Patents by Inventor Arutiun Ehiasarian

Arutiun Ehiasarian has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Coated substrate
    Patent number: 11131016
    Abstract: A coated substrate comprising a metal or metal alloy such as a high speed steel, TiAl based alloy or Ni based alloy or an electrically conductive ceramic material, wherein the coating comprises a hard material protective coating comprising alternating layers of different compositions, wherein a first composition of the alternating layers comprises silicon, Si, and/or a second composition of the alternating layers comprises boron, B.
    Type: Grant
    Filed: January 17, 2019
    Date of Patent: September 28, 2021
    Assignee: ROLLS-ROYCE plc
    Inventors: Arutiun Ehiasarian, Papken Hovsepian, David S Rickerby, Mark Dixon
  • COATED SUBSTRATE
    Publication number: 20190249291
    Abstract: A coated substrate comprising a metal or metal alloy such as a high speed steel, TiAl based alloy or Ni based alloy or an electrically conductive ceramic material, wherein the coating comprises a hard material protective coating comprising alternating layers of different compositions, wherein a first composition of the alternating layers comprises silicon, Si, and/or a second composition of the alternating layers comprises boron, B.
    Type: Application
    Filed: January 17, 2019
    Publication date: August 15, 2019
    Applicant: ROLLS-ROYCE plc
    Inventors: Arutiun EHIASARIAN, Papken HOVSEPIAN, David S. RICKERBY, Mark DIXON
  • Combined coating process comprising magnetic field-assisted, high-power, pulsed cathode sputtering and an unbalanced magnetron
    Publication number: 20050109607
    Abstract: A PVD process for coating substrates, wherein the substrate is pre-treated in the vapour of a pulsed, magnetic field-assisted cathode sputtering operation, and during pre-treatment a magnetic field arrangement of the magnetron cathode type, with a strength of the horizontal component in front of the target of 100 to 1500 Gauss, is used for magnetic field-assistance, and after pre-treatment further coating is effected by means of cathode sputtering and the power density of the pulsed discharge during pre-treatment is greater than 1000 W.cm?2.
    Type: Application
    Filed: November 20, 2003
    Publication date: May 26, 2005
    Inventors: Arutiun Ehiasarian, Papken Hovsepian, Wolf-Dieter Munz