Patents by Inventor Atanu Kumar DAS

Atanu Kumar DAS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Post CMP cleaning compositions for ceria particles
    Patent number: 11085011
    Abstract: The invention provides a removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and ceria particles from a microelectronic device having said particles and contaminants thereon. The composition achieves highly efficacious removal of the ceria particles and CMP by-product contaminant material from the surface of the microelectronic device.
    Type: Grant
    Filed: July 31, 2019
    Date of Patent: August 10, 2021
    Assignee: ENTEGRIS, INC.
    Inventors: Elizabeth Thomas, Michael White, Daniela White, Atanu Kumar Das
  • POST CMP CLEANING COMPOSITIONS FOR CERIA PARTICLES
    Publication number: 20200071642
    Abstract: The invention provides a removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and ceria particles from a microelectronic device having said particles and contaminants thereon. The composition achieves highly efficacious removal of the ceria particles and CMP by-product contaminant material from the surface of the microelectronic device.
    Type: Application
    Filed: July 31, 2019
    Publication date: March 5, 2020
    Inventors: Elizabeth THOMAS, Michael WHITE, Daniela WHITE, Atanu Kumar DAS