Patents by Inventor Ashraf F. Bastawros

Ashraf F. Bastawros has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9624591
    Abstract: Focused Electric Field Imprinting (FEFI) provides a focused electric field to guide an unplating operation and/or a plating operation to form very fine-pitched metal patterns on a substrate. The process is a variation of the electrochemical unplating process, wherein the process is modified for imprinting range of patterns of around 2000 microns to 20 microns or less in width, and from about 0.1 microns or less to 10 microns or more in depth. Some embodiments curve a proton-exchange membrane whose shape is varied using suction on a backing fluid through a support mask. Other embodiments use a curved electrode. Mask-membrane interaction parameters and process settings vary the feature size, which can generate sub-100-nm features. The feature-generation process is parallelized, and a stepped sequence of such FEFI operations, can generate sub-100-nm lines with sub-100-nm spacing. The described FEFI process is implemented on copper substrate, and also works well on other conductors.
    Type: Grant
    Filed: October 6, 2015
    Date of Patent: April 18, 2017
    Assignee: Actus Potentia, Inc.
    Inventors: Ambar K. Mitra, Ashraf F. Bastawros, Abhijit Chandra, Charles A. Lemaire
  • Publication number: 20160090660
    Abstract: Focused Electric Field Imprinting (FEFI) provides a focused electric field to guide an unplating operation and/or a plating operation to form very fine-pitched metal patterns on a substrate. The process is a variation of the electrochemical unplating process, wherein the process is modified for imprinting range of patterns of around 2000 microns to 20 microns or less in width, and from about 0.1 microns or less to 10 microns or more in depth. Some embodiments curve a proton-exchange membrane whose shape is varied using suction on a backing fluid through a support mask. Other embodiments use a curved electrode. Mask-membrane interaction parameters and process settings vary the feature size, which can generate sub-100-nm features. The feature-generation process is parallelized, and a stepped sequence of such FEFI operations, can generate sub-100-nm lines with sub-100-nm spacing. The described FEFI process is implemented on copper substrate, and also works well on other conductors.
    Type: Application
    Filed: October 6, 2015
    Publication date: March 31, 2016
    Inventors: Ambar K. Mitra, Ashraf F. Bastawros, Abhijit Chandra, Charles A. Lemaire
  • Patent number: 9150979
    Abstract: Focused Electric Field Imprinting (FEFI) provides a focused electric field to guide an unplating operation and/or a plating operation to form very fine-pitched metal patterns on a substrate. The process is a variation of the electrochemical unplating process, wherein the process is modified for imprinting range of patterns of around 2000 microns to 20 microns or less in width, and from about 0.1 microns or less to 10 microns or more in depth. Some embodiments curve a proton-exchange membrane whose shape is varied using suction on a backing fluid through a support mask. Other embodiments use a curved electrode. Mask-membrane interaction parameters and process settings vary the feature size, which can generate sub-100-nm features. The feature-generation process is parallelized, and a stepped sequence of such FEFI operations, can generate sub-100-nm lines with sub-100-nm spacing. The described FEFI process is implemented on copper substrate, and also works well on other conductors.
    Type: Grant
    Filed: December 31, 2013
    Date of Patent: October 6, 2015
    Assignee: Actus Potentia, Inc.
    Inventors: Ambar K. Mitra, Ashraf F. Bastawros, Abhijit Chandra, Charles A. Lamaire
  • Patent number: 8683803
    Abstract: A method and apparatus for generating power which includes a phase-change media (PCM) that expands upon cooling contained within an expandable capsule if the phase change involves solidification (if phase change is solid-solid, then capsules are not needed), a carrier liquid that does not freeze in the operating temperature range, a heat exchanger, and an engine. Alternatively, the method and apparatus can include a PCM contained within a layer next to the walls of a constant volume container, a working liquid within the container that does not freeze in the operating temperature range, a heat exchanger, and an engine. In both cases, the engine denotes a device that converts the energy in the high-pressure liquid into electrical or mechanical power.
    Type: Grant
    Filed: January 24, 2008
    Date of Patent: April 1, 2014
    Inventors: Ashraf F. Bastawros, Abhijit Chandra, Tom I-Ping Shih
  • Patent number: 8617378
    Abstract: Focused Electric Field Imprinting (FEFI) provides a focused electric field to guide an unplating operation and/or a plating operation to form very fine-pitched metal patterns on a substrate. The process is a variation of the electrochemical unplating process, wherein the process is modified for imprinting range of patterns of around 2000 microns to 20 microns or less in width, and from about 0.1 microns or less to 10 microns or more in depth. Some embodiments curve a proton-exchange membrane whose shape is varied using suction on a backing fluid through a support mask. Other embodiments use a curved electrode. Mask-membrane interaction parameters and process settings vary the feature size, which can generate sub-100-nm features. The feature-generation process is parallelized, and a stepped sequence of such FEFI operations, can generate sub-100-nm lines with sub-100-nm spacing. The described FEFI process is implemented on copper substrate, and also works well on other conductors.
    Type: Grant
    Filed: August 16, 2011
    Date of Patent: December 31, 2013
    Assignee: Actus Potentia, Inc.
    Inventors: Ambar K. Mitra, Ashraf F. Bastawros, Abhijit Chandra, Charles A. Lemaire
  • Patent number: 7998323
    Abstract: A Focused Electric Field Imprinting (FEFI) process and apparatus provides a focused electric field to guide an unplating operation and/or a plating operation to form very fine-pitched metal patterns on a substrate. The process is a variation of the electrochemical unplating process, wherein the process is modified for imprinting range of patterns of around 2000 microns to 20 microns or less in width, and from about 0.1 microns or less to 10 microns or more in depth. Some embodiments curve a proton-exchange membrane whose shape is varied using suction on a backing fluid through a support mask. Other embodiments use a curved electrode. Mask-membrane interaction parameters and process settings vary the feature size, which can generate sub-100-nm features. The feature-generation process is parallelized, and a stepped sequence of such FEFI operations, can generate sub-100 nm lines with sub-100 nm spacing. The described FEFI process is implemented on copper substrate, and also works well on other conductors.
    Type: Grant
    Filed: June 7, 2007
    Date of Patent: August 16, 2011
    Assignee: Actus Potentia, Inc.
    Inventors: Abhijit Chandra, Ashraf F. Bastawros, Ambar K. Mitra, Charles A. Lemaire