Patents by Inventor Ashwin Purohit

Ashwin Purohit has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Workpiece handling scan arm for ion implantation system
    Patent number: 7560705
    Abstract: An ion implantation apparatus, system, and method are provided for connecting and disconnecting a workpiece holder from a scan arm. A twist head is provided, wherein an electrostatic chuck is operable to be mounted, wherein one or more rotating and non-rotating members associated with one or more of the twist head and electrostatic chuck have one or more dynamic electrical and fluid rotary connections associated therewith. The electrostatic chuck is further operable to be removed from the twist head without disconnecting the one or more dynamic fluid seals.
    Type: Grant
    Filed: August 17, 2007
    Date of Patent: July 14, 2009
    Assignee: Axcelis Technologies, Inc.
    Inventors: Ari Eiriksson, Donovan Beckel, Robert Mitchell, Michel Pharand, Marvin LaFontaine, Ashwin Purohit, Steven Weed, Wayne Arseneault, Shantanu Pathak, Joseph Daniel Foley
  • WORKPIECE HANDLING SCAN ARM FOR ION IMPLANTATION SYSTEM
    Publication number: 20080105836
    Abstract: An ion implantation apparatus, system, and method are provided for connecting and disconnecting a workpiece holder from a scan arm. A twist head is provided, wherein an electrostatic chuck is operable to be mounted, wherein one or more rotating and non-rotating members associated with one or more of the twist head and electrostatic chuck have one or more dynamic electrical and fluid rotary connections associated therewith. The electrostatic chuck is further operable to be removed from the twist head without disconnecting the one or more dynamic fluid seals.
    Type: Application
    Filed: August 17, 2007
    Publication date: May 8, 2008
    Inventors: Ari Eiriksson, Donovan Beckel, Robert Mitchell, Michel Pharand, Marvin LaFontaine, Ashwin Purohit, Steven Weed, Wayne Arseneault, Shantanu Pathak, Joseph Foley
  • Ion beam incidence angle and beam divergence monitor
    Patent number: 6690022
    Abstract: A device for measuring an incidence angle of an ion beam impinging a planar substrate includes an aperture plate having an aperture for intercepting the ion beam and passing a beam portion therethrough, and a sensor located in the substrate plane or a plane parallel thereto behind the aperture plate and having a length along which the beam portion impinges on the sensor at a location which is a function of the incidence angle of the ion beam, the sensor configured to produce a sensor signal indicative of the location of impingement of the beam portion on the sensor and representative of incidence angle. A computing unit may be configured to compare the sensor signal to a predetermined function for determining the incidence angle of the ion beam. Spaced apart sensing devices may be used to determine beam divergence.
    Type: Grant
    Filed: January 16, 2002
    Date of Patent: February 10, 2004
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Grant Kenji Larsen, Ashwin Purohit, Robert A. Poitras, Morgan Evans, Damian Brennan
  • In situ ion beam incidence angle and beam divergence monitor
    Publication number: 20020121889
    Abstract: A device for measuring an incidence angle of an ion beam impinging a planar substrate includes an aperture plate having an aperture for intercepting the ion beam and passing a beam portion therethrough, and a sensor located in the substrate plane or a plane parallel thereto behind the aperture plate and having a length along which the beam portion impinges on the sensor at a location which is a function of the incidence angle of the ion beam, the sensor configured to produce a sensor signal indicative of the location of impingement of the beam portion on the sensor and representative of incidence angle. A computing unit may be configured to compare the sensor signal to a predetermined function for determining the incidence angle of the ion beam. Spaced apart sensing devices may be used to determine beam divergence.
    Type: Application
    Filed: January 16, 2002
    Publication date: September 5, 2002
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Grant Kenji Larsen, Ashwin Purohit, Robert A. Poitras, Morgan Evans, Damian Brennan