Patents by Inventor Asli Sahin
Asli Sahin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11810870Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a moisture seal for photonic devices and methods of manufacture. The structure includes: a first trench in at least one substrate material; a guard ring structure with an opening and which at least partially surrounds the first trench; and a second trench at a dicing edge of the substrate, the second trench being lined on sidewalls with barrier material and spacer material over the barrier material.Type: GrantFiled: December 23, 2022Date of Patent: November 7, 2023Assignee: GLOBALFOUNDRIES U.S. INC.Inventors: Asli Sahin, Thomas F. Houghton, Jennifer A. Oakley, Jeremy S. Alderman, Karen A. Nummy, Zhuojie Wu
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Publication number: 20230126719Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a moisture seal for photonic devices and methods of manufacture. The structure includes: a first trench in at least one substrate material; a guard ring structure with an opening and which at least partially surrounds the first trench; and a second trench at a dicing edge of the substrate, the second trench being lined on sidewalls with barrier material and spacer material over the barrier material.Type: ApplicationFiled: December 23, 2022Publication date: April 27, 2023Inventors: Asli SAHIN, Thomas F. HOUGHTON, Jennifer A. OAKLEY, Jeremy S. ALDERMAN, Karen A. NUMMY, Zhuojie WU
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Patent number: 11587888Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a moisture seal for photonic devices and methods of manufacture. The structure includes: a first trench in at least one substrate material; a guard ring structure with an opening and which at least partially surrounds the first trench; and a second trench at a dicing edge of the substrate, the second trench being lined on sidewalls with barrier material and spacer material over the barrier material.Type: GrantFiled: December 13, 2019Date of Patent: February 21, 2023Assignee: GLOBALFOUNDRIES U.S. INC.Inventors: Asli Sahin, Thomas F. Houghton, Jennifer A. Oakley, Jeremy S. Alderman, Karen A. Nummy, Zhuojie Wu
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Patent number: 11487059Abstract: A photonics integrated circuit includes a semiconductor substrate; a buried insulator layer positioned over the semiconductor substrate; and a back-end-of-line (BEOL) insulator stack over a first portion of the buried insulator layer. In addition, the PIC includes a silicon nitride (SiN) waveguide edge coupler positioned in a first region over the buried insulator layer and at least partially under the BEOL insulator stack. An oxide layer extends over a side of the BEOL insulator stack. The SiN waveguide edge coupler provides better power handling and fabrication tolerance than silicon waveguide edge couplers, despite the location under various BEOL layers. The PIC can also include silicon waveguide edger coupler(s).Type: GrantFiled: February 19, 2021Date of Patent: November 1, 2022Assignee: GLOBALFOUNDRIES U.S. INC.Inventors: Asli Sahin, Karen A. Nummy, Thomas Houghton, Kevin K. Dezfulian, Kenneth J. Giewont, Yusheng Bian
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Publication number: 20220268994Abstract: A photonics integrated circuit includes a semiconductor substrate; a buried insulator layer positioned over the semiconductor substrate; and a back-end-of-line (BEOL) insulator stack over a first portion of the buried insulator layer. In addition, the PIC includes a silicon nitride (SiN) waveguide edge coupler positioned in a first region over the buried insulator layer and at least partially under the BEOL insulator stack. An oxide layer extends over a side of the BEOL insulator stack. The SiN waveguide edge coupler provides better power handling and fabrication tolerance than silicon waveguide edge couplers, despite the location under various BEOL layers. The PIC can also include silicon waveguide edger coupler(s).Type: ApplicationFiled: February 19, 2021Publication date: August 25, 2022Inventors: Asli Sahin, Karen A. Nummy, Thomas Houghton, Kevin K. Dezfulian, Kenneth J. Giewont, Yusheng Bian
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Publication number: 20210278611Abstract: One illustrative device disclosed herein includes a V-groove in a base semiconductor layer of a semiconductor-on-insulator (SOI) substrate, wherein the V-groove is adapted to have a fiber optics cable positioned therein, and an optical component positioned above the V-groove. The device also includes a first layer of silicon dioxide positioned above the optical component, a second layer of silicon dioxide positioned on and in contact with the first layer of silicon dioxide and a third layer of silicon dioxide positioned on and in contact with the second layer of silicon dioxide.Type: ApplicationFiled: March 3, 2020Publication date: September 9, 2021Inventors: Asli Sahin, Colleen Meagher, Thomas Houghton, Bo Peng, Karen Nummy, Javier Ayala, Yusheng Bian
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Publication number: 20210183791Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a moisture seal for photonic devices and methods of manufacture. The structure includes: a first trench in at least one substrate material; a guard ring structure with an opening and which at least partially surrounds the first trench; and a second trench at a dicing edge of the substrate, the second trench being lined on sidewalls with barrier material and spacer material over the barrier material.Type: ApplicationFiled: December 13, 2019Publication date: June 17, 2021Inventors: Asli SAHIN, Thomas F. HOUGHTON, Jennifer A. OAKLEY, Jeremy S. ALDERMAN, Karen A. NUMMY, Zhuojie WU
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Patent number: 10816726Abstract: Structures for an edge coupler and methods of fabricating a structure for an edge coupler. A waveguide core and a coupler are formed over a layer stack that includes a first dielectric layer and a second dielectric layer over the first dielectric layer. The coupler includes a first plurality of grating structures and a transition structure including a second plurality of grating structures that are positioned between the first plurality of grating structures and the waveguide core. The first plurality of grating structures include respective widths that vary as a function of position relative to the transition structure.Type: GrantFiled: August 23, 2019Date of Patent: October 27, 2020Assignee: GLOBALFOUNDRIES INC.Inventors: Bo Peng, Yusheng Bian, Ajey Poovannummoottil Jacob, Thomas Houghton, Asli Sahin
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Patent number: 10633280Abstract: In one aspect, a method for use in preparing a glass includes performing an ion exchange process by treating the glass with a eutectic mixture including at least a first rubidium salt. In another aspect, a glass is prepared at least in part by performing an ion exchange process by treating the glass with a eutectic mixture including at least a first rubidium salt.Type: GrantFiled: November 28, 2017Date of Patent: April 28, 2020Assignee: International Business Machines CorporationInventors: Qiang Huang, Kenneth P. Rodbell, Asli Sahin
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Patent number: 10112867Abstract: In one aspect, a method for use in preparing a glass comprises: performing a first ion exchange process to replace at least a first ion in the glass with at least a second ion, the second ion being smaller than the first ion; and performing a second ion exchange process to replace at least the second ion in the glass with at least a third ion, the third ion being larger than the first ion. In another aspect, a glass is prepared at least in part by: performing a first ion exchange process to replace at least a first ion in the glass with at least a second ion, the second ion being smaller than the first ion; and performing a second ion exchange process to replace at least the second ion in the glass with at least a third ion, the third ion being larger than the first ion.Type: GrantFiled: February 10, 2017Date of Patent: October 30, 2018Assignee: International Business Machines CorporationInventors: Qiang Huang, Kenneth P. Rodbell, Asli Sahin
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Publication number: 20180079683Abstract: In one aspect, a method for use in preparing a glass includes performing an ion exchange process by treating the glass with a eutectic mixture including at least a first rubidium salt. In another aspect, a glass is prepared at least in part by performing an ion exchange process by treating the glass with a eutectic mixture including at least a first rubidium salt.Type: ApplicationFiled: November 28, 2017Publication date: March 22, 2018Inventors: Qiang Huang, Kenneth P. Rodbell, Asli Sahin
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Patent number: 9890075Abstract: In one aspect, a method for use in preparing a glass includes performing an ion exchange process by treating the glass with a eutectic mixture including at least a first rubidium salt. In another aspect, a glass is prepared at least in part by performing an ion exchange process by treating the glass with a eutectic mixture including at least a first rubidium salt.Type: GrantFiled: January 20, 2016Date of Patent: February 13, 2018Assignee: International Business Machines CorporationInventors: Qiang Huang, Kenneth P. Rodbell, Asli Sahin
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Patent number: 9718728Abstract: In one aspect, a method for use in preparing a glass comprises: performing a first ion exchange process to replace at least a first ion in the glass with at least a second ion, the second ion being smaller than the first ion; and performing a second ion exchange process to replace at least the second ion in the glass with at least a third ion, the third ion being larger than the first ion. In another aspect, a glass is prepared at least in part by: performing a first ion exchange process to replace at least a first ion in the glass with at least a second ion, the second ion being smaller than the first ion; and performing a second ion exchange process to replace at least the second ion in the glass with at least a third ion, the third ion being larger than the first ion.Type: GrantFiled: January 20, 2016Date of Patent: August 1, 2017Assignee: International Business Machines CorporationInventors: Qiang Huang, Kenneth P. Rodbell, Asli Sahin
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Publication number: 20170204003Abstract: In one aspect, a method for use in preparing a glass comprises: performing a first ion exchange process to replace at least a first ion in the glass with at least a second ion, the second ion being smaller than the first ion; and performing a second ion exchange process to replace at least the second ion in the glass with at least a third ion, the third ion being larger than the first ion. In another aspect, a glass is prepared at least in part by: performing a first ion exchange process to replace at least a first ion in the glass with at least a second ion, the second ion being smaller than the first ion; and performing a second ion exchange process to replace at least the second ion in the glass with at least a third ion, the third ion being larger than the first ion.Type: ApplicationFiled: January 20, 2016Publication date: July 20, 2017Inventors: Qiang Huang, Kenneth P. Rodbell, Asli Sahin
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Publication number: 20170204004Abstract: In one aspect, a method for use in preparing a glass comprises: performing a first ion exchange process to replace at least a first ion in the glass with at least a second ion, the second ion being smaller than the first ion; and performing a second ion exchange process to replace at least the second ion in the glass with at least a third ion, the third ion being larger than the first ion. In another aspect, a glass is prepared at least in part by: performing a first ion exchange process to replace at least a first ion in the glass with at least a second ion, the second ion being smaller than the first ion; and performing a second ion exchange process to replace at least the second ion in the glass with at least a third ion, the third ion being larger than the first ion.Type: ApplicationFiled: February 10, 2017Publication date: July 20, 2017Inventors: Qiang Huang, Kenneth P. Rodbell, Asli Sahin
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Publication number: 20170204002Abstract: In one aspect, a method for use in preparing a glass includes performing an ion exchange process by treating the glass with a eutectic mixture including at least a first rubidium salt. In another aspect, a glass is prepared at least in part by performing an ion exchange process by treating the glass with a eutectic mixture including at least a first rubidium salt.Type: ApplicationFiled: January 20, 2016Publication date: July 20, 2017Inventors: Qiang Huang, Kenneth P. Rodbell, Asli Sahin