Patents by Inventor Atsuhiko Kojima
Atsuhiko Kojima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10995421Abstract: An object of the present invention is to provide a crystal of a nitride of a Group-13 metal on the Periodic Table which has good crystallinity and has no crystal strain, and to provide a production method for the crystal. The crystal of a nitride of a Group-13 metal on the Periodic Table of the present invention, comprises oxygen atom and hydrogen atom in the crystal and has a ratio of a hydrogen concentration to an oxygen concentration therein of from 0.5 to 4.5.Type: GrantFiled: March 8, 2019Date of Patent: May 4, 2021Assignee: MITSUBISHI CHEMICAL CORPORATIONInventors: Yutaka Mikawa, Hideo Namita, Hirotaka Ikeda, Kazunori Kamada, Hideo Fujisawa, Atsuhiko Kojima
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Publication number: 20190203379Abstract: An object of the present invention is to provide a crystal of a nitride of a Group-13 metal on the Periodic Table which has good crystallinity and has no crystal strain, and to provide a production method for the crystal. The crystal of a nitride of a Group-13 metal on the Periodic Table of the present invention, comprises oxygen atom and hydrogen atom in the crystal and has a ratio of a hydrogen concentration to an oxygen concentration therein of from 0.5 to 4.5.Type: ApplicationFiled: March 8, 2019Publication date: July 4, 2019Applicant: MITSUBISHI CHEMICAL CORPORATIONInventors: Yutaka Mikawa, Hideo Namita, Hirotaka Ikeda, Kazunori Kamada, Hideo Fujisawa, Atsuhiko Kojima
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Patent number: 10309038Abstract: An object of the present invention is to provide a crystal of a nitride of a Group-13 metal on the Periodic Table which has good crystallinity and has no crystal strain, and to provide a production method for the crystal. The crystal of a nitride of a Group-13 metal on the Periodic Table of the present invention, comprises oxygen atom and hydrogen atom in the crystal and has a ratio of a hydrogen concentration to an oxygen concentration therein of from 0.5 to 4.5.Type: GrantFiled: December 14, 2017Date of Patent: June 4, 2019Assignee: MITSUBISHI CHEMICAL CORPORATIONInventors: Yutaka Mikawa, Hideo Namita, Hirotaka Ikeda, Kazunori Kamada, Hideo Fujisawa, Atsuhiko Kojima
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Publication number: 20180105953Abstract: An object of the present invention is to provide a crystal of a nitride of a Group-13 metal on the Periodic Table which has good crystallinity and has no crystal strain, and to provide a production method for the crystal. The crystal of a nitride of a Group-13 metal on the Periodic Table of the present invention, comprises oxygen atom and hydrogen atom in the crystal and has a ratio of a hydrogen concentration to an oxygen concentration therein of from 0.5 to 4.5.Type: ApplicationFiled: December 14, 2017Publication date: April 19, 2018Applicant: MITSUBISHI CHEMICAL CORPORATIONInventors: Yutaka MIKAWA, Hideo Namita, Hirotaka Ikeda, Kazunori Kamada, Hideo Fujisawa, Atsuhiko Kojima
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Patent number: 9890474Abstract: An object of the present invention is to provide a crystal of a nitride of a Group-13 metal on the Periodic Table which has good crystallinity and has no crystal strain, and to provide a production method for the crystal. The crystal of a nitride of a Group-13 metal on the Periodic Table of the present invention, comprises oxygen atom and hydrogen atom in the crystal and has a ratio of a hydrogen concentration to an oxygen concentration therein of from 0.5 to 4.5.Type: GrantFiled: August 21, 2015Date of Patent: February 13, 2018Assignee: MITSUBISHI CHEMICAL CORPORATIONInventors: Yutaka Mikawa, Hideo Namita, Hirotaka Ikeda, Kazunori Kamada, Hideo Fujisawa, Atsuhiko Kojima
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Patent number: 9506892Abstract: A sensor capable of detecting detection targets that are necessary to be detected with high sensitivity is provided. It comprises a field-effect transistor 1A having a substrate 2, a source electrode 4 and a drain electrode 5 provided on said substrate 2, and a channel 6 forming a current path between said source electrode 4 and said drain electrode 5; wherein said field-effect transistor 1A comprises: an interaction-sensing gate 9 for immobilizing thereon a specific substance 10 that is capable of selectively interacting with the detection targets; and a gate 7 applied a voltage thereto so as to detect the interaction by the change of the characteristic of said field-effect transistor 1A.Type: GrantFiled: June 12, 2014Date of Patent: November 29, 2016Assignee: JAPAN SCIENCE AND TECHNOLOGY AGENCYInventors: Kazuhiko Matsumoto, Atsuhiko Kojima, Satoru Nagao, Masanori Katou, Yutaka Yamada, Kazuhiro Nagaike, Yasuo Ifuku, Hiroshi Mitani
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Publication number: 20150361587Abstract: An object of the present invention is to provide a crystal of a nitride of a Group-13 metal on the Periodic Table which has good crystallinity and has no crystal strain, and to provide a production method for the crystal. The crystal of a nitride of a Group-13 metal on the Periodic Table of the present invention, comprises oxygen atom and hydrogen atom in the crystal and has a ratio of a hydrogen concentration to an oxygen concentration therein of from 0.5 to 4.5.Type: ApplicationFiled: August 21, 2015Publication date: December 17, 2015Applicant: MITSUBISHI CHEMICAL CORPORATIONInventors: Yutaka MIKAWA, Hideo NAMITA, Hirotaka IKEDA, Kazunori KAMADA, Hideo FUJISAWA, Atsuhiko KOJIMA
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Publication number: 20150102283Abstract: A sensor capable of detecting detection targets that are necessary to be detected with high sensitivity is provided. It comprises a field-effect transistor 1A having a substrate 2, a source electrode 4 and a drain electrode 5 provided on said substrate 2, and a channel 6 forming a current path between said source electrode 4 and said drain electrode 5; wherein said field-effect transistor 1A comprises: an interaction-sensing gate 9 for immobilizing thereon a specific substance 10 that is capable of selectively interacting with the detection targets; and a gate 7 applied a voltage thereto so as to detect the interaction by the change of the characteristic of said field-effect transistor 1A.Type: ApplicationFiled: June 12, 2014Publication date: April 16, 2015Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCYInventors: Kazuhiko Matsumoto, Atsuhiko Kojima, Satoru Nagao, Masanori Katou, Yutaka Yamada, Kazuhiro Nagaike, Yasuo Ifuku, Hiroshi Mitani
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Patent number: 8772099Abstract: A method of detecting a detection target using a sensor requires a sensor having a transistor selected from the group of field-effect transistors or single electron transistors. The transistor includes a substrate, a source electrode disposed on the substrate and a drain electrode disposed on the substrate, and a channel forming a current path between the source electrode and the drawing electrode; an interaction-sensing gate comprising a specific substance; and a voltage gate. The method includes (a) providing the detection target on the interaction-sensing gate; (b) setting the gate voltage in the voltage gate at a predetermined level; (c) selectively interacting the specific substance with the detection target; (d) when the detection target interacts with the specific substance, changing a gate voltage in the voltage gate to adjust a characteristic of the transistor; and (e) measuring a change in the characteristic of the transistor to determine a presence of the detection target.Type: GrantFiled: July 24, 2012Date of Patent: July 8, 2014Assignee: Japan Science and Technology AgencyInventors: Kazuhiko Matsumoto, Atsuhiko Kojima, Satoru Nagao, Masanori Katou, Yutaka Yamada, Kazuhiro Nagaike, Yasuo Ifuku, Hiroshi Mitani
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Patent number: 8766326Abstract: A field-effect transistor or a single electron transistor is used as sensors for detecting a detection target such as a biological compound. A substrate has a first side and a second side, the second side being opposed to the first side. A source electrode is disposed on the first side of the substrate and a drain electrode disposed on the first side of the substrate, and a channel forms a current path between the source electrode and the drain electrode. An interaction-sensing gate is disposed on the second side of the substrate, the interaction-sensing gate having a specific substance that is capable of selectively interacting with the detection target. A gate for applying a gate voltage adjusts a characteristic of the transistor as the detection target changes the characteristic of the transistor when interacting with the specific substance.Type: GrantFiled: July 24, 2012Date of Patent: July 1, 2014Assignee: Japan Science and Technology AgencyInventors: Kazuhiko Matsumoto, Atsuhiko Kojima, Satoru Nagao, Masanori Katou, Yutaka Yamada, Kazuhiro Nagaike, Yasuo Ifuku, Hiroshi Mitani
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Patent number: 8502277Abstract: A sensor capable of detecting detection targets that are necessary to be detected with high sensitivity is provided. It comprises a field-effect transistor 1A having a substrate 2, a source electrode 4 and a drain electrode 5 provided on said substrate 2, and a channel 6 forming a current path between said source electrode 4 and said drain electrode 5; wherein said field-effect transistor 1A comprises: an interaction-sensing gate 9 for immobilizing thereon a specific substance 10 that is capable of selectively interacting with the detection targets; and a gate 7 applied a voltage thereto so as to detect the interaction by the change of the characteristic of said field-effect transistor 1A.Type: GrantFiled: August 27, 2004Date of Patent: August 6, 2013Assignee: Japan Science and Technology AgencyInventors: Kazuhiko Matsumoto, Atsuhiko Kojima, Satoru Nagao, Masanori Katou, Yutaka Yamada, Kazuhiro Nagaike, Yasuo Ifuku, Hiroshi Mitani
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Publication number: 20120286243Abstract: A field-effect transistor or a single electron transistor is used as sensors for detecting a detection target such as a biological compound. A substrate has a first side and a second side, the second side being opposed to the first side. A source electrode is disposed on the first side of the substrate and a drain electrode disposed on the first side of the substrate, and a channel forms a current path between the source electrode and the drain electrode. An interaction-sensing gate is disposed on the second side of the substrate, the interaction-sensing gate having a specific substance that is capable of selectively interacting with the detection target. A gate for applying a gate voltage adjusts a characteristic of the transistor as the detection target changes the characteristic of the transistor when interacting with the specific substance.Type: ApplicationFiled: July 24, 2012Publication date: November 15, 2012Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCYInventors: Kazuhiko Matsumoto, Atsuhiko Kojima, Satoru Nagao, Masanori Katou, Yutaka Yamada, Kazuhiro Nagaike, Yasuo Ifuku, Hiroshi Mitani
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Publication number: 20120286763Abstract: A method of detecting a detection target using a sensor requires a sensor having a transistor selected from the group of field-effect transistors or single electron transistors. The transistor includes a substrate, a source electrode disposed on the substrate and a drain electrode disposed on the substrate, and a channel forming a current path between the source electrode and the drawing electrode; an interaction-sensing gate comprising a specific substance; and a voltage gate. The method includes (a) providing the detection target on the interaction-sensing gate; (b) setting the gate voltage in the voltage gate at a predetermined level; (c) selectively interacting the specific substance with the detection target; (d) when the detection target interacts with the specific substance, changing a gate voltage in the voltage gate to adjust a characteristic of the transistor; and (e) measuring a change in the characteristic of the transistor to determine a presence of the detection target.Type: ApplicationFiled: July 24, 2012Publication date: November 15, 2012Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCYInventors: Kazuhiko MATSUMOTO, Atsuhiko KOJIMA, Satoru NAGAO, Masanori KATOU, Yutaka YAMADA, Kazuhiro NAGAIKE, Yasuo IFUKU, Hiroshi MITANI
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Patent number: 8008650Abstract: An object of the present invention is to provide a new n-type transistor, different from the prior art, using a channel having a nanotube-shaped structure, and having n-type semiconductive properties. To realize this, a film of a nitrogenous compound 6 is formed directly on a channel 5 of a transistor 1 comprising a source electrode 2, a drain electrode 3, a gate electrode 4 and the n-type channel 5 having a nanotube-shaped structure and provided between the source electrode 2 and the drain electrode 3.Type: GrantFiled: November 30, 2010Date of Patent: August 30, 2011Assignee: Japan Science and Technology AgencyInventors: Kazuhiko Matsumoto, Atsuhiko Kojima, Satoru Nagao
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Publication number: 20110068324Abstract: An object of the present invention is to provide a new n-type transistor, different from the prior art, using a channel having a nanotube-shaped structure, and having n-type semiconductive properties. To realize this, a film of a nitrogenous compound 6 is formed directly on a channel 5 of a transistor 1 comprising a source electrode 2, a drain electrode 3, a gate electrode 4 and the n-type channel 5 having a nanotube-shaped structure and provided between the source electrode 2 and the drain electrode 3.Type: ApplicationFiled: November 30, 2010Publication date: March 24, 2011Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCYInventors: Kazuhiko MATSUMOTO, Atsuhiko Kojima, Satoru Nagao
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Patent number: 7902089Abstract: An object of the present invention is to provide a new n-type transistor, different from the prior art, using a channel having a nanotube-shaped structure, and having n-type semiconductive properties. To realize this, a film of a nitrogenous compound 6 is formed directly on a channel 5 of a transistor 1 comprising a source electrode 2, a drain electrode 3, a gate electrode 4 and the n-type channel 5 having a nanotube-shaped structure and provided between the source electrode 2 and the drain electrode 3.Type: GrantFiled: February 10, 2006Date of Patent: March 8, 2011Assignee: Japan Science and Technology AgencyInventors: Kazuhiko Matsumoto, Atsuhiko Kojima, Satoru Nagao
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Publication number: 20090008629Abstract: An object of the present invention is to provide a new n-type transistor, different from the prior art, using a channel having a nanotube-shaped structure, and having n-type semiconductive properties. To realize this, a film of a nitrogenous compound 6 is formed directly on a channel 5 of a transistor 1 comprising a source electrode 2, a drain electrode 3, a gate electrode 4 and the n-type channel 5 having a nanotube-shaped structure and provided between the source electrode 2 and the drain electrode 3.Type: ApplicationFiled: February 10, 2006Publication date: January 8, 2009Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCYInventors: Kazuhiko Matsumoto, Atsuhiko Kojima, Satoru Nagao
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Publication number: 20080063566Abstract: To improve convenience of a sensor unit using a transistor in analysis, a sensing gate for detection 117 of a sensor unit for detecting a detection target comprises a transistor part 103 having a substrate 108, a source electrode 111 and a drain electrode 112 provided on the substrate 108, a channel 113 forming a current path between the source electrode 111 and the drain electrode 112, and the sensing gate for detection 117 is provided with a gate body 115 fixed to the substrate 108 and a sensing part 116 capable of electrically conducting to the gate body 115 and on which a specific substance 123 capable of selectively interacting with the detection target is immobilized.Type: ApplicationFiled: September 1, 2005Publication date: March 13, 2008Applicant: MITSUBISHI CHEMICAL CORPORATIONInventors: Kazuhiko Matsumoto, Atsuhiko Kojima, Satoru Nagao, Masanori Kato, Yasuo Ifuku, Hiroshi Mitani, Haruyo Saitou
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Publication number: 20070063304Abstract: A sensor capable of detecting detection targets that are necessary to be detected with high sensitivity is provided. It comprises a field-effect transistor 1A having a substrate 2, a source electrode 4 and a drain electrode 5 provided on said substrate 2, and a channel 6 forming a current path between said source electrode 4 and said drain electrode 5; wherein said field-effect transistor 1A comprises: an interaction-sensing gate 9 for immobilizing thereon a specific substance 10 that is capable of selectively interacting with the detection targets; and a gate 7 applied a voltage thereto so as to detect the interaction by the change of the characteristic of said field-effect transistor 1A.Type: ApplicationFiled: August 27, 2004Publication date: March 22, 2007Inventors: Kazuhiko Matsumoto, Atsuhiko Kojima, Satoru Nagao, Masanori Katou, Yutaka Yamada, Kazuhiro Nagaike, Yasuo Ifuku, Hiroshi Mitani