Abstract: In a deposition apparatus, a coming-off prevention unit is formed on the side surface of a substrate supporting pin to prevent the substrate supporting pin from being separated from the deposition apparatus even if the substrate supporting pin sticking on the substrate due to static electricity occurring during the deposition process is moved. Therefore, damage of the substrate supporting pin or the substrate, which may occur when the substrate supporting pin comes off, can be prevented. Further, as a rod is inserted into a hole formed in the substrate supporting pin, the substrate supporting pin is prevented from coming off from a motion path, when the substrate supporting pin is moved in a vertical direction. Accordingly, damage of the substrate supporting pin, which may occur when the substrate supporting pin comes off during the vertical motion, can be prevented.

Abstract: A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reactors; a plurality of gas supply units connected to the plurality of reactors; and a plurality of plasma supply units connected to the plurality of reactors. Each of the plasma supply units includes: a plasma power supplier; a plurality of diodes connected to the plasma power supplier; and a reverse voltage driver connected to the plurality of diodes through respectively corresponding switches.

Abstract: A reaction chamber including a substrate supporting member positioned within the reaction chamber, the reaction chamber having a first region and a second region, a shield positioned within the second chamber and movable with the substrate supporting member, and wherein the shield is adjacent at least a bottom surface of the substrate supporting member.

Abstract: A reaction chamber including an upper region for processing a substrate, a lower region for loading a substrate, a susceptor movable within the reaction chamber, a first sealing member positioned on a perimeter of the susceptor, a second sealing member positioned between the upper region and the lower region, wherein the first and second sealing members are selectively engaged with one another to limit communication between the upper region and the lower region.