Patents by Inventor Arwin van der Waal

Arwin van der Waal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9944776
    Abstract: In order to provide a rubber composition having high transparency, toughness and heat-resisting property, the present invention can provide a composition comprising a neodymium-catalyzed isoprene rubber (IR) component; and a rubber polymer (RB) component selected from the group consisting of BR, 1,2-polybutadiene rubber, and SBR, wherein the amount of IR is from about 5 to 95 mass parts with the proviso that the total amount of IR and RB is 100 mass parts, wherein the composition is substantially free of silica, wherein the composition has haze of less than about 20%, and wherein the composition has Type A Durometer hardness (0 sec) of about 30 or more.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: April 17, 2018
    Assignee: Kraton Polymers U.S. LLC
    Inventors: Fumio Naito, Yoshikatsu Nakazawa, Norio Masuko, Arwin van der Waal
  • Publication number: 20160060437
    Abstract: In order to provide a rubber composition having high transparency, toughness and heat-resisting property, the present invention can provide a composition comprising a neodymium-catalyzed isoprene rubber (IR) component; and a rubber polymer (RB) component selected from the group consisting of BR, 1,2-polybutadiene rubber, and SBR, wherein the amount of IR is from about 5 to 95 mass parts with the proviso that the total amount of IR and RB is 100 mass parts, wherein the composition is substantially free of silica, wherein the composition has haze of less than about 20%, and wherein the composition has Type A Durometer hardness (0 sec) of about 30 or more.
    Type: Application
    Filed: August 24, 2015
    Publication date: March 3, 2016
    Applicant: KRATON POLYMERS U.S. LLC
    Inventors: Fumio NAITO, Yoshikatsu Nakazawa, Norio Masuko, Arwin van der Waal