Patents by Inventor Asako Ogasawara

Asako Ogasawara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11578028
    Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). In the formula, R1 represents one or two groups selected from groups below, D1 represents a polymerizable unsaturated group represented by chemical formula D1-1 or D1-2 below, R2 represents a hydrogen atom or a methyl group, m1 and m2 represent 1 to 2, A1 represents an alkylene group with 2 to 4 carbon atoms, and m3 represents 1 to 100.
    Type: Grant
    Filed: August 22, 2017
    Date of Patent: February 14, 2023
    Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Masatake Joyabu, Kei Shiohara, Asako Ogasawara, Takuro Kimura, Chi Tao
  • Publication number: 20220372220
    Abstract: Provided is a surfactant composition that can impart good polymerization stability, that can yield an aqueous resin dispersion having good wettability, and that can improve water resistance and water-resistant adhesive strength of a resin film formed from the aqueous resin dispersion. The surfactant composition according to the present invention includes a compound C1 represented by formula (1): (in formula (1), A1 represents an alkylene group having 10 to 14 carbon atoms, A2 represents an alkylene group having 2 to 4 carbon atoms, n is an average number of moles of an oxyalkylene group A2O added and is a number of 1 to 100, and X represents a hydrogen atom, a sulfate ester or a salt thereof, a phosphate ester or a salt thereof, or methylcarboxylic acid or a salt thereof); and a compound C2 represented by formula (2): (in formula (2), A1, A2, n, and X are as defined in formula (1)). A molar ratio C1/C2 of the compound C1 to the compound C2 is 99/1 to 84/16.
    Type: Application
    Filed: September 23, 2020
    Publication date: November 24, 2022
    Applicant: DKS Co. Ltd.
    Inventors: Masatake JOYABU, Kei SHIOHARA, Asako OGASAWARA, Takuro KIMURA, Chi TAO
  • Patent number: 10940453
    Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). R1 represents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100.
    Type: Grant
    Filed: August 22, 2017
    Date of Patent: March 9, 2021
    Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Masatake Joyabu, Kei Shiohara, Asako Ogasawara, Takuro Kimura, Chi Tao
  • Publication number: 20200331830
    Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). In the formula, R1 represents one or two groups selected from groups below, D1 represents a polymerizable unsaturated group represented by chemical formula D1-1 or D1-2 below, R2 represents a hydrogen atom or a methyl group, m1 and m2 represent 1 to 2, A1 represents an alkylene group with 2 to 4 carbon atoms, and m3 represents 1 to 100.
    Type: Application
    Filed: August 22, 2017
    Publication date: October 22, 2020
    Inventors: Masatake JOYABU, Kei SHIOHARA, Asako OGASAWARA, Takuro KIMURA, Chi TAO
  • Publication number: 20200199277
    Abstract: Provided is a copolymer that can be used as a dispersant having high dispersibility and high slump retention capability. A copolymer according to an embodiment is a water-soluble copolymer that contains, as constituent monomers, at least one monomer selected from a monomer (A) represented by formula (1) and a monomer (B) represented by formula (2), and at least one monomer (C) selected from an unsaturated carboxylic acid monomer (C-1) and an oxyethylene group-containing unsaturated carboxylic acid ester (C-2). The content of the monomer (C) is 20 mass % or more and 99 mass % or less.
    Type: Application
    Filed: September 15, 2018
    Publication date: June 25, 2020
    Applicant: DAI-ICHI KOGYO SEIYAKU CO., LTD
    Inventors: Masatake JOYABU, Kei SHIOHARA, Asako OGASAWARA, Takuro KIMURA, Chi TAO, Yuki TAKAMACHI
  • Patent number: 10457754
    Abstract: The present invention relates to an aqueous resin dispersion, obtained by subjecting a polymerizable compound (C) containing a compound (C1) having a carbon-carbon unsaturated bond to an emulsion polymerization in the presence of a surfactant (A) and a surfactant (B) free from a radical-polymerizable substituent.
    Type: Grant
    Filed: October 28, 2015
    Date of Patent: October 29, 2019
    Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Asako Ogasawara, Toshio Kagimasa, Masatake Joyabu
  • Publication number: 20190217265
    Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). R1 represents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100.
    Type: Application
    Filed: August 22, 2017
    Publication date: July 18, 2019
    Applicant: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Masatake JOYABU, Kei SHIOHARA, Asako OGASAWARA, Takuro KIMURA, Chi TAO
  • Patent number: 10280341
    Abstract: The present invention relates to an adhesive agent composition, containing an aqueous resin dispersion obtained by subjecting a polymerizable compound (C) containing a compound (C1) having a carbon-carbon unsaturated bond to an emulsion polymerization in the presence of a surfactant (A) and a surfactant (B) free from a radical-polymerizable substituent.
    Type: Grant
    Filed: October 28, 2015
    Date of Patent: May 7, 2019
    Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Asako Ogasawara, Shigeru Kigasawa, Masatake Joyabu
  • Publication number: 20170327602
    Abstract: The present invention relates to an aqueous resin dispersion, obtained by subjecting a polymerizable compound (C) containing a compound (C1) having a carbon-carbon unsaturated bond to an emulsion polymerization in the presence of a surfactant (A) and a surfactant (B) free from a radical-polymerizable substituent.
    Type: Application
    Filed: October 28, 2015
    Publication date: November 16, 2017
    Applicant: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Asako OGASAWARA, Toshio KAGIMASA, Masatake JOYABU
  • Publication number: 20170306192
    Abstract: The present invention relates to an adhesive agent composition, containing an aqueous resin dispersion obtained by subjecting a polymerizable compound (C) containing a compound (C1) having a carbon-carbon unsaturated bond to an emulsion polymerization in the presence of a surfactant (A) and a surfactant (B) free from a radical-polymerizable substituent.
    Type: Application
    Filed: October 28, 2015
    Publication date: October 26, 2017
    Applicant: Dai-Ichi Kogyo Seiyaku Co., Ltd.
    Inventors: Asako OGASAWARA, Shigeru KIGASAWA, Masatake JOYABU
  • Patent number: 9637563
    Abstract: A reactive surfactant composition comprising one or more kinds of reactive surfactants is disclosed that may be used as an emulsifier for emulsion polymerization, a dispersant for suspension polymerization, a nonaqueous dispersant, or a resin modifier.
    Type: Grant
    Filed: June 19, 2014
    Date of Patent: May 2, 2017
    Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventor: Asako Ogasawara
  • Patent number: 9376510
    Abstract: A reactive emulsifier comprising a compound of formula (I), which makes polymerization stability satisfactory and is capable of improving the water resistance etc. of the polymer film to be obtained. In the formula (I), D represents a polymerizable unsaturated group represented by the chemical formula D-1 or D-2; m1 represents a number of 1 or larger; R1 represents an alkyl group having 1 to 12 carbon atoms; m2 represents a number of 0 to 4; and the sum of m1 and m2 is 1 to 5. R2 represents a hydrocarbon group having 6 to 30 carbon atoms; A represents either an alkylene group or a substituted alkylene group which has 2 to 4 carbon atoms; and n is in the range of 0 to 1,000. X represents a hydrogen atom or an anionic hydrophilic group which is —(CH2)a—SO3M etc. R3 represents a hydrogen atom or methyl.
    Type: Grant
    Filed: September 18, 2012
    Date of Patent: June 28, 2016
    Assignee: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Asako Ogasawara, Masayuki Hashimoto
  • Patent number: 9353195
    Abstract: An emulsifier for emulsion polymerization includes a compound represented by the following general: X=H, —(CH2)a—SO3M, —(CH2)b—COOM, —PO3M2, —P(B)O2M, or —CO—CH2—CH(SO3M)-COOM Y= Z=
    Type: Grant
    Filed: December 12, 2012
    Date of Patent: May 31, 2016
    Assignee: Dai-Ichi Kogyo Seiyaku Co., Ltd.
    Inventors: Asako Ogasawara, Masayuki Hashimoto
  • Publication number: 20160137755
    Abstract: A reactive surfactant composition comprising one or more kinds of reactive surfactants is disclosed that may be used as an emulsifier for emulsion polymerization, a dispersant for suspension polymerization, a nonaqueous dispersant, or a resin modifier.
    Type: Application
    Filed: June 19, 2014
    Publication date: May 19, 2016
    Applicant: DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventor: Asako OGASAWARA
  • Patent number: 9199902
    Abstract: An emulsifier for emulsion polymerization contains a compound represented by the following general formula (I).
    Type: Grant
    Filed: July 9, 2014
    Date of Patent: December 1, 2015
    Assignee: Dai-Ichi Kogyo Seiyaku co., Ltd.
    Inventors: Asako Ogasawara, Masayuki Hashimoto
  • Patent number: 9102603
    Abstract: An emulsifier for emulsion polymerization contains a compound represented by the following general formula (I).
    Type: Grant
    Filed: January 9, 2013
    Date of Patent: August 11, 2015
    Assignee: Dai-Ichi Kogyo Seiyaku Co., Ltd.
    Inventors: Asako Ogasawara, Masayuki Hashimoto
  • Patent number: 9006334
    Abstract: As a manufacturing method of a stable coumarone-indene resin water-dispersed composition which does not use an organic solvent, can be applied to various resin compositions, enhance sticky and adhesive properties, water resistance, heat resistance, and compatibility, and achieve consideration of health and safety of operators, arrangement of a work environment, and cost reduction relating to exhaust gas treatment, a manufacturing method which includes a process of dispersing a coumarone-indene resin which contains 50% by weight or more of coumarone and indene in total as monomer-constituents and is in a solid form at an ordinary temperature in the presence of a surfactant by a wet milling and dispersing method is used.
    Type: Grant
    Filed: November 7, 2011
    Date of Patent: April 14, 2015
    Assignees: Dai-Ichi Kogyo Seiyaku Co., Ltd., Nitto Chemical Co., Ltd.
    Inventors: Masayuki Hashimoto, Asako Ogasawara, Tadashi Kimura, Kimiko Izumi
  • Publication number: 20150038654
    Abstract: An emulsifier for emulsion polymerization includes a compound represented by the following general: X=H, —(CH2)a—SO3M, —(CH2)b—COOM, —PO3M2, —P(B)O2M, or —CO—CH2—CH(SO3M)-COOM Y= Z=
    Type: Application
    Filed: December 12, 2012
    Publication date: February 5, 2015
    Inventors: Asako Ogasawara, Masayuki Hashimoto
  • Publication number: 20150011790
    Abstract: An emulsifier for emulsion polymerization contains a compound represented by the following general formula (I).
    Type: Application
    Filed: January 9, 2013
    Publication date: January 8, 2015
    Inventors: Asako Ogasawara, Masayuki Hashimoto
  • Publication number: 20140323753
    Abstract: An emulsifier for emulsion polymerization contains a compound represented by the following general formula (I).
    Type: Application
    Filed: July 9, 2014
    Publication date: October 30, 2014
    Inventors: Asako OGASAWARA, Masayuki HASHIMOTO