Patents by Inventor Astrid RUDOLFI

Astrid RUDOLFI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10301486
    Abstract: The invention relates to comb copolymers, which can be produced from at least one diglycidyl ether (A) of general formula (I), at least one polyether monoamine (B) of the general formula Rt—[OEt]n[OPr]m[OBu]s—NH2, at least one amine (C) of the general formula Z—R1—NH2, and optionally at least one secondary amine (D) that is free of primary amino groups and is of the general formula NHTV, wherein R stands for a residue free of epoxy groups, selected from aliphatic residues, aromatic residues, and araliphatic residues; Rt stands for a residue selected from alkyl residues having 1 to 6 carbon atoms; OEt stands for an ethylene oxide residue, OPr stands for a propylene oxide residue, and OBu stands for a butylene oxide residue; n stands for a number from 0 to 100, m stands for a number from 3 to 50, and s stands for a number from 0 to 20, and n+m+s=3 to 103; R1 stands for an aliphatic, aromatic, or araliphatic hydrocarbon residue having 1 to 12 carbon atoms; Z stands for a residue free of primary and secondary ami
    Type: Grant
    Filed: October 13, 2015
    Date of Patent: May 28, 2019
    Assignee: BYK-Chemie GmbH
    Inventors: Bernd Göbelt, Jürgen Omeis, Andreas Okkel, Marcus Meichsner, Astrid Rudolfi
  • Publication number: 20170292030
    Abstract: The invention relates to comb copolymers, which can be produced from at least one diglycidyl ether (A) of general formula (I), at least one polyether monoamine (B) of the general formula Rt—[OEt]n[OPr]m[OBu]s—NH2, at least one amine (C) of the general formula Z—R1—NH2, and optionally at least one secondary amine (D) that is free of primary amino groups and is of the general formula NHTV, wherein R stands for a residue free of epoxy groups, selected from aliphatic residues, aromatic residues, and araliphatic residues; Rt stands for a residue selected from alkyl residues having 1 to 6 carbon atoms; OEt stands for an ethylene oxide residue, OPr stands for a propylene oxide residue, and OBu stands for a butylene oxide residue; n stands for a number from 0 to 100, m stands for a number from 3 to 50, and s stands for a number from 0 to 20, and n+m+s=3 to 103; R1 stands for an aliphatic, aromatic, or araliphatic hydrocarbon residue having 1 to 12 carbon atoms; Z stands for a residue free of primary and secondary ami
    Type: Application
    Filed: October 13, 2015
    Publication date: October 12, 2017
    Inventors: Bernd GÖBELT, Jürgen OMEIS, Andreas OKKEL, Marcus MEICHSNER, Astrid RUDOLFI