Patents by Inventor Atsuhito Matsuo

Atsuhito Matsuo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for manufacturing electro-optic device
    Patent number: 7679086
    Abstract: A method for manufacturing an electro-optic device includes an electroconductive film forming step that forms an electroconductive film over surfaces of a substrate. A front electroconductive film removing step is also performed which removes the electroconductive film from the front surface of the substrate. A thin layer forming step is performed to form thin layers on the front surface of the substrate. Then, a rear electroconductive film removing step is performed which removes the electroconductive film from the rear surface of the substrate. At least one of the front electroconductive film removing step and the rear electroconductive film removing step is performed by applying a chemical agent capable of etching with the substrate rotated, to the rotation center of the surface of the substrate that is to be subjected to the removal of the electroconductive film, while a dry gas is jetted to the rotation center of the other surface that is not subjected to the removal of the electroconductive film.
    Type: Grant
    Filed: February 20, 2007
    Date of Patent: March 16, 2010
    Assignee: Seiko Epson Corporation
    Inventors: Eiichi Miura, Atsuhito Matsuo
  • Method for manufacturing electro-optic device
    Publication number: 20070197036
    Abstract: A method for manufacturing an electro-optic device includes an electroconductive film forming step that forms an electroconductive film over surfaces of a substrate. A front electroconductive film removing step is also performed which removes the electroconductive film from the front surface of the substrate. A thin layer forming step is performed to form thin layers on the front surface of the substrate. Then, a rear electroconductive film removing step is performed which removes the electroconductive film from the rear surface of the substrate. At least one of the front electroconductive film removing step and the rear electroconductive film removing step is performed by applying a chemical agent capable of etching with the substrate rotated, to the rotation center of the surface of the substrate that is to be subjected to the removal of the electroconductive film, while a dry gas is jetted to the rotation center of the other surface that is not subjected to the removal of the electroconductive film.
    Type: Application
    Filed: February 20, 2007
    Publication date: August 23, 2007
    Applicant: Seiko Epson Corporation
    Inventors: Eiichi Miura, Atsuhito Matsuo