Abstract: Methods and apparatus for correcting defects, such as rounded corners and line end shortening, in patterns formed via lithography are provided. Such defects are compensated for “post-rasterization” by manipulating the grayscale values of pixel maps.

Abstract: Methods and apparatus for correcting defects, such as rounded corners and line end shortening, in patterns formed via photolithography are provided. Such defects are compensated for “post-rasterization” by manipulating the grayscale values of pixel maps.

Abstract: An algorithm (method) for sizing (adjusting edges 01) grayscale or dose level pixel-maps (raster images) real time for input into radiant beam lithography systems or similar dose level grayscale image rendering systems to compensate for systemic distortions such as edge bias and/or loss of linearity (i) successively assembles one or more frame matrixes of grayscale values from a parent pixel-map having edges and corners where an edge is defined by gray pixels having values between 1, 2, . . .

Abstract: Systems and methods for gray scale lithography for defining edges such as on microelectronic device patterns during integrated circuit fabrication are disclosed. Methods for critical dimension edge placement and slope enhancement utilize central pixel dose addition or modulated inner pixels. A method for gray scale lithography for defining edges of features generally comprises identifying a center pixel of a feature, exposing the general width of the feature including the identified center pixel with full doses, and enhancing the identified center pixel by exposing the identified center pixel with additional dose to accurately place the edge of the feature, whereby the edge of the feature is defined and moved by exposing the center pixel with the additional dose.

Abstract: Methods and apparatus for correcting defects, such as rounded corners and line end shortening, in patterns formed via lithography are provided. Such defects are compensated for “post-rasterization” by manipulating the grayscale values of pixel maps.

Abstract: Methods and apparatus for correcting defects, such as rounded corners and line end shortening, in patterns formed via photolithography are provided. Such defects are compensated for “post-rasterization” by manipulating the grayscale values of pixel maps.

Abstract: A pattern generation method and system in which hierarchical image data (determining a pattern to be imaged on a target) is received at a graphics engine having a memory, at least one cell determining a repeated feature or set of features of the pattern is stored in the memory, and beam control data is generated in response to the image data. The image data includes residual data including at least two subroutine call commands for each cell stored in the memory. In response to each subroutine call command, the graphics engine retrieves a cell (identified by the command) from the memory, and asserts beam control data that determines a feature or feature set determined by the cell to be imaged at (or beginning at) a location on the target identified by the command. The subroutine call commands can be distributed throughout the image data, including in at least one cell to be cached as well as in the residual data.

Abstract: Systems and methods for gray scale lithography for defining edges such as on microelectronic device patterns during integrated circuit fabrication are disclosed. Methods for critical dimension edge placement and slope enhancement utilize central pixel dose addition or modulated inner pixels. A method for gray scale lithography for defining edges of features generally comprises identifying a center pixel of a feature, exposing the general width of the feature including the identified center pixel with full doses, and enhancing the identified center pixel by exposing the identified center pixel with additional dose to accurately place the edge of the feature, whereby the edge of the feature is defined and moved by exposing the center pixel with the additional dose.

Abstract: An algorithm (method) for sizing (adjusting edges of) grayscale or dose level pixel-maps (raster images) real time for input into radiant beam lithography systems or similar dose level grayscale image rendering systems to compensate for systemic distortions such as edge bias and/or loss of linearity (i) successively assembles one or more frame matrixes of grayscale values from a parent pixel-map having edges and corners where an edge is defined by gray pixels having values between 1, 2, . . .

Abstract: A pattern generation method and system in which hierarchical image data (determining a pattern to be imaged on a target) is received at a graphics engine having a memory, at least one cell determining a repeated feature or set of features of the pattern is stored in the memory, and beam control data is generated in response to the image data. The image data includes residual data including at least two subroutine call commands for each cell stored in the memory. In response to each subroutine call command, the graphics engine retrieves a cell (identified by the command) from the memory, and asserts beam control data that determines a feature or feature set determined by the cell to be imaged at (or beginning at) a location on the target identified by the command. The subroutine call commands can be distributed throughout the image data, including in at least one cell to be cached as well as in the residual data.