Abstract: A method of preparing a diorganodihalosilane, the method comprising the following separate and consecutive steps: (i) treating a preformed metal silicide with a mixture comprising hydrogen gas and a silicon tetrahalide at a temperature from 300 to 1400° C. to form a treated metal silicide, wherein the preformed metal silicide comprises a metal selected from at least one of Ni, Pd, or Pt; and (ii) reacting the treated metal silicide with an organohalide according to the formula RX at a temperature from 250 to 700° C. to form a diorganodihalosilane, wherein R is C1-C10 hydrocarbyl and X is halo.

Abstract: A method of making a diorganodihalosilane contacting an organotrihalosilane according to the formula RSiX3 (I) with hydrogen in the presence of a metal catalyst comprising at least two metals and at a temperature from 300 to 800° C. to form a diorganodihalosilane, wherein R is C1-C10 Q hydrocarbyl, X is halo, and two of the at least two metals are chosen from at least one of (i) copper and palladium, (ii) copper and gold, (iii) indium and iridium or (iv) iridium and rhenium.

Abstract: A method of preparing a hydridohalosilane compound comprises treating a preformed metal silicide with a mixture comprising hydrogen gas and a silicon tetrahalide to prepare the hydridohalosilane compound.