Abstract: An XRF (XRF=x-ray fluorescence) measurement apparatus (1) has an x-ray source (2) for generating x-rays (4), x-ray optics (3) for directing x-rays (4) from the x-ray source (2) to a sample (5) and an EDS (EDS=energy dispersive spectroscopy) detector (7) for detecting fluorescent x-rays (14) from the sample (5). The apparatus is characterized in that the sample (5) is a wafer (6), in particular a Si wafer, wherein the x-ray optics (3) is positioned to direct the x-rays (4) onto the bevel (12) of the wafer (6). The x-ray source (2) plus the x-ray optics (3) has a brilliance of at least 5*107 counts/sec mm2, preferably at least 1*108counts/sec mm2. The apparatus allows an improved contamination control of wafers, in particular silicon wafers.

Abstract: An XRF (XRF=x-ray fluorescence) measurement apparatus (1) has an x-ray source (2) for generating x-rays (4), x-ray optics (3) for directing x-rays (4) from the x-ray source (2) to a sample (5) and an EDS (EDS=energy dispersive spectroscopy) detector (7) for detecting fluorescent x-rays (14) from the sample (5). The apparatus is characterized in that the sample (5) is a wafer (6), in particular a Si wafer, wherein the x-ray optics (3) is positioned to direct the x-rays (4) onto the bevel (12) of the wafer (6). The x-ray source (2) plus the x-ray optics (3) has a brilliance of at least 5*107 counts/sec mm2, preferably at least 1*108counts/sec mm2. The apparatus allows an improved contamination control of wafers, in particular silicon wafers.

Abstract: An X-ray diffractometer (1) comprising an X-ray source (2) emitting a line focus X-ray beam (3; 11) wherein the larger extension of the beam cross section defines a line direction (4; 12) of the X-ray beam (3; 11), further comprising a sample (6; 13), and an X-ray detector (7) rotatable in a scattering plane around an axis ? intersecting the position of the sample (7) is characterized in that the X-ray source is mounted to a switching device (10), which allows to move the X-ray source into one of two fixed positions with respect to the scattering plane, wherein in the first position the line direction (4) of the X-ray beam (3) is parallel to the scattering plane and in the second position the line direction (12) of the X-ray beam (11) is perpendicular to the scattering plane, and wherein the path of the X-ray beam (3, 11) in the two fixed positions of the X-ray source is the same.

Abstract: An X-ray diffractometer (1) comprising an X-ray source (2) emitting a line focus X-ray beam (3; 11) wherein the larger extension of the beam cross section defines a line direction (4; 12) of the X-ray beam (3; 11), further comprising a sample (6; 13), and an X-ray detector (7) rotatable in a scattering plane around an axis &ohgr; intersecting the position of the sample (7) is characterized in that the X-ray source is mounted to a switching device (10), which allows to move the X-ray source into one of two fixed positions with respect to the scattering plane, wherein in the first position the line direction (4) of the X-ray beam (3) is parallel to the scattering plane and in the second position the line direction (12) of the X-ray beam (11) is perpendicular to the scattering plane, and wherein the path of the X-ray beam (3, 11) in the two fixed positions of the X-ray source is the same.