Patents by Inventor Atsuko Matsuda
Atsuko Matsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8158218Abstract: Provided is a method for producing an optical film which suffers neither flatness deterioration nor film breakage and is free from problems concerning undulating undulation and partial light leakage. The process for optical film production comprises laminating a cellulose ester resin layer (A) to an acrylic resin layer (B) by coextrusion. The process is characterized in that the cellulose ester resin layer (A) contains 55 to 99 mass % cellulose ester resin and the acrylic resin layer (B) contains 55 to 99 mass % acrylic resin, that the web is conveyed while keeping the layer (A) and the layer (B) in contact with the surface of a first cooling roll and the surface of a second cooling roll, respectively, and that when the surface temperature of the first cooling roll and the surface temperature of the second cooling roll are expressed by Ta (° C.) and Tb (° C.), respectively, then the Ta (° C.) and Tb (° C.) satisfy the following relationship (1). (Ta?80)° C.<Tb(° C.)<(Ta?5)° C.Type: GrantFiled: April 24, 2009Date of Patent: April 17, 2012Assignee: Konica Minolta Opto, Inc.Inventors: Rumiko Yamada, Atsuko Matsuda
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Patent number: 8126105Abstract: A fast reactor having a reflector control system is provided which decreases the change in reactivity of the reactor core with time without performing control of a reflector lifting speed and that of a water flow rate. The above fast reactor has a liquid metal coolant, a reactor core immersed therein, and a neutron reflector which is provided outside the reactor core and which is moved in a vertical direction for adjusting leakage of neutrons therefrom for controlling the reactivity of the reactor core. The neutron reflector described above is gradually moved in an upward direction with the change in reactivity caused by fuel burn-up, and at least a part of a lower region of the neutron reflector is a high reflection region having a high neutron reflection ability as compared to that of the other region. The high reflection region is located from the bottom to a place between one fourth and one half of the height of the neutron reflector from the bottom end thereof.Type: GrantFiled: November 19, 2010Date of Patent: February 28, 2012Assignee: Kabushiki Kaisha ToshibaInventors: Tsugio Yokoyama, Mitsuaki Yamaoka, Yasuyuki Moriki, Ryoma Kato, Yasushi Tsuboi, Atsuko Matsuda
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Patent number: 8003435Abstract: A method of fabricating an organic thin film transistor exhibiting excellent semiconductor performance by which an organic TFT can be formed continuously on a flexible base such as a polymer support through a simple coating process, and thus the fabrication cost can be reduced sharply, and an organic semiconductor layer thus formed has a high carrier mobility, In the method of fabricating an organic thin film transistor by forming a gate electrode, a gate insulation layer, an organic semiconductor layer, a source electrode and a drain electrode sequentially on a support, the organic semiconductor layer contains an organic semiconductor material having an exothermic point and an endothermic point in a differential scanning thermal analysis, and the organic semiconductor layer thus formed is heat-treated at a temperature not less than the exothermic point and less than the endothermic point.Type: GrantFiled: December 13, 2005Date of Patent: August 23, 2011Assignee: Konica Minolta Holdings, Inc.Inventors: Katsura Hirai, Atsuko Matsuda, Tatsuo Tanaka, Chiyoko Takemura, Rie Katakura, Reiko Obuchi
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Publication number: 20110103535Abstract: A fast reactor having a reflector control system is provided which decreases the change in reactivity of the reactor core with time without performing control of a reflector lifting speed and that of a water flow rate. The above fast reactor has a liquid metal coolant, a reactor core immersed therein, and a neutron reflector which is provided outside the reactor core and which is moved in a vertical direction for adjusting leakage of neutrons therefrom for controlling the reactivity of the reactor core. The neutron reflector described above is gradually moved in an upward direction with the change in reactivity caused by fuel burn-up, and at least a part of a lower region of the neutron reflector is a high reflection region having a high neutron reflection ability as compared to that of the other region. The high reflection region is located from the bottom to a place between one fourth and one half of the height of the neutron reflector from the bottom end thereof.Type: ApplicationFiled: November 19, 2010Publication date: May 5, 2011Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Tsugio YOKOYAMA, Mitsuaki Yamaoka, Yasuyuki Moriki, Ryoma Kato, Yasushi Tsuboi, Atsuko Matsuda
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Publication number: 20110033640Abstract: Provided is a method for producing an optical film which suffers neither flatness deterioration nor film breakage and is free from problems concerning undulating undulation and partial light leakage. The process for optical film production comprises laminating a cellulose ester resin layer (A) to an acrylic resin layer (B) by coextrusion. The process is characterized in that the cellulose ester resin layer (A) contains 55 to 99 mass % cellulose ester resin and the acrylic resin layer (B) contains 55 to 99 mass % acrylic resin, that the web is conveyed while keeping the layer (A) and the layer (B) in contact with the surface of a first cooling roll and the surface of a second cooling roll, respectively, and that when the surface temperature of the first cooling roll and the surface temperature of the second cooling roll are expressed by Ta (° C.) and Tb (° C.), respectively, then the Ta (° C.) and Tb (° C.) satisfy the following relationship (1). (Ta?80)° C.<Tb (° C.)<(Ta?5)° C.Type: ApplicationFiled: April 24, 2009Publication date: February 10, 2011Applicant: KONICA MINOLTA OPTO, INC.Inventors: Rumiko Yamada, Atsuko Matsuda
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Patent number: 7864913Abstract: A fast reactor having a reflector control system is provided which decreases the change in reactivity of the reactor core with time without controlling a reflector lifting speed and a water flow rate. The fast reactor has a neutron reflector provided outside the reactor core and which is moved in a vertical direction for adjusting neutron leakage to control the reactivity of the reactor core. The neutron reflector is moved in an upward direction with the change in reactivity caused by fuel burn-up. At least a part of a lower region of the neutron reflector may be a region having a high neutron reflection ability as compared to that of the other region. The high reflection region is located at the bottom of the neutron reflector and extends from between one fourth and one half of the height of the neutron reflector.Type: GrantFiled: February 18, 2005Date of Patent: January 4, 2011Assignee: Kabushiki Kaisha ToshibaInventors: Tsugio Yokoyama, Mitsuaki Yamaoka, Yasuyuki Moriki, Ryoma Kato, Yasushi Tsuboi, Atsuko Matsuda
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Patent number: 7773716Abstract: A fast reactor having a reflector control system is provided which decreases the change in reactivity of the reactor core with time without controlling reflector lifting speed and a water flow rate. The reactor has a liquid metal coolant, a reactor core immersed therein, and a neutron reflector provided outside the core and is moved in a vertical direction for adjusting leakage of neutrons therefrom for controlling the reactivity of the core. The reflector described above is gradually moved in an upward direction with the change in reactivity caused by fuel burn-up, and at least a part of a lower region of the reflector is a high reflection region having a high neutron reflection ability as compared to that of the other region. The high reflection region is located between the bottom and one fourth and one half of the height of the neutron reflector.Type: GrantFiled: July 2, 2008Date of Patent: August 10, 2010Assignee: Kabushiki Kaisha ToshibaInventors: Tsugio Yokoyama, Mitsuaki Yamaoka, Yasuyuki Moriki, Ryoma Kato, Yasushi Tsuboi, Atsuko Matsuda
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Publication number: 20100178727Abstract: A method of fabricating an organic thin film transistor exhibiting excellent semiconductor performance by which an organic TFT can be formed continuously on a flexible base such as a polymer support through a simple coating process, and thus the fabrication cost can be reduced sharply, and an organic semiconductor layer thus formed has a high carrier mobility, In the method of fabricating an organic thin film transistor by forming a gate electrode, a gate insulation layer, an organic semiconductor layer, a source electrode and a drain electrode sequentially on a support, the organic semiconductor layer contains an organic semiconductor material having an exothermic point and an endothermic point in a differential scanning thermal analysis, and the organic semiconductor layer thus formed is heat-treated at a temperature not less than the exothermic point and less than the endothermic point.Type: ApplicationFiled: December 13, 2005Publication date: July 15, 2010Applicant: KONICA MINOLTA HOLDINGS, INC.Inventors: Katsura Hirai, Atsuko Matsuda, Tatsuo Tanaka, Chiyoko Takemura, Rie Katakura, Reiko Obuchi
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Publication number: 20080273650Abstract: A fast reactor having a reflector control system is provided which decreases the change in reactivity of the reactor core with time without performing control of a reflector lifting speed and that of a water flow rate. The above fast reactor has a liquid metal coolant, a reactor core immersed therein, and a neutron reflector which is provided outside the reactor core and which is moved in a vertical direction for adjusting leakage of neutrons therefrom for controlling the reactivity of the reactor core. The neutron reflector described above is gradually moved in an upward direction with the change in reactivity caused by fuel burn-up, and at least a part of a lower region of the neutron reflector is a high reflection region having a high neutron reflection ability as compared to that of the other region. The high reflection region is located from the bottom to a place between one fourth and one half of the height of the neutron reflector from the bottom end thereof.Type: ApplicationFiled: July 2, 2008Publication date: November 6, 2008Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Tsugio Yokoyama, Mitsuaki Yamaoka, Yasuyuki Moriki, Ryoma Kato, Yasushi Tsuboi, Atsuko Matsuda
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Publication number: 20050220251Abstract: A fast reactor having a reflector control system is provided which decreases the change in reactivity of the reactor core with time without performing control of a reflector lifting speed and that of a water flow rate. The above fast reactor has a liquid metal coolant, a reactor core immersed therein, and a neutron reflector which is provided outside the reactor core and which is moved in a vertical direction for adjusting leakage of neutrons therefrom for controlling the reactivity of the reactor core. The neutron reflector described above is gradually moved in an upward direction with the change in reactivity caused by fuel burn-up, and at least a part of a lower region of the neutron reflector is a high reflection region having a high neutron reflection ability as compared to that of the other region. The high reflection region is located from the bottom to a place between one fourth and one half of the height of the neutron reflector from the bottom end thereof.Type: ApplicationFiled: February 18, 2005Publication date: October 6, 2005Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Tsugio Yokoyama, Mitsuaki Yamaoka, Yasuyuki Moriki, Ryoma Kato, Yasushi Tsuboi, Atsuko Matsuda
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Patent number: 5145745Abstract: A magnetic recording medium having superior electromagnetic conversion characteristics and travel durability in a well balanced state. The recording medium comprises a non-magnetic support and a plurality of magnetic layers each comprising a ferromagnetic powder and a binder and each of the magnetic layers shows a peak of its loss modulus at a temperature not less than 50.degree. C. and the half-width of the loss modulus-temperature curve showing the peak of loss modulus is not larger than 20.degree. C.; and the temperature of the peak of loss modulas of the outermost magnetic layer provided at the outermost portion among the magnetic layers is higher than that of a magnetic layer other than the outermost magnetic layer.Type: GrantFiled: September 26, 1990Date of Patent: September 8, 1992Assignee: Konica CorporationInventors: Atsuko Matsuda, Tsutomu Kenpo
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Patent number: 5069949Abstract: A magnetic recording medium having a support and provided thereon a magnetic layer is disclosed. The support of the medium concerned comprises physical properties of:a. a thickness: not more than 15.5 .mu.m,b. a number of a protuberance having a height of not lower than 0.1 .mu.m: not more than 30/mm.sup.2,c. a surface roughness: 0.04 to 0.09 .mu.m,d. a Young's modulus in a machine direction: not less than 550 kg/mm.sup.2,e. a fracture strength in a machine direction: not less than 30 kg/mm.sup.2, andf. an elongation: not less than 60%,and the magnetic layer comprises physical properties of:g. a surface roughness: not more than 0.09 .mu.m,h. a Young's modulus in a machine direction: not less than 400 kg/mm.sup.2.Type: GrantFiled: July 11, 1989Date of Patent: December 3, 1991Assignee: Konica CorporationInventors: Atsuko Matsuda, Narito Goto
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Patent number: 5064720Abstract: A magnetic recording medium containing a specific binder resin is disclosed. The magnetic recording medium comprising a magnetic layer which contains a magnetic powder and a binder, in which the binder comprises a polyurethane resin having an anionic functional group being in a form of intramolecular salt; and the magnetic powder is selected from the group consisting of a ferro-magnetic cobalt-containing iron oxide powder, a ferro-magnetic chromium dioxide powder anad a magnetic metal powder containing iron atoms and aluminum atoms in a portion of from 100:1 to 100:20 in terms of the number of atoms.Type: GrantFiled: August 22, 1989Date of Patent: November 12, 1991Assignee: Konica CorporationInventors: Tsutomu Kempo, Atsuko Matsuda, Narito Goto