Patents by Inventor Atsuhiro Nonaka

Atsuhiro Nonaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240269892
    Abstract: A processing apparatus includes a rotatable blade, a blade driving shaft, a table, a position driving mechanism, a first sensor, a second sensor, a start/stop point information extraction section, a characteristic-vibration-information extraction section, and a characteristic-vibration-information extraction section. The shaft drives the blade. The table places a workpiece to be processed. The mechanism changes a relative position between the blade and the workpiece. The first sensor detects a vibration generated by driving the blade. The second sensor detects a vibration generated by driving the blade. The start/stop point information extraction section extracts at least one of a start point information regarding a contact start point and a stop point information regarding a contact stop point based on a detection result of the second sensor.
    Type: Application
    Filed: February 12, 2024
    Publication date: August 15, 2024
    Applicant: TDK CORPORATION
    Inventors: Atsuhiro NONAKA, Takashi HORAI, Tomoko KITAMURA
  • Patent number: 7712204
    Abstract: A manufacturing method of a thin-film head includes the steps of, laminating and patterning a soft magnetic layer with iron alloy that contains silicon and aluminum through a base layer on a substrate; laminating an insulating layer on the patterned soft magnetic layer; performing a chemical-mechanical polishing of a surface of the laminated insulating layer and the patterned soft magnetic layer with a first acid slurry; forming a lower shield layer by a mechanical polishing with a second weak acid, or neutral slurry with a pH different from that of the first slurry; and forming a lower shield gap layer and a magnetoresistive effect layer on the lower shield layer.
    Type: Grant
    Filed: February 27, 2007
    Date of Patent: May 11, 2010
    Assignee: TDK Corporation
    Inventors: Kazuhiko Maejima, Makoto Hasegawa, Atsuhiro Nonaka, Hiroshi Kamiyama, Teruhisa Shindo, Hiroshi Yamazaki
  • Publication number: 20070230064
    Abstract: A polishing method includes the steps of, performing a chemical-mechanical polishing with a first acid slurry, in the case of polishing soft magnetic layer with iron alloy that contains silicon and aluminum, and performing a mechanical polishing with a second weak acid or neutral slurry with a pH different from that of the first slurry.
    Type: Application
    Filed: February 27, 2007
    Publication date: October 4, 2007
    Applicant: TDK Corporation
    Inventors: Kazukiko Maejima, Makoto Hasegawa, Atsuhiro Nonaka, Hiroshi Kamiyama, Teruhisa Shindo, Hiroshi Yamazaki