Patents by Inventor Asim Maner

Asim Maner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5425754
    Abstract: In an infrared radiation lamp, the optical path has provided therein a cuvette which is filled with a liquid containing water and a fungicidal agent. The cuvette consists of two opposite transparent panes and a casing receiving said panes. The liquid inside the cuvette is a buffer solution with a pH of 7, preferably based on phosphate.
    Type: Grant
    Filed: March 8, 1994
    Date of Patent: June 20, 1995
    Assignee: Maxs AG
    Inventors: Werner Braun, Asim Maner, Jerry Rzeznik
  • Patent number: 5240587
    Abstract: The present invention relates to a method of producing a filter material and to a filter material produced by the described method. The method comprises the steps of providing a substrate and forming an electrically conductive structure on the substrate. Electrical insulating, fiber-like flock rods are then anchored to the substrate. A metal layer is then formed over the substrate and around the flock rods by electrodepositing. The substrate is separated from the electrodeposited metal layer and the flock rods are removed from the electrodeposited metal layer to produce a metal filter with microapertures traversing the thickness of the filter.
    Type: Grant
    Filed: July 6, 1992
    Date of Patent: August 31, 1993
    Assignee: Maxs AG
    Inventor: Asim Maner
  • Patent number: 5213849
    Abstract: A method of producing a flat, reinforced article with micro-openings is described wherein at least one reinforcing layer is applied to a basic layer. To be able to carry out such a method in an easy and inexpensive way, the following steps should be taken: Coating a prefabricated basic layer at both sides with a radiosensitive resist in such a way that the resist fills the micro-openings, irradiating the basic layer provided with the resist from one side in such a way that the radiation passes through the resist in the micro-openings, removing the resist from the basic-layer regions to be provided with the reinforcing layer, applying the reinforcing layer and subsequently removing the remaining resist.
    Type: Grant
    Filed: November 19, 1991
    Date of Patent: May 25, 1993
    Assignee: Maxs AG
    Inventor: Asim Maner
  • Patent number: 5055163
    Abstract: The invention relates to a process for producing a two-dimensionally extending metallic microstructure body having a multitude of minute openings the dimensions and distribution of which may be predetermined. A tool having microstructures on the surface thereof, which microstructures taper outwardly, is pressed into the electrically insulating layer of a molding material comprising an electrically insulating layer and an electrically conducting layer, so that the microstructures project at least through the insulating layer, to form an impression in the molding material. The tool is withdrawn from the molding material to form an impression in the molding material comprised of openings which taper in the direction of the electrically conducting layer.
    Type: Grant
    Filed: December 18, 1989
    Date of Patent: October 8, 1991
    Assignee: Kernforschungszentrum Karlsruhe GmbH
    Inventors: Wilhelm Bier, Asim Maner, Klaus Schubert
  • Patent number: 5045439
    Abstract: A process for the lithographic manufacture of electroformable microstructure having a triangular or trapezoidal cross-section from a resist material.A composite body is provided which is comprised of a layer of resist material on an electrically conductive substrate. The resist layer is irradiated to form irradiated band regions in the resist layer by conducting a first irradiation in which the substrate having the resist layer thereon is positioned at an angle of +.alpha. relative to a plane orthogonal to the incident radiation to form a first set of band-shaped regions, and a second irradiation in which the substrate is positioned at an angle of -.alpha. relative to a plane orthogonal to the incident radiation to form a second set of band-shaped regions which overlap the first set at the interface between the resist layer and the substrate. The irradiated regions of the resist layer are developed to produce microstructures.
    Type: Grant
    Filed: December 18, 1989
    Date of Patent: September 3, 1991
    Assignee: Kernforschungszentrum Karlsruhe GmbH
    Inventors: Asim Maner, Jurgen Mohr
  • Patent number: 4981558
    Abstract: A process for reproducing a structured, plate-shaped body, comprising the steps of: (a) providing a composite body containing an electrically insulating molding compound layer and an electrically conducting molding compound layer, (b) pressing a first microstructured body, having an outer face, into the electrically insulating molding compound layer while applying ultrasound so that the outer face of the first microstructured body projects into the electrically conducting layer, (c) removing the first microstructured body from the composite body while applying ultrasound to form an impression in the composite body, (d) electroplating a metal into the impression in the composite body to fill the impression with metal and form a second microstructured body, and (e) removing the composite body from the second microstructured body.
    Type: Grant
    Filed: December 18, 1989
    Date of Patent: January 1, 1991
    Assignee: Kernforschungszentrum Karlsruhe GmbH
    Inventor: Asim Maner
  • Patent number: 4698285
    Abstract: A method for producing a mask for deep-etch x-ray lithography in which the mask pattern of a thin-film mask having thin absorber structures is transferred by recopying with soft X-ray radiation to an X-ray resist layer whose layer thickness corresponds to the thickness of the absorber structures of the mask to be subsequently produced. Transfer errors during recopying are avoided by producing the thin-film mask directly on one side of a carrier membrane; applying a positive X-ray resist layer on the other side of the carrier membrane; irradiating the positive X-ray resist layer with approximately parallel X-ray radiation through the thin-film mask to produce irradiated portions in the positive X-ray resist layer; removing the irradiated portions of the positive X-ray resist layer to expose portions of the carrier membrane; electrolytically depositing elements having a high atomic number, e.g.
    Type: Grant
    Filed: August 20, 1986
    Date of Patent: October 6, 1987
    Assignee: Kernforschungszentrum Karlsruhe GmbH
    Inventors: Wolfgang Ehrfeld, Asim Maner, Dietrich Munchmeyer
  • Patent number: 4661212
    Abstract: In order to produce a plurality of plate shaped metal bodies containing a microstructure from a single molding tool constituting a master for the bodies, a negative mold is formed by filling the recesses in the microstructure of the tool with electrically insulating material and fastening to the insulating material an electrically conductive material which contacts the end faces of the microstructure of the tool.
    Type: Grant
    Filed: September 3, 1986
    Date of Patent: April 28, 1987
    Assignee: Kernforschungszentrum Kalrsruhe GmbH
    Inventors: Wolfgang Ehrfeld, Peter Hagmann, Asim Maner, Dietrich Munchmeyer, Erwin Becker