Abstract: The present invention relates to dielectric coating formulation for solar module where a separate adhesive layer is not required for applying the formulation to the solar module. Preferably, the solar module is a light weight solar module.

Abstract: The present invention generally provides a processing system having a robot assembly which includes a multiple sided robot blade that can support a substrate on at least two sides thereof and associated methods to transfer one or more substrates in a processing system. An unprocessed substrate can be supported on the blade while a processed substrate is retrieved from a location to which the unprocessed substrate is to be delivered. The processing throughput rate is increased by reducing the movements required by the robot to exchange processed substrates and unprocessed substrates, thus decreasing the swap time.

Abstract: The present invention generally provides a processing system having a robot assembly which includes a multiple sided robot blade that can support a substrate on at least two sides thereof and associated methods to transfer one or more substrates in a processing system. An unprocessed substrate can be supported on the blade while a processed substrate is retrieved from a location to which the unprocessed substrate is to be delivered. The processing throughput rate is increased by reducing the movements required by the robot to exchange processed substrates and unprocessed substrates, thus decreasing the swap time.

Abstract: The present invention generally provides a processing system having a robot assembly which includes a multiple sided robot blade that can support a substrate on at least two sides thereof and associated methods to transfer one or more substrates in a processing system. An unprocessed substrate can be supported on the blade while a processed substrate is retrieved from a location to which the unprocessed substrate is to be delivered. The processing throughput rate is increased by reducing the movements required by the robot to exchange processed substrates and unprocessed substrates, thus decreasing the swap time.

Abstract: A method and an apparatus for automatically replacing a used polishing pad in a chemical mechanical polishing system are described. A controller places a mechanical device against the used polishing pad while the pad is on the polishing platen and activates a pad chucking mechanism that affixes the used pad to the mechanical device. The controller then moves the mechanical device and the pad toward a used pad receptacle, where the pad chucking mechanism is deactivated to release the used pad into the receptacle. The controller then places the mechanical device against a clean polishing pad in a clean pad dispenser and reactivates the pad chucking mechanism to affix the clean pad to the mechanical device. The mechanical device and the clean pad are moved toward the platen, where the pad chucking mechanism is deactivated to release the clean polishing pad onto the platen.