Patents by Inventor Atsuhito Ihori
Atsuhito Ihori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11111577Abstract: A film formation apparatus includes a target containing a magnetic material, a support that supports a substrate and locates the substrate in an arrangement region opposing the target, and a magnetic field formation unit located at a side of the arrangement region opposite to the target. The magnetic field formation unit forms a horizontal magnetic field parallel to an oscillation direction, which is one direction extending along the substrate, at a side of the arrangement region where the target is located. The magnetic field formation unit oscillates the horizontal magnetic field in the oscillation direction at least between one end of the arrangement region and another end of the arrangement region in the oscillation direction.Type: GrantFiled: February 27, 2017Date of Patent: September 7, 2021Assignee: ULVAC, INC.Inventors: Yousuke Kobayashi, Harunori Iwai, Tetsushi Fujinaga, Atsuhito Ihori, Noriaki Tani
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Patent number: 10490390Abstract: A substrate processing device includes a housing connected to ground, a cathode stage that supports a substrate, an anode unit, and a gas feeding unit that feeds gas toward the first plate. The cathode stage is applied with voltage for generating plasma. The anode unit includes a first plate including first through holes and a second plate including second through holes that are larger than the first through holes. The second plate is located between the first plate and the cathode stage. The first plate produces a flow of the gas through the first through holes. The gas that has passed through the first through holes flows through the second through holes into an area between the second plate and the cathode stage. A distance between the first plate and the second plate is 10 mm or greater and 50 mm or less.Type: GrantFiled: June 8, 2016Date of Patent: November 26, 2019Assignee: ULVAC, INC.Inventors: Tetsushi Fujinaga, Atsuhito Ihori, Masahiro Matsumoto, Noriaki Tani, Harunori Iwai, Kenji Iwata, Yoshinao Sato
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Patent number: 10429964Abstract: A touch panel of the present invention includes a touch panel substrate, a cover substrate provided to overlap the touch panel, and a connection part including a scattering layer laminated from the cover substrate side toward the touch panel substrate side and is provided between the touch panel substrate and the cover substrate in an area other than a display area.Type: GrantFiled: April 28, 2015Date of Patent: October 1, 2019Assignee: ULVAC, INC.Inventors: Manabu Harada, Hidenori Yanagitsubo, Atsuhito Ihori, Toshihiro Suzuki, Masahiro Matsumoto, Noriaki Tani, Masashi Kubo
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Patent number: 10370757Abstract: A thin substrate processing device include a substrate processing unit configured to process a thin substrate, and a cooling unit configured to cool the thin substrate when the substrate processing unit is processing the thin substrate.Type: GrantFiled: January 28, 2014Date of Patent: August 6, 2019Assignee: ULVAC, INC.Inventors: Tetsushi Fujinaga, Masahiro Matsumoto, Makoto Arai, Eriko Mase, Harunori Iwai, Koji Takahashi, Atsuhito Ihori
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Publication number: 20180355474Abstract: A film formation apparatus includes a target containing a magnetic material, a support that supports a substrate and locates the substrate in an arrangement region opposing the target, and a magnetic field formation unit located at a side of the arrangement region opposite to the target. The magnetic field formation unit forms a horizontal magnetic field parallel to an oscillation direction, which is one direction extending along the substrate, at a side of the arrangement region where the target is located. The magnetic field formation unit oscillates the horizontal magnetic field in the oscillation direction at least between one end of the arrangement region and another end of the arrangement region in the oscillation direction.Type: ApplicationFiled: February 27, 2017Publication date: December 13, 2018Inventors: Yousuke Kobayashi, Harunori Iwai, Tetsushi Fujinaga, Atsuhito Ihori, Noriaki Tani
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Patent number: 9891731Abstract: A touch panel of the present invention includes: a cover substrate; a connector being provided on an area of the cover substrate other than a display area, and including a color layer and a shield layer, the shield layer being formed from a multilayer structure, the multilayer structure being configured so that a metal layer and a dielectric layer which is thicker than the metal layer are alternately laminated; and a touch panel substrate being arranged to face the cover substrate with the connector interposed therebetween.Type: GrantFiled: July 10, 2014Date of Patent: February 13, 2018Assignee: ULVAC, INC.Inventors: Manabu Harada, Atsuhito Ihori, Toshihiro Suzuki, Hidenori Yanagitsubo, Masahiro Matsumoto, Masashi Kubo, Makoto Arai
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Publication number: 20180012734Abstract: A substrate processing device includes a housing connected to ground, a cathode stage that supports a substrate, an anode unit, and a gas feeding unit that feeds gas toward the first plate. The cathode stage is applied with voltage for generating plasma. The anode unit includes a first plate including first through holes and a second plate including second through holes that are larger than the first through holes. The second plate is located between the first plate and the cathode stage. The first plate produces a flow of the gas through the first through holes. The gas that has passed through the first through holes flows through the second through holes into an area between the second plate and the cathode stage. A distance between the first plate and the second plate is 10 mm or greater and 50 mm or less.Type: ApplicationFiled: June 8, 2016Publication date: January 11, 2018Inventors: Tetsushi FUJINAGA, Atsuhito IHORI, Masahiro MATSUMOTO, Noriaki TANI, Harunori IWAI, Kenji IWATA, Yoshinao SATO
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Publication number: 20170204509Abstract: A substrate processing apparatus includes a plasma generation unit that generates a plasma from a process gas in a plasma generation space in which a substrate is placed. The substrate processing apparatus also includes a cooling unit opposed to the substrate with a cooling space located in between. The cooling unit includes a supply port that supplies the process gas to the cooling space. The substrate processing apparatus also includes a process gas supply unit that supplies the process gas to the cooling unit. The substrate processing apparatus further includes a communication portion that communicates the cooling space and the plasma generation space to supply the process gas, which has been supplied to the cooling space, to the plasma generation space.Type: ApplicationFiled: July 28, 2015Publication date: July 20, 2017Inventors: Tetsushi FUJINAGA, Atsuhito IHORI, Masahiro MATSUMOTO, Noriaki TANI, Harunori IWAI
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Publication number: 20170204510Abstract: A substrate processing apparatus includes a sputter chamber, two targets located in the sputter chamber to form thin films on two film formation surfaces of a substrate through sputtering, and a transport mechanism that transports the substrate along a transport passage located in the sputter chamber. One of the two targets is located at one side of the transport passage opposed to one of the two film formation surfaces of the substrate at a front side with respect to a direction in which the substrate is transported. Another one of the two targets is located at another side of the transport passage opposed to another one of the two film formation surfaces of the substrate at a rear side with respect to the direction in which the substrate is transported.Type: ApplicationFiled: July 23, 2015Publication date: July 20, 2017Inventors: Tetsushi FUJINAGA, Atsuhito IHORI, Masahiro MATSUMOTO, Noriaki TANI, Harunori IWAI
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Publication number: 20170060284Abstract: A touch panel of the present invention includes a touch panel substrate, a cover substrate provided to overlap the touch panel, and a connection part including a scattering layer laminated from the cover substrate side toward the touch panel substrate side and is provided between the touch panel substrate and the cover substrate in an area other than a display area.Type: ApplicationFiled: April 28, 2015Publication date: March 2, 2017Inventors: Manabu HARADA, Hidenori YANAGITSUBO, Atsuhito IHORI, Toshihiro SUZUKI, Masahiro MATSUMOTO, Noriaki TANI, Masashi KUBO
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Publication number: 20160376697Abstract: A thin substrate processing device includes a substrate processing unit configured to process a thin substrate, and a cooling unit configured to cool the thin substrate when the substrate processing unit is processing the thin substrate.Type: ApplicationFiled: January 28, 2014Publication date: December 29, 2016Applicant: ULVAC, INC.Inventors: Tetsushi Fujinaga, Masahiro Matsumoto, Makoto Arai, Eriko Mase, Harunori Iwai, Koji Takahashi, Atsuhito Ihori
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Publication number: 20160109971Abstract: A touch panel of the present invention includes: a cover substrate; a connector being provided on an area of the cover substrate other than a display area, and including a color layer and a shield layer, the shield layer being formed from a multilayer structure, the multilayer structure being configured so that a metal layer and a dielectric layer which is thicker than the metal layer are alternately laminated; and a touch panel substrate being arranged to face the cover substrate with the connector interposed therebetween.Type: ApplicationFiled: July 10, 2014Publication date: April 21, 2016Applicant: ULVAC, INC.Inventors: Manabu Harada, Atsuhito Ihori, Toshihiro Suzuki, Hidenori Yanagitsubo, Masahiro Matsumoto, Masashi Kubo, Makoto Arai