Patents by Inventor Atsuko Sasahara

Atsuko Sasahara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5981146
    Abstract: When a fine pattern is formed by using a chemical-amplification-type resist film, fall of acid in the surface of the resist can be inhibited so that a fine pattern exhibiting an excellent shape is formed. A resist coating film containing a compound having a sulfonic acid group or a carbonic acid group is formed on a chemical-amplification-type resist film of a semiconductor substrate, followed by performing exposure.
    Type: Grant
    Filed: January 28, 1997
    Date of Patent: November 9, 1999
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Teruhiko Kumada, Atsuko Sasahara, Youko Tanaka, Hideo Horibe, Shigeru Kubota, Hiroshi Koezuka, Tetsuro Hanawa