Abstract: A crystalline form DP-9 of Daprodustat is provided, where an X-ray powder diffraction pattern of the crystalline form DP-9 shows one or more characteristic peaks at 6.4, 7.2, 7.5, 12.3, 15.1, 15.5, 16.6, 18.5, 19.3, 21.0, and 27.6±0.2 2?.

Abstract: To maintain files in a retained file system, a run-time error detection code (EDC) is generated for a retained file. The run-time EDC is generated on the basis of at least one of entire content and metadata of the retained file. Further, the run-time EDC is compared with a validation EDC associated with the retained file to identify a corruption of the retained file. The validation EDC is generated at an instance of placing the retained file in the retained FS. Furthermore, the validation EDC is based on at least one of entire content and metadata of the retained file. Based on the comparison, an original version of the retained file may is restored from a trusted backup system.

Abstract: To maintain files in a retained file system, a run-time error detection code (EDC) is generated for a retained file. The run-time EDC is generated on the basis of at least one of entire content and metadata of the retained file. Further, the run-time EDC is compared with a validation EDC associated with the retained file to identify a corruption of the retained file. The validation EDC is generated at an instance of placing the retained file in the retained FS. Furthermore, the validation EDC is based on at least one of entire content and metadata of the retained file. Based on the comparison, an original version of the retained file may is restored from a trusted backup system.

Abstract: Various embodiments include approaches for modifying a design layer of an integrated circuit (IC). In some cases, an approach includes: identifying at least one empty region in a design layer used to form the IC; determining whether the at least one empty region requires a fill object; placing at least one fill object in the at least one empty region and tagging the at least one fill object in response to determining the at least one empty region requires a fill object; performing a simplified optical proximity correction (OPC) on the tagged at least one fill object and a complete OPC on the design layer; and generating a modified design layer including a corrected version of the design layer and modified fill objects after the performing of the simplified OPC on the tagged at least one fill object and the complete OPC on the design layer.

Abstract: Various embodiments include approaches for modifying a design layer of an integrated circuit (IC). In some cases, an approach includes: identifying at least one empty region in a design layer used to form the IC; determining whether the at least one empty region requires a fill object; placing at least one fill object in the at least one empty region and tagging the at least one fill object in response to determining the at least one empty region requires a fill object; performing a simplified optical proximity correction (OPC) on the tagged at least one fill object and a complete OPC on the design layer; and generating a modified design layer including a corrected version of the design layer and modified fill objects after the performing of the simplified OPC on the tagged at least one fill object and the complete OPC on the design layer.

Abstract: Various embodiments include approaches for modifying a design layer of an integrated circuit (IC). In some cases, an approach includes: identifying at least one empty region in a design layer used to form the IC; determining whether the at least one empty region requires a fill object; placing at least one fill object in the at least one empty region and tagging the at least one fill object in response to determining the at least one empty region requires a fill object; performing a simplified optical proximity correction (OPC) on the tagged at least one fill object and a complete OPC on the design layer; and generating a modified design layer including a corrected version of the design layer and modified fill objects after the performing of the simplified OPC on the tagged at least one fill object and the complete OPC on the design layer.

Abstract: To maintain files in a retained file system, a run-time error detection code (EDC) is generated for a retained file. The run-time EDC is generated on the basis of at least one of entire content and metadata of the retained file. Further, the run-time EDC is compared with a validation EDC associated with the retained file to identify a corruption of the retained file. The validation EDC is generated at an instance of placing the retained file in the retained FS. Furthermore, the validation EDC is based on at least one of entire content and metadata of the retained file. Based on the comparison, an original version of the retained file may is restored from a trusted backup system.

Abstract: Various embodiments include approaches for modifying a design layer of an integrated circuit (IC). In some cases, an approach includes: identifying at least one empty region in a design layer used to form the IC; determining whether the at least one empty region requires a fill object; placing at least one fill object in the at least one empty region and tagging the at least one fill object in response to determining the at least one empty region requires a fill object; performing a simplified optical proximity correction (OPC) on the tagged at least one fill object and a complete OPC on the design layer; and generating a modified design layer including a corrected version of the design layer and modified fill objects after the performing of the simplified OPC on the tagged at least one fill object and the complete OPC on the design layer.