Patents by Inventor Ataru Kobayashi
Ataru Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11884778Abstract: The object of the present invention is to provide a silicone composition which provides a release coating having excellent adhesion to a substrate, in particular a plastic film substrate, such as a polyester film. Further, an object of the present invention is to provide a release sheet having a cured coating of the silicon composition. It is also an object of the present invention to provide a silicone composition which has improved storage stability and does not cause separation of the functional compound during long-term storage or transportation. The present invention provides a silicone composition comprising the following components (A) to (C): (A) an organopolysiloxane having at least two alkenyl groups each bonded to a silicon atom in a molecule, having a viscosity at 25 degrees C.Type: GrantFiled: June 27, 2019Date of Patent: January 30, 2024Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Ataru Kobayashi, Ken Nakayama, Toshiaki Ihara
-
Publication number: 20230144102Abstract: This organopolysiloxane composition for use in release paper or release film, said organopolysiloxane composition containing (A) an organopolysiloxane having two or more silicon atom-bonded alkenyl groups in each molecule, (B) an organohydrogen polysiloxane having two or more silicon atom-bonded hydrogen atoms (Si—H groups) on average in each molecule, (C) an organic peroxide and (D) a specific amount of a platinum group metal-based catalyst, is capable of undergoing an addition reaction with a smaller amount of the platinum group metal-based catalyst in comparison to the prior art, thereby being capable of forming a cured coating film which has a release strength equivalent to that of the prior art even in cases where a component that inhibits the catalytic activity of the platinum group metal-based catalyst is contained in the composition.Type: ApplicationFiled: March 15, 2021Publication date: May 11, 2023Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Toshiaki IHARA, Ataru KOBAYASHI, Tsuneo KIMURA
-
Patent number: 11459459Abstract: Provided is a silicone composition having components (A) to (E):100 parts by mass of (A) a linear, branched, or network organopolysiloxane having a vinyl value of 0.01 mol/100 g or more and 0.04 mol/100 g or less and a viscosity of 100 mm2/sec or more and 500 mm2/sec or less at 25° C., wherein each of terminals of the organopolysiloxane has one or more alkenyl groups; 0.01 to 3 parts by mass of (B) a linear, branched, or network organopolysiloxane having a vinyl value of 0.2 mol/100 g or more and 1.2 mol/100 g or less and a viscosity of 2 mm2/sec or more and 60 mm2/sec or less at 25° C., wherein each of terminals of the organopolysiloxane has one or more alkenyl groups; (C) an organohydrogenpolysiloxane having an amount of 1 mol/100 g or more and 2 mol/100 g or less of an SiH group, wherein a ratio of the number of the SiH group in component (C) to a total number of the alkenyl groups in components (A) and (B) is 1 to 5; 0.Type: GrantFiled: November 21, 2018Date of Patent: October 4, 2022Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Ataru Kobayashi, Toshiaki Ihara
-
Publication number: 20220267530Abstract: The purpose of the present invention is to provide a platinum-group metal catalyst having high storage stability and being able to promote an addition reaction even when the amount of the platinum-group metal catalyst is small; a curable organopolysiloxane composition comprising the catalyst; and a release sheet comprising a cured product of the composition. That is, the present invention provides a catalyst composition comprising i) a platinum-group metal catalyst and ii) an organopolysiloxane having at least two (meth)acryloyl groups in one molecule, wherein an amount of the platinum-group metal atom is 0.01 to 5.0 mass %, based on a total mass of the catalyst composition.Type: ApplicationFiled: July 21, 2020Publication date: August 25, 2022Inventors: Ataru Kobayashi, Toshiaki Ihara
-
Publication number: 20220228038Abstract: A radiation-curable organopolysiloxane composition comprising the components (A), (B) and (C): (A) organopolysiloxane represented by the formula (1), wherein at least one of R1 is a (meth)acryloyl group-containing organic group, a is an integer of 2 or more, a, b, c and d satisfy an equation, 2?a+b+c+d?1,000, and a ratio of the total number of the hydroxyl group and the hydroxyl group-containing organic group to the total number of the (meth)acryloyl group-containing organic group, the hydroxyl group and the hydroxyl group-containing organic group is 0.4 or less; (B) compound having two or more acrylic groups in one molecule in an amount of 0.1 to 50 parts by mass, relative to 100 parts by mass of component (A); and (C) radical polymerization initiator in an amount of 0.1 to 15 parts by mass, relative to 100 parts by mass of component (A).Type: ApplicationFiled: May 8, 2020Publication date: July 21, 2022Inventors: Kenji Tanaka, Shunji Aoki, Ataru Kobayashi
-
Publication number: 20220056323Abstract: In the present invention, compounding an addition-reaction-curable organopolysiloxane composition with a specific amount of an organopolysiloxane compound that has three or more (meth)acryl groups in the molecule and a weight-average molecular weight of 1,000 or greater yields an organopolysiloxane composition for use in a release paper or release film in which addition reactions can occur using a small amount of platinum family metal catalyst, cured films can be formed having a peeling strength approximating levels encountered in the past, and addition-reaction-prompted curing will proceed even on a base material containing a catalyst-poisoning component.Type: ApplicationFiled: December 25, 2019Publication date: February 24, 2022Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Toshiaki IHARA, Kenji TANAKA, Ataru KOBAYASHI
-
Publication number: 20210277186Abstract: The object of the present invention is to provide a silicone composition which provides a release coating having excellent adhesion to a substrate, in particular a plastic film substrate, such as a polyester film. Further, an object of the present invention is to provide a release sheet having a cured coating of the silicon composition. It is also an object of the present invention to provide a silicone composition which has improved storage stability and does not cause separation of the functional compound during long-term storage or transportation. The present invention provides a silicone composition comprising the following components (A) to (C): (A) an organopolysiloxane having at least two alkenyl groups each bonded to a silicon atom in a molecule, having a viscosity at 25 degrees C.Type: ApplicationFiled: June 27, 2019Publication date: September 9, 2021Inventors: Ataru Kobayashi, Ken Nakayama, Toshiaki Ihara
-
Patent number: 11104812Abstract: Provided is a solventless silicone composition which can form a highly transparent release coating having excellent adhesion to a substrate, in particular to a plastic film substrate, and which can provide a layer of cured product having good adhesion even when the release coating exhibits a small peeling force. Also provided is a release paper and release film having such a cured coating.Type: GrantFiled: January 16, 2018Date of Patent: August 31, 2021Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Ken Nakayama, Ataru Kobayashi
-
Publication number: 20210222008Abstract: Provided is an organo-polysiloxane composition for use in release paper or release film, capable of forming a hardened coat having a low release force. The invention is an organo-polysiloxane composition for use in release paper or release film, containing the components (A) to (D). (A) An organo-polysiloxane having two or more silicon atom-bound alkenyl groups within one molecule: 100 parts by mass. (B) An organo-hydrogen polysiloxane having at least an average of two or more silicon atom-bound hydrogen atoms (Si—H groups) within one molecule: an amount such that the number of moles of the Si—H groups is equal to 1 to 5 times that of the number of moles of the alkenyl groups within the (A) component. (C) A compound having one or more (meth)acrylic groups within one molecule, and whereof the molecular weight is 72 to 1,000: 0.01 to 3 parts by mass with respect to 100 parts by mass of the (A) component.Type: ApplicationFiled: June 21, 2019Publication date: July 22, 2021Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Toshiaki IHARA, Ataru KOBAYASHI, Takeharu TOYOSHIMA
-
Publication number: 20210171771Abstract: Provided is a silicone composition having components (A) to (E):100 parts by mass of (A) a linear, branched, or network organopolysiloxane having a vinyl value of 0.01 mol/100 g or more and 0.04 mol/100 g or less and a viscosity of 100 mm2/sec or more and 500 mm2/sec or less at 25° C., wherein each of terminals of the organopolysiloxane has one or more alkenyl groups; 0.01 to 3 parts by mass of (B) a linear, branched, or network organopolysiloxane having a vinyl value of 0.2 mol/100 g or more and 1.2 mol/100 g or less and a viscosity of 2 mm2/sec or more and 60 mm2/sec or less at 25° C., wherein each of terminals of the organopolysiloxane has one or more alkenyl groups; (C) an organohydrogenpolysiloxane having an amount of 1 mol/100 g or more and 2 mol/100 g or less of an SiH group, wherein a ratio of the number of the SiH group in component (C) to a total number of the alkenyl groups in components (A) and (B) is 1 to 5; 0.Type: ApplicationFiled: November 21, 2018Publication date: June 10, 2021Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Ataru KOBAYASHI, Toshiaki IHARA
-
Publication number: 20210054245Abstract: A release sheet having excellent curability and adhesion to substrates and a very low release force at high speeds as well as at low speeds can be obtained by coating a sheet-like substrate with a solvent-free curable silicone releasing agent composition that comprises components (A) to (E), and thermally curing the same. (A) An alkenyl group-containing organopolysiloxane that has a vinyl value of 0.016 to 0.05 mol/100 g and a kinematic viscosity of 80 to 450 mm2/s, (B) an organohydrogenpolysiloxane having a SiH amount using formulas (1) and (2) at a mass ratio of 100:5 to 100:200 of 0.016 to 0.5 mol/100 g, M?MH?DH?T?Q???(1), M?MH?DH?D?T?Q???(2), (? and ? are 0 or an integer, 2??+?, 10???100, 0???10, 0???10, 5???60, 10???50, 0???10, and 0???10), (C) an organopolysiloxane of formula (3), M12D???(3), (? is 300 to 3,000), (D) an addition reaction controlling agent, and (E) a catalyst for addition reaction.Type: ApplicationFiled: January 18, 2019Publication date: February 25, 2021Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Toshiaki IHARA, Ataru KOBAYASHI
-
Publication number: 20200347188Abstract: The present invention provides a solvent-free silicone release composition containing (A) an alkenyl group-containing organopolysiloxane having a vinyl value of 0.016-0.7 mol/100 g and a kinematic viscosity at 25° C. of 80-500 mm2/s, (B) an organo hydrogen polysiloxane having a kinematic viscosity of 2-500 mm2/s, (C) a platinum group metal-based catalyst, and (E) an organopolysiloxane having a crosslinked structure and fluidity. According to the present invention, surface roughness caused by high speed rotation of a roll or surface protrusions and recesses caused by the generation of mist can be eliminated during high-speed coating on a sheet-like substrate, and a release sheet can be obtained in which a cured silicone-coated surface has excellent smoothness and an adhesive-coated substrate has a low high-speed peel strength.Type: ApplicationFiled: January 18, 2019Publication date: November 5, 2020Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Toshiaki IHARA, Ataru KOBAYASHI
-
Publication number: 20190382596Abstract: Provided is a solventless silicone composition which can form a highly transparent release coating having excellent adhesion to a substrate, in particular to a plastic film substrate, and which can provide a layer of cured product having good adhesion even when the release coating exhibits a small peeling force. Also provided is a release paper and release film having such a cured coating.Type: ApplicationFiled: January 16, 2018Publication date: December 19, 2019Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Ken NAKAYAMA, Ataru KOBAYASHI
-
Patent number: 8809469Abstract: The present invention is a curable organopolysiloxane composition containing (A) a compound shown by the following average composition formula (1), wherein R1 represents an aliphatic unsaturated group, R2 represents a monovalent hydrocarbon group, R3 represents an aliphatic hydrocarbon group, Ar represents an aryl group, and “n” and “m” represent positive numbers which satisfy n?1, m?1, and n+m?10, (B) a hydrogen atom-containing organic silicon compound having at least two silicon atom-bonded hydrogen atoms per one molecule while not having an aliphatic unsaturated group, and (C) a hydrosilylation catalyst which contains a platinum group metal. Thereby, there can be provided a curable organopolysiloxane composition which can give a cured product having high transparency, high refractive index, and excellent thermal shock resistance; an optical device sealing material; and an optical device.Type: GrantFiled: January 18, 2013Date of Patent: August 19, 2014Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Ataru Kobayashi, Toshiyuki Ozai
-
Publication number: 20100119048Abstract: A call relay system includes: an outgoing call terminal; an incoming call terminal; and a call relay device which relays a call from the outgoing call terminal to the incoming call terminal.Type: ApplicationFiled: November 11, 2009Publication date: May 13, 2010Inventors: ATARU KOBAYASHI, Toshiyuki Tamura, Anand Prasad, Stefan Schmid
-
Publication number: 20080183862Abstract: A network communication management system of the present invention comprises a maintenance server connected to a network and a terminal connected to the network via a gateway. The terminal transmits terminal information indicating an operating state of the terminal to the maintenance server via said gateway. When the maintenance server receives the terminal information via the gateway, the maintenance server transmits specific information for causing the terminal to perform specific processing based on the terminal information to the terminal via the gateway.Type: ApplicationFiled: January 30, 2008Publication date: July 31, 2008Inventor: ATARU KOBAYASHI
-
Patent number: 5808311Abstract: Atomic displacement on a material surface is detected by, in a system comprising the tip of a scanning tunneling microscope (STM) and a material in question, upon an atomic displacement operation comprising extraction of atoms on the material surface and adsorption of atoms onto the material surface through application of a pulse voltage to the tip of STM, measuring a z-piezo voltage along the time series during and after application of the pulse voltage. Furthermore, heteroatoms dissociated by a reaction between the tip surface of STM and heteromolecules in a heteromolecular atmosphere are stored on the surface of the tip of STM, and then, heteroatoms are locally adsorbed onto the material surface by causing electro-evaporation of the heteroatoms through application of a prescribed scanning voltage to the tip of STM.Type: GrantFiled: June 16, 1995Date of Patent: September 15, 1998Assignee: Research Development Corporation of JapanInventors: Masakazu Aono, Francois Grey, Ataru Kobayashi, Eric Snyder, Hironaga Uchida, Dehuan Huang, Hiromi Kuramochi
-
Patent number: 4971896Abstract: A method of forming a thin film pattern on a base having a step portion. This method comprises a first step of forming a thin film of given material on the base, a second step of forming a predetermined pattern of a first photoresist film on said thin film at one of a first portion including a lower part of the step portion and a second portion including an upper part of the step portion, a third step of forming a predetermined pattern of a second photoresist film on said thin film at the other of the first and second portions and a fourth step of applying ion-milling to said thin film of given material using masks said first and second photoresist film patterns formed on said thin film at the first and second portions.Type: GrantFiled: December 7, 1988Date of Patent: November 20, 1990Assignee: Hitachi, Ltd.Inventors: Takashi Kawabe, Ataru Kobayashi, Moriaki Fuyama, Makoto Morijiri, Eiji Ashida, Masatoshi Tsuchiya, Tetsuya Okai, Masanobu Hanazono, Shinichi Hara, Shinji Narishige, Hiroshi Ikeda