Patents by Inventor Asami Funatsu

Asami Funatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140090199
    Abstract: A cleaning sheet comprising a cleaning layer and a releasable protective film laminated on the cleaning layer, wherein each of the relative intensities of the fragment ions of CH3Si+, C3H9Si+, C5H15Si2O+, C5H15Si3O3+, C7H21Si3O2+, CH3SiO?, CH3SiO2? and Si+ in the cleaning layer, when the protective film is peeled off the cleaning layer, is 0.1 or less according to time-of-flight secondary ion mass spectrometry, relative to C2H3+ in the case of positive ion or O? in the case of negative ion.
    Type: Application
    Filed: September 27, 2013
    Publication date: April 3, 2014
    Applicant: NITTO DENKO CORPORATION
    Inventors: Yoshio TERADA, Makoto NAMIKAWA, Daisuke UENDA, Asami FUNATSU
  • Publication number: 20140090196
    Abstract: A cleaning sheet comprising a cleaning layer and a releasable protective film laminated on the cleaning layer, wherein each of the relative intensities of the fragment ions Of CH3Si+, C3H9Si+, C5H15Si2O+, C5H15Si3O3+, CH3SiO?, CH3SiO2? and Si+ in the cleaning layer, when the protective film is peeled off the cleaning layer, is 0.1 or less according to time-of-flight secondary ion mass spectrometry, relative to C2H3+ in the case of positive ion or O? in the case of negative ion.
    Type: Application
    Filed: September 27, 2013
    Publication date: April 3, 2014
    Applicant: NITTO DENKO CORPORATION
    Inventors: Yoshio TERADA, Makoto NAMIKAWA, Daisuke UENDA, Asami FUNATSU
  • Publication number: 20100319151
    Abstract: A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.
    Type: Application
    Filed: August 6, 2010
    Publication date: December 23, 2010
    Applicant: NITTO DENKKO CORPORATION
    Inventors: Makoto Namikawa, Yoshio Terada, Jirou Nukaga, Eiji Toyoda, Hirofumi Fujii, Daisuke Uenda, Asami Funatsu, Nobuaki Maruoka, Hitoshi Ishizaka, Yasuhiro Amano
  • Patent number: 7793668
    Abstract: A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.
    Type: Grant
    Filed: December 20, 2004
    Date of Patent: September 14, 2010
    Assignee: Nitto Denko Corporation
    Inventors: Makoto Namikawa, Yoshio Terada, Jirou Nukaga, Eiji Toyoda, Hirofumi Fujii, Daisuke Uenda, Asami Funatsu, Nobuaki Maruoka, Hitoshi Ishizaka, Yasuhiro Amano
  • Publication number: 20060105164
    Abstract: A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.
    Type: Application
    Filed: September 20, 2005
    Publication date: May 18, 2006
    Inventors: Makoto Namikawa, Yoshio Terada, Jirou Nukaga, Eiji Toyoda, Hirofumi Fujii, Daisuke Uenda, Asami Funatsu, Nobuaki Maruoka, Hitoshi Ishizaka, Yasuhiro Amano
  • Publication number: 20050244632
    Abstract: A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.
    Type: Application
    Filed: December 20, 2004
    Publication date: November 3, 2005
    Inventors: Makoto Namikawa, Yoshio Terada, Jirou Nukaga, Eiji Toyoda, Hirofumi Fujii, Daisuke Uenda, Asami Funatsu, Nobuaki Maruoka, Hitoshi Ishizaka, Yasuhiro Amano
  • Publication number: 20040204334
    Abstract: A cleaning sheet comprising a cleaning layer and a releasable protective film laminated on the cleaning layer, wherein each of the relative intensities of the fragment ions of CH3Si+, C3H9Si+, C5H15Si2O+, C5H15Si3O3+, C7H21Si3O2+, CH3SiO−, CH3SiO2− and Si+ in the cleaning layer, when the protective film is peeled off the cleaning layer, is 0.1 or less according to time-of-flight secondary ion mass spectrometry, relative to C2H3+ in the case of positive ion or O− in the case of negative ion.
    Type: Application
    Filed: April 14, 2004
    Publication date: October 14, 2004
    Applicant: NITTO DENKO CORPORATION
    Inventors: Yoshio Terada, Makoto Namikawa, Daisuke Uenda, Asami Funatsu