a surfactant system which comprises an anionic ether sulfate and an amphoteric surfactant; and a conditioning system which comprises a cationic guar gum and a polypropylene alkyl ether. Also described are methods of making and using the same.

Abstract: Hair care compositions and methods for using the same are disclosed herein. According to one aspect of the disclosure, a hair care composition is provided that includes from about 1 to about 20 wt. % of an anionic surfactant; from about 0.5 to about 5 wt. % of an amphoteric surfactant; from about 0.1 to about 7 wt. % of a nonionic surfactant; from about 0.1 to about 5 wt. % of a thickening agent, wherein the thickening agent is a natural gum; and from about 0.05 to about 4.5 wt. % of a silicone wherein the hair composition is an emulsion and all weight percentages are based on the total weight of the hair care composition. Additionally, the hair care composition may have a weight ratio for the total amount of anionic surfactant to the total amount of amphoteric surfactant that is about 5:1 to about 20:1.

Abstract: Described herein are water-dissolvable films having a non-fibrous body comprising: a quarternary salt; a polymer; and a fragrance. Methods of making and using the water-dissolvable films are also described.

Abstract: A cleansing composition comprising an aqueous solution of an anionic polymer, a nonionic polymer and a system of surfactants. Solutions as described herein comprise two distinct aqueous phases having different compositions and density. Further methods of use are also disclosed.

Abstract: Silicone-free personal care compositions and methods for the same are disclosed. The personal care composition may include an emulsifying system having one or more surfactants, one or more emollients, and one or more conditioning agents. The personal care composition may include a natural origin index of greater than 95%.

Abstract: Described herein are personal care compositions comprising a sulfate-free surfactant system and a preservative system comprising an organic acid; along with methods of making and using same.

Abstract: A cleansing composition comprising an aqueous solution of an anionic polymer, a nonionic polymer and a system of surfactants. Solutions as described herein comprise two distinct aqueous phases having different compositions and density. Further methods of use are also disclosed.

Abstract: Provided herein is an aqueous liquid dishwashing composition comprising i) at least one ethoxylated C8-C18 alkyl ether sulfate surfactant having an ethoxylation (EO) of from 0.4 to 1 and ii) at least one C8-C18 alkyl amidopropylbetaine surfactant. The ethoxylated C8-C18 alkyl ether sulfate surfactant having an ethoxylation (EO) of from 0.4 to 1 and the C8-C18 alkyl amidopropylbetaine surfactant act synergistically and provide enhanced foam production, in addition to providing a desirable viscosity, clarity and stability to the composition.

Abstract: An aqueous liquid composition, which may be used as a light duty hand dishwashing composition, comprising (i) at least one surfactant, (ii) at least one polyethylene oxide-polypropylene oxide block copolymer which is present in an amount of at least 0.4 weight % based on the weight of the composition, (iii) ethanol which is present in an amount of from 0.5 to 5 weight % based on the weight of the composition, and (iv) water. The mixture of in the polyethylene oxide-polypropylene oxide block copolymer and ethanol can inhibit or prevent gelling of the composition at a temperature below 0 C.

Abstract: Provided herein is an aqueous liquid dishwashing composition comprising i) at least one ethoxylated C8-C18 alkyl ether sulfate surfactant having an ethoxylation (EO) of from 0.4 to 1 and ii) at least one C8-C18 alkyl amidopropylbetaine surfactant. The ethoxylated C8-C18 alkyl ether sulfate surfactant having an ethoxylation (EO) of from 0.4 to 1 and the C8-C18 alkyl amidopropylbetaine surfactant act synergistically and provide enhanced foam production, in addition to providing a desirable viscosity, clarity and stability to the composition.

Abstract: An aqueous liquid composition, which may be used as a light duty hand dishwashing composition, comprising (i) at least one surfactant, (ii) at least one polyethylene oxide-polypropylene oxide block copolymer which is present in an amount of at least 0.4 weight % based on the weight of the composition, (iii) ethanol which is present in an amount of from 0.5 to 5 weight % based on the weight of the composition, and (iv) water. The mixture of in the polyethylene oxide-polypropylene oxide block copolymer and ethanol can inhibit or prevent gelling of the composition at a temperature below 0 C.

Abstract: Apparatus for retaining a wafer having improved wafer and chuck edge protection, contains an protection ring that circumscribes a pedestal and is biased to be in constant contact with the backside of the wafer. A biasing element uniformly biases the protection ring into contact with the circumferential edge of the wafer. The protection ring has an annular plan form that circumscribes an electrostatic chuck for retaining the wafer in a stationery position. Vertical travel of the ring is restricted by a hard stop that is formed by a portion of a focus ring which overhangs the protection ring. After a wafer is placed upon the chuck and the chucking force enabled, the chucking force easily overcomes the bias force upon the protection ring and the wafer rests upon the chuck support surface.

Abstract: A semiconductor processing chamber includes a substrate support member on which the substrate is positioned during processing in the chamber. To align the substrate on the substrate support member, an alignment member extends about the perimeter of the substrate receiving portion of the support member. The alignment member includes an alignment face thereon, which urges a substrate into alignment with the substrate receiving face of the support member as the substrate is deposited on the support member. The alignment member may also include a recessed portion, which ensures the presence of a gap between the edge of the substrate and the support member when the substrate contacts the support member.