Abstract: A plasma processing system includes a plasma processing chamber, a substrate support, a matching box, an RF power source, and a controller. The substrate support is disposed in the plasma processing chamber. The matching box is electrically connected to the substrate support. The RF power source is electrically connected to the matching box to generate a periodic RF pulse that includes a first power level, a second power level, and a third power level. The controller calculates the load impedance based on the reflected power of the RF pulse in each of first, second, and third time intervals during which the first, second, and third power levels are supplied, respectively, and controls a matching element included in the matching box based on the load impedance calculated in each of the first, second, and third time intervals.

Abstract: A plasma processing apparatus includes a process chamber; a mounting stage; first and second electrodes; first and second high frequency power sources, wherein the first power source supplies a waveform of one of a first pulse wave having high and low levels of first high frequency power or a continuous wave in the first period, supplies a waveform of the other in the second period, and stepwise or continuously changes the low level of the first pulse wave in the transition period, wherein the second power source supplies a waveform of one of a second pulse wave having high and low levels of second high frequency power or a continuous wave in the first period, supplies a waveform of the other in the second period, and stepwise or continuously changes the low level of the second pulse wave in the transition period.

Abstract: A plasma processing apparatus includes a process chamber; a mounting stage; first and second electrodes; first and second high frequency power sources;, wherein the first power source supplies a waveform of one of a first pulse wave having high and low levels of first high frequency power or a continuous wave in the first period, supplies a waveform of the other in the second period, and stepwise or continuously changes the low level of the first pulse wave in the transition period, wherein the second power source supplies a waveform of one of a second pulse wave having high and low levels of second high frequency power or a continuous wave in the first period, supplies a waveform of the other in the second period, and stepwise or continuously changes the low level of the second pulse wave in the transition period.