Abstract: A build system includes: a build apparatus including an energy beam irradiation unit, a material supply unit, and a control apparatus. The build system builds a second object above a first object including a first space. The second object includes: a first inclination part connected to the first object; a second inclination part connected to the first object; and a connection part that connects a tip of the first inclination part and a tip of the second inclination part. The build system builds the first inclination part and the second inclination part by alternately performing a building of a part of the first inclination part and a building of a part of the second inclination part. A second space below the first inclination part and the second inclination part is connected to the first space, and an upper part of the second space is closed by the connection part.

Abstract: A pellicle film for photolithography including a carbon nanotube film, in which the carbon nanotube film contains carbon nanotubes; the carbon nanotube film transmits 80% or more of EUV light at a wavelength of 13.5 nm; the carbon nanotube film has a thickness from 1 nm to 50 nm; the carbon nanotube film is deposited on a silicon substrate, in which the 3? of the reflectance is 15% or less when the reflectance of the deposited carbon nanotube film is measured using a reflectance spectrophotometer-based film thickness meter under the following conditions: the diameter of measurement spots, 20 ?m; the reference measurement wavelength, 285 nm; the number of measurement spots, 121 spots; the distance between the centers of adjacent measurement spots, 40 ?m.

Abstract: Provided are a pellicle film, a pellicle frame and a pellicle having a higher EUV transmittance. An exposure pattern plate capable of performing EUV lithography with the pellicle film, the pellicle frame or the pellicle, and a method for producing a semiconductor device, are provided. A pellicle film for exposure extendable over an opening of a support frame and having a thickness of 200 nm or less is provided. The film includes a carbon nanotube sheet. The carbon nanotube sheet includes bundles each including a plurality of carbon nanotubes, the bundles each have a diameter of 100 nm or shorter, and the bundles are aligned in a planar direction in the carbon nanotube sheet.

Abstract: Provided are a pellicle film, a pellicle frame and a pellicle having a higher EUV transmittance. An exposure pattern plate capable of performing EUV lithography with the pellicle film, the pellicle frame or the pellicle, and a method for producing a semiconductor device, are provided. A pellicle film for exposure extendable over an opening of a support frame and having a thickness of 200 nm or less is provided. The film includes a carbon nanotube sheet. The carbon nanotube sheet includes bundles each including a plurality of carbon nanotubes, the bundles each have a diameter of 100 nm or shorter, and the bundles are aligned in a planar direction in the carbon nanotube sheet.

Abstract: Provided are a pellicle film, a pellicle frame and a pellicle having a higher EUV transmittance. An exposure pattern plate capable of performing EUV lithography with the pellicle film, the pellicle frame or the pellicle, and a method for producing a semiconductor device, are provided. A pellicle film for exposure extendable over an opening of a support frame and having a thickness of 200 nm or less is provided. The film includes a carbon nanotube sheet. The carbon nanotube sheet includes bundles each including a plurality of carbon nanotubes, the bundles each have a diameter of 100 nm or shorter, and the bundles are aligned in a planar direction in the carbon nanotube sheet.

Abstract: Provided are: an elastomer structure containing carbon nanotubes; and a method for producing the elastomer structure. In a CNT elastomer having a mesh shaped carbon nanotube aggregate on a surface layer thereof, the mesh shaped carbon nanotube aggregate can impart a shape-retaining property to the elastomer. Therefore, the elastomer can be molded along the shape of a mold, and it becomes possible to mold a carbon nanotube elastomer having a fine dimension. The elastomer structure containing carbon nanotubes according to the present invention is provided with mesh shaped carbon nanotube aggregate which are embedded in a surface layer of the elastomer structure containing carbon nanotubes and are not protruded from the surface of the elastomer structure containing carbon nanotubes.

Abstract: Provided are: an elastomer structure containing carbon nanotubes; and a method for producing the elastomer structure. In a CNT elastomer having a mesh shaped carbon nanotube aggregate on a surface layer thereof, the mesh shaped carbon nanotube aggregate can impart a shape-retaining property to the elastomer. Therefore, the elastomer can be molded along the shape of a mold, and it becomes possible to mold a carbon nanotube elastomer having a fine dimension. The elastomer structure containing carbon nanotubes according to the present invention is provided with mesh shaped carbon nanotube aggregate which are embedded in a surface layer of the elastomer structure containing carbon nanotubes and are not protruded from the surface of the elastomer structure containing carbon nanotubes.